DE3722080A1 - Einrichtung zum bearbeiten von halbleiterplaettchen - Google Patents

Einrichtung zum bearbeiten von halbleiterplaettchen

Info

Publication number
DE3722080A1
DE3722080A1 DE19873722080 DE3722080A DE3722080A1 DE 3722080 A1 DE3722080 A1 DE 3722080A1 DE 19873722080 DE19873722080 DE 19873722080 DE 3722080 A DE3722080 A DE 3722080A DE 3722080 A1 DE3722080 A1 DE 3722080A1
Authority
DE
Germany
Prior art keywords
semiconductor
carrier
nozzle
chuck
gripper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19873722080
Other languages
German (de)
English (en)
Other versions
DE3722080C2 (enrdf_load_stackoverflow
Inventor
Yoshiki Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61156243A external-priority patent/JPH0230194B2/ja
Priority claimed from JP18530486A external-priority patent/JPS6342768A/ja
Priority claimed from JP61201815A external-priority patent/JPS6357190A/ja
Priority claimed from JP61253695A external-priority patent/JP2532852B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3722080A1 publication Critical patent/DE3722080A1/de
Application granted granted Critical
Publication of DE3722080C2 publication Critical patent/DE3722080C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE19873722080 1986-07-04 1987-07-03 Einrichtung zum bearbeiten von halbleiterplaettchen Granted DE3722080A1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP61156243A JPH0230194B2 (ja) 1986-07-04 1986-07-04 Handotaiseizosochi
JP18530486A JPS6342768A (ja) 1986-08-08 1986-08-08 被膜形成装置
JP61201815A JPS6357190A (ja) 1986-08-29 1986-08-29 物体移動用関節ア−ム装置
JP61253695A JP2532852B2 (ja) 1986-10-27 1986-10-27 液体塗布装置のノズルスイ−プ機構

Publications (2)

Publication Number Publication Date
DE3722080A1 true DE3722080A1 (de) 1988-01-28
DE3722080C2 DE3722080C2 (enrdf_load_stackoverflow) 1993-05-27

Family

ID=27473398

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873722080 Granted DE3722080A1 (de) 1986-07-04 1987-07-03 Einrichtung zum bearbeiten von halbleiterplaettchen

Country Status (3)

Country Link
US (1) US5015177A (enrdf_load_stackoverflow)
DE (1) DE3722080A1 (enrdf_load_stackoverflow)
GB (1) GB2194500B (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4219774C1 (de) * 1992-06-17 1994-01-27 Mannesmann Kienzle Gmbh Verfahren und Vorrichtung zum Stapeln von Substraten, die durch Bonden miteinander zu verbinden sind
EP0474180A3 (enrdf_load_stackoverflow) * 1990-09-03 1995-02-15 Dainippon Screen Mfg
DE19716690B4 (de) * 1996-09-05 2004-05-06 Samsung Electronics Co. Ltd. Wärmebehandlungsvorrichtung für Halbleiterkristallscheiben
DE4412915B4 (de) * 1993-05-03 2005-12-15 Unaxis Balzers Ag Plasmabehandlungsanlage, Verfahren zu deren Betrieb und Verwendung derselben

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5202716A (en) * 1988-02-12 1993-04-13 Tokyo Electron Limited Resist process system
KR970003907B1 (ko) * 1988-02-12 1997-03-22 도오교오 에레구토론 가부시끼 가이샤 기판처리 장치 및 기판처리 방법
JP2559617B2 (ja) * 1988-03-24 1996-12-04 キヤノン株式会社 基板処理装置
DE4238834A1 (en) * 1991-11-18 1993-05-19 Fusion Systems Corp Robotic semiconductor wafer transporter with vertical photodetector array - scans detectors to determine which slots are occupied by wafers illuminated from emitter on robot arm
US5849602A (en) * 1995-01-13 1998-12-15 Tokyo Electron Limited Resist processing process
TW312045B (en) 1995-04-25 1997-08-01 Texas Instruments Inc Radiant chamber and method for lid seal in ceramic packaging
US5746565A (en) * 1996-01-22 1998-05-05 Integrated Solutions, Inc. Robotic wafer handler
US5796486A (en) * 1997-03-31 1998-08-18 Lam Research Corporation Apparatus method for determining the presence or absence of a wafer on a wafer holder
US6226452B1 (en) 1997-05-19 2001-05-01 Texas Instruments Incorporated Radiant chamber for simultaneous rapid die attach and lead frame embed for ceramic packaging
US6688375B1 (en) * 1997-10-14 2004-02-10 Applied Materials, Inc. Vacuum processing system having improved substrate heating and cooling
KR100616293B1 (ko) * 1999-11-11 2006-08-28 동경 엘렉트론 주식회사 기판처리장치 및 기판처리방법
US6345150B1 (en) * 1999-11-30 2002-02-05 Wafermasters, Inc. Single wafer annealing oven
US6281130B1 (en) * 2000-06-16 2001-08-28 Advanced Micro Devices, Inc. Method for developing ultra-thin resist films
US6945258B2 (en) * 2001-04-19 2005-09-20 Tokyo Electron Limited Substrate processing apparatus and method
JP2003007587A (ja) * 2001-06-20 2003-01-10 Tokyo Electron Ltd 基板処理装置
JP4274736B2 (ja) 2002-03-28 2009-06-10 大日本スクリーン製造株式会社 基板処理装置
JP4279102B2 (ja) * 2003-09-22 2009-06-17 大日本スクリーン製造株式会社 基板処理装置及び基板処理方法
JP4832201B2 (ja) * 2006-07-24 2011-12-07 大日本スクリーン製造株式会社 基板処理装置
JP5611152B2 (ja) * 2011-08-29 2014-10-22 東京エレクトロン株式会社 基板熱処理装置
CN105460599B (zh) * 2014-09-04 2019-07-19 沈阳拓荆科技有限公司 薄膜沉积设备及其基材传输装置
CN106586558B (zh) * 2017-01-20 2019-08-16 东莞市意艾迪数控科技有限公司 一种翻转油边机及其工作方法
TWI743512B (zh) * 2018-07-06 2021-10-21 日商川崎重工業股份有限公司 基板搬送機器人及其控制方法
CN111354666A (zh) * 2018-12-20 2020-06-30 北京铂阳顶荣光伏科技有限公司 一种薄膜类产品生产线及薄膜类产品生产方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2036562A1 (de) * 1969-07-29 1971-02-11 Texas Instruments Ine , Dallas, Tex (VStA) Anordnung zur Herstellung elektronischer Bauelemente
DE2160283B2 (de) * 1970-12-07 1974-09-26 Western Electric Co. Inc., New York, N.Y. (V.St.A.) Verfahren zur Hersellung einer fotoempfindlichen Maskierungsschicht auf einem Halbleitersubstrat
US3946484A (en) * 1973-02-05 1976-03-30 International Business Machines Corporation Continuous processing system
JPS60183736A (ja) * 1983-02-14 1985-09-19 ブルックス　オートメーション　インク 多関節ア−ム移動装置
EP0242067A2 (en) * 1986-04-17 1987-10-21 Varian Associates, Inc. Wafer processing system
EP0244202A2 (en) * 1986-04-28 1987-11-04 Varian Associates, Inc. Wafer transfer system

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3946931A (en) * 1974-11-27 1976-03-30 Western Electric Company, Inc. Methods of and apparatus for bonding an article to a substrate
DD120400A1 (enrdf_load_stackoverflow) * 1975-02-04 1976-06-12
GB2091196B (en) * 1981-01-17 1984-05-10 Electrotech Equipments Ltd Apparatus for sequential displacement of a carrier
US4433951A (en) * 1981-02-13 1984-02-28 Lam Research Corporation Modular loadlock
US4520834A (en) * 1983-11-08 1985-06-04 Dicicco Paolo S Apparatus for processing articles in a series of process solution containers
US4557663A (en) * 1984-01-09 1985-12-10 Westinghouse Electric Corp. Modular, low cost, pogrammable assembly system
US4555273A (en) * 1984-02-27 1985-11-26 The United States Of America As Represented By The Secretary Of The Navy Furnace transient anneal process
GB8410251D0 (en) * 1984-04-19 1984-05-31 Heraeus Schott Quarzschmelze Handling semiconductor wafers
JPS6191485A (ja) * 1984-10-11 1986-05-09 フア−ネス重工株式会社 炉
EP0178336B1 (en) * 1984-10-16 1987-09-09 International Business Machines Corporation Vacuum transfer device
US4692115A (en) * 1985-04-03 1987-09-08 Thermco Systems, Inc. Semiconductor wafer furnace door
EP0555890B1 (en) * 1985-10-24 1998-09-02 Texas Instruments Incorporated Wafer transfer arm and method
WO1987006561A1 (en) * 1986-04-28 1987-11-05 Varian Associates, Inc. Modular semiconductor wafer transport and processing system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2036562A1 (de) * 1969-07-29 1971-02-11 Texas Instruments Ine , Dallas, Tex (VStA) Anordnung zur Herstellung elektronischer Bauelemente
DE2160283B2 (de) * 1970-12-07 1974-09-26 Western Electric Co. Inc., New York, N.Y. (V.St.A.) Verfahren zur Hersellung einer fotoempfindlichen Maskierungsschicht auf einem Halbleitersubstrat
US3946484A (en) * 1973-02-05 1976-03-30 International Business Machines Corporation Continuous processing system
JPS60183736A (ja) * 1983-02-14 1985-09-19 ブルックス　オートメーション　インク 多関節ア−ム移動装置
EP0242067A2 (en) * 1986-04-17 1987-10-21 Varian Associates, Inc. Wafer processing system
EP0244202A2 (en) * 1986-04-28 1987-11-04 Varian Associates, Inc. Wafer transfer system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0474180A3 (enrdf_load_stackoverflow) * 1990-09-03 1995-02-15 Dainippon Screen Mfg
DE4219774C1 (de) * 1992-06-17 1994-01-27 Mannesmann Kienzle Gmbh Verfahren und Vorrichtung zum Stapeln von Substraten, die durch Bonden miteinander zu verbinden sind
DE4412915B4 (de) * 1993-05-03 2005-12-15 Unaxis Balzers Ag Plasmabehandlungsanlage, Verfahren zu deren Betrieb und Verwendung derselben
DE19716690B4 (de) * 1996-09-05 2004-05-06 Samsung Electronics Co. Ltd. Wärmebehandlungsvorrichtung für Halbleiterkristallscheiben

Also Published As

Publication number Publication date
US5015177A (en) 1991-05-14
GB2194500B (en) 1991-01-23
GB8715456D0 (en) 1987-08-05
DE3722080C2 (enrdf_load_stackoverflow) 1993-05-27
GB2194500A (en) 1988-03-09

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8128 New person/name/address of the agent

Representative=s name: TIEDTKE, H., DIPL.-ING. BUEHLING, G., DIPL.-CHEM.

D2 Grant after examination
8364 No opposition during term of opposition