DE3822921C2 - - Google Patents

Info

Publication number
DE3822921C2
DE3822921C2 DE3822921A DE3822921A DE3822921C2 DE 3822921 C2 DE3822921 C2 DE 3822921C2 DE 3822921 A DE3822921 A DE 3822921A DE 3822921 A DE3822921 A DE 3822921A DE 3822921 C2 DE3822921 C2 DE 3822921C2
Authority
DE
Germany
Prior art keywords
group
compound
photosensitive
mixture according
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3822921A
Other languages
German (de)
English (en)
Other versions
DE3822921A1 (de
Inventor
Mitsuru Koike
Nobuyuki Yoshida Shizuoka Jp Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE3822921A1 publication Critical patent/DE3822921A1/de
Application granted granted Critical
Publication of DE3822921C2 publication Critical patent/DE3822921C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE3822921A 1987-07-06 1988-07-06 Photopolymerisierbare zusammensetzung Granted DE3822921A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16819487 1987-07-06

Publications (2)

Publication Number Publication Date
DE3822921A1 DE3822921A1 (de) 1989-01-19
DE3822921C2 true DE3822921C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-03-11

Family

ID=15863529

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3822921A Granted DE3822921A1 (de) 1987-07-06 1988-07-06 Photopolymerisierbare zusammensetzung

Country Status (2)

Country Link
US (1) US4950581A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3822921A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (113)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01229003A (ja) * 1988-03-09 1989-09-12 Fuji Photo Film Co Ltd 光重合性組成物
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
GB8921116D0 (en) * 1989-09-18 1989-11-01 Du Pont Improvements in or relating to radiation sensitive compositions
US5100755A (en) * 1989-12-27 1992-03-31 The Mead Corporation Dye-benzyltriaryl borate photoinitiators and photohardenable composition containing these photoinitiators
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators
US5153100A (en) * 1990-08-27 1992-10-06 E. I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
CA2053761A1 (en) * 1990-10-25 1992-04-26 Gregory C. Weed Borate coinitiators for photopolymerizable compositions
JP2639748B2 (ja) * 1990-10-31 1997-08-13 富士写真フイルム株式会社 感光性エレメントおよびその製造法
US5143818A (en) * 1991-02-01 1992-09-01 E. I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
US5147758A (en) * 1991-02-19 1992-09-15 E. I. Du Pont De Nemours And Company Red sensitive photopolymerizable compositions
US5362874A (en) * 1991-03-15 1994-11-08 Fuji Photo Film Co., Ltd. Light-sensitive bistrihalomethyl-s-triazine compounds
DE69226061T2 (de) * 1991-10-25 1999-01-28 Minnesota Mining And Manufacturing Co., Saint Paul, Minn. Aminoketonsensibilisatore für wasserlösliche Photopolymerzusammensetzungen
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
US5346801A (en) * 1992-04-01 1994-09-13 Konica Corporation Method of forming images
US5846682A (en) * 1993-03-02 1998-12-08 Showa Denko K.K. Light decolorizable recording material, ink and toner
US5527921A (en) * 1995-03-21 1996-06-18 Minnesota Mining And Manufacturing Company Peroxycarboxylic ester initiators derived from nitrogen heterocycles
US5744511A (en) * 1995-04-19 1998-04-28 Tokuyama Corporation Visible ray polymerization initiator and visible ray polymerizable composition
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
EP0778292A3 (en) * 1995-12-04 1998-11-04 Bayer Corporation Method for the production of anhydride modified polyvinyl acetals useful for photosensitive compositions
WO1997021737A1 (en) * 1995-12-14 1997-06-19 Spectra Group Limited, Inc. Photoinitiator composition containing a borate salt and a hypervalent atom-containing salt
KR19990036339A (ko) * 1996-06-12 1999-05-25 다께다 가즈히꼬 광중합 반응 개시제 및 이를 함유하는 에너지선경화성 조성물
US6146789A (en) * 1996-08-15 2000-11-14 Three Bond Co., Ltd. Battery having a visible-light or near-infrared-light curing resin as an insulating seal
US6033829A (en) * 1997-06-30 2000-03-07 Showa Denko K.K. Photopolymerizable composition and dry film resist
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6740466B1 (en) 1999-11-15 2004-05-25 Fuji Photo Film Co., Ltd. Photopolymerizable composition and recording material using the same
EP1201722A1 (en) * 2000-10-23 2002-05-02 Loctite (R & D) Limited Polymerisation initiators, polymerisable compositions, and uses thereof
JP4512281B2 (ja) * 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
AU2003225512A1 (en) * 2002-04-19 2003-11-03 Loctite (R And D) Limited Polymerisation initiators based on ammonium tetraalkyl boranes, polymerisable compositions, and uses thereof for bonding low surface energy substrates
US6867271B1 (en) 2002-06-24 2005-03-15 Henkel Corporation Non-flammable and non-combustible adhesive bonding systems having adherence to low energy surfaces
US7338748B2 (en) * 2002-09-30 2008-03-04 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
EP1431032B1 (en) * 2002-12-18 2015-12-09 FUJIFILM Corporation Polymerizable composition and lithographic printing plate precursor
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP2004287138A (ja) * 2003-03-24 2004-10-14 Konica Minolta Holdings Inc ホログラフィック記録用組成物、ホログラフィック記録メディア及びその記録方法
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
US8202932B2 (en) * 2004-12-03 2012-06-19 Loctite (R&D) Limited Adhesive bonding systems having adherence to low energy surfaces
US7408012B1 (en) 2005-04-18 2008-08-05 Loctite (R&D) Limited Adhesive bonding systems having adherence to low energy surfaces
US7781493B2 (en) 2005-06-20 2010-08-24 Dow Global Technologies Inc. Protective coating for window glass
US7786183B2 (en) * 2005-06-20 2010-08-31 Dow Global Technologies Inc. Coated glass articles
KR101402636B1 (ko) 2005-12-01 2014-06-03 시바 홀딩 인크 옥심 에스테르 광개시제
US7939161B2 (en) * 2006-12-19 2011-05-10 Dow Global Technologies Llc Encapsulated panel assemblies and methods for making same
US7955696B2 (en) * 2006-12-19 2011-06-07 Dow Global Technologies Llc Composites and methods for conductive transparent substrates
MX2009006626A (es) * 2006-12-19 2009-06-30 Dow Global Technologies Inc Aditivos activadors de adhesion y metodos para mejorar composiciones de recubrimiento.
WO2008090640A1 (ja) 2007-01-23 2008-07-31 Fujifilm Corporation オキシム化合物、感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子
US20100143673A1 (en) * 2007-04-04 2010-06-10 Kazuyuki Mitsukura Photosensitive adhesive composition, film-like adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device and semiconductor device manufacturing method
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2144876B1 (en) 2007-05-11 2012-09-12 Basf Se Oxime ester photoinitiators
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
US20100286353A1 (en) 2007-09-19 2010-11-11 Fujifilm Corporation Acetylene compound, salt thereof, condensate thereof, and composition thereof
KR101587666B1 (ko) 2007-12-18 2016-01-21 다우 글로벌 테크놀로지스 엘엘씨 유리 결합용 접착제에 대한 접착성이 개선된 창 유리용 보호 코팅
WO2010060702A1 (en) 2008-11-03 2010-06-03 Basf Se Photoinitiator mixtures
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
GB2491170B (en) 2011-05-26 2013-11-06 Henkel Ireland Ltd Two-part polymerisable compositions
CN103608183B (zh) 2011-06-21 2017-05-17 巴斯夫欧洲公司 在纸或纸板上印刷衍射光栅
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
EP2963015B1 (en) 2012-05-09 2018-07-11 Basf Se Oxime ester photoinitiators
BR112014030976A2 (pt) 2012-06-14 2017-06-27 Basf Se método para formação de uma microestrutura de relevo de superfície, produto de segurança, uso de um produto, e, método para a formação de um revestimento que mostra uma mudança de cor dependente de ângulo em um substrato
AU2013314269B2 (en) 2012-09-17 2017-07-06 Basf Se Security elements and method for their manufacture
ES2683976T3 (es) 2012-10-19 2018-10-01 Igm Group B.V. Fotoiniciadores híbridos
WO2014187750A1 (en) 2013-05-21 2014-11-27 Basf Se Security elements and method for their manufacture
CN105358527B (zh) 2013-07-08 2018-09-25 巴斯夫欧洲公司 肟酯光引发剂
CN106103846B (zh) 2013-10-04 2018-08-21 巴斯夫欧洲公司 高光泽金属效应纸
US10106629B2 (en) 2014-05-30 2018-10-23 Igm Resins Italia S.R.L. Multifunctional acylphosphine oxide photoinitiators
WO2016034963A1 (en) 2014-09-04 2016-03-10 Basf Se Polycyclic photoinitiators
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
EP3277884A1 (en) 2015-03-30 2018-02-07 Basf Se High gloss metal effect papers and boards
KR102079026B1 (ko) 2015-12-15 2020-02-19 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드 플루오렌 다작용성 광개시제 및 이의 제조 및 용도, 및 플루오렌 광개시제를 포함하는 광감성 수지 조성물 및 이의 용도
EP3507279B1 (en) 2016-09-02 2020-10-14 IGM Group B.V. Polycyclic glyoxylates as photoinitiators
JP6833171B2 (ja) 2016-09-13 2021-02-24 常州強力先端電子材料有限公司Ｃｈａｎｇｚｈｏｕ Ｔｒｏｎｌｙ Ａｄｖａｎｃｅｄ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ Ｃｏ．，Ｌｔｄ． フルオレン類光開始剤、その製造方法、それを有する光硬化性組成物、及び光硬化分野におけるフルオレン類光開始剤の使用
JP7032416B2 (ja) * 2017-02-17 2022-03-08 常州強力先端電子材料有限公司 フルオレニルアミノケトン類光開始剤、その調製方法及びフルオレニルアミノケトン類光開始剤を含有するｕｖ光硬化性組成物
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CN111867839A (zh) 2018-03-22 2020-10-30 爱克发有限公司 平版印刷版前体
EP3784499A1 (en) 2018-04-25 2021-03-03 Basf Se Process for the production of strongly adherent (embossed) films on flexible substrates
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KR20210065126A (ko) 2018-09-24 2021-06-03 바스프 에스이 3d 인쇄에 사용하기 위한 uv 경화성 조성물
CN112638968A (zh) 2018-09-24 2021-04-09 巴斯夫欧洲公司 用于3d打印的可光固化组合物
US12208447B2 (en) 2018-10-25 2025-01-28 Basf Se Compositions, comprising silver nanoplatelets
GB2580162B (en) 2018-12-21 2022-07-13 Henkel IP & Holding GmbH One-part photocurable (meth) acrylate compositions
KR20210110342A (ko) 2018-12-28 2021-09-07 아이지엠 레진스 이탈리아 에스.알.엘. 광개시제
EP3680274A1 (en) 2019-01-14 2020-07-15 Basf Se Hydroxyurethane (meth)acrylate prepolymers for use in 3d printing
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CN113302064A (zh) 2019-01-21 2021-08-24 巴斯夫欧洲公司 安全元件
EP3917703A1 (en) 2019-01-29 2021-12-08 Basf Se Security element
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WO2021070152A1 (en) 2019-10-11 2021-04-15 Igm Resins Italia S.R.L. Coumarin glyoxylates for led photocuring
EP4055071A1 (en) 2019-11-07 2022-09-14 Basf Se Water-washable compositions for use in 3d printing
CN115279518A (zh) 2020-04-23 2022-11-01 巴斯夫欧洲公司 包含片状过渡金属颗粒的组合物
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
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IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
US20230417936A1 (en) * 2021-12-27 2023-12-28 Lawrence Livermore National Security, Llc Polyvinyl toluene scintillators produced using cationic photoinitiators for additively manufactured radiation detectors
EP4482881A1 (en) 2022-02-24 2025-01-01 IGM Resins Italia S.r.l. Photoinitiators
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Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5651735A (en) * 1979-10-03 1981-05-09 Asahi Chem Ind Co Ltd Photoreactive composition
US4636459A (en) * 1985-03-06 1987-01-13 Fuji Photo Film Co., Ltd. Photopolymerizable compositions
DE3677527D1 (de) * 1985-11-20 1991-03-21 Mead Corp Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien.
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
GB8602683D0 (en) * 1986-02-04 1986-03-12 Univ Strathclyde Liquid metering device

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