DE3686637D1 - Novolakharz mit hohem molekulargewicht und verfahren zu dessen herstellung. - Google Patents

Novolakharz mit hohem molekulargewicht und verfahren zu dessen herstellung.

Info

Publication number
DE3686637D1
DE3686637D1 DE8686116732T DE3686637T DE3686637D1 DE 3686637 D1 DE3686637 D1 DE 3686637D1 DE 8686116732 T DE8686116732 T DE 8686116732T DE 3686637 T DE3686637 T DE 3686637T DE 3686637 D1 DE3686637 D1 DE 3686637D1
Authority
DE
Germany
Prior art keywords
production
molecular weight
high molecular
novola
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686116732T
Other languages
English (en)
Other versions
DE3686637T2 (de
Inventor
Takashi Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of DE3686637D1 publication Critical patent/DE3686637D1/de
Application granted granted Critical
Publication of DE3686637T2 publication Critical patent/DE3686637T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
DE8686116732T 1985-12-06 1986-12-02 Novolakharz mit hohem molekulargewicht und verfahren zu dessen herstellung. Expired - Fee Related DE3686637T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27337585 1985-12-06

Publications (2)

Publication Number Publication Date
DE3686637D1 true DE3686637D1 (de) 1992-10-08
DE3686637T2 DE3686637T2 (de) 1993-04-08

Family

ID=17527024

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686116732T Expired - Fee Related DE3686637T2 (de) 1985-12-06 1986-12-02 Novolakharz mit hohem molekulargewicht und verfahren zu dessen herstellung.

Country Status (7)

Country Link
US (1) US5023311A (de)
EP (1) EP0224911B1 (de)
JP (1) JPH085942B2 (de)
KR (1) KR870006104A (de)
CN (1) CN86108193A (de)
CA (1) CA1279430C (de)
DE (1) DE3686637T2 (de)

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JP2626655B2 (ja) * 1986-01-24 1997-07-02 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂の製造法
JPH0689091B2 (ja) * 1987-09-14 1994-11-09 鐘紡株式会社 熱硬化性フェノール系樹脂溶液およびその製造法
DE3810632A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial
US5001040A (en) * 1988-07-11 1991-03-19 Olin Hunt Specialty Products Inc. Process of forming resist image in positive photoresist with thermally stable phenolic resin
US4959292A (en) * 1988-07-11 1990-09-25 Olin Hunt Specialty Products Inc. Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde
DE3901930A1 (de) * 1989-01-24 1990-07-26 Hoechst Ag Verfahren zur herstellung von novolaken und deren verwendung
JPH02254450A (ja) * 1989-03-29 1990-10-15 Toshiba Corp レジスト
US5674482A (en) * 1989-08-14 1997-10-07 Rhone-Poulenc Rorer Pharmaceuticals, Inc. Polymers with alkyl- or heteroalkyl -aryl backbone and pharmaceutical compositions incorporating same
US5288587A (en) * 1989-09-05 1994-02-22 Sumitomo Chemical Co., Ltd. Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound
JPH03294861A (ja) * 1990-04-13 1991-12-26 Mitsubishi Petrochem Co Ltd ポジ型フォトレジスト組成物
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5162156A (en) * 1990-09-21 1992-11-10 Lord Corporation Phenolic resin adhesion promoters and adhesive compositions, and bonding method employing same
DE69218033T2 (de) * 1991-05-07 1997-09-18 Hitachi Chemical Co Ltd Verfahren zur Herstellung von naphtholmodifizierten Phenolharzen
US5306594A (en) * 1991-11-04 1994-04-26 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol
US5459223A (en) * 1993-01-22 1995-10-17 Hitachi Chemical Company Method of preparing naphthol-modified phenolic resin
US6001949A (en) * 1995-12-13 1999-12-14 Gun Ei Chemical Industry Co., Ltd. Novolak type phenolic resins and methods of manufacturing thereof
US5986035A (en) * 1997-04-15 1999-11-16 Sumitomo Bakelite Company Limited High-molecular weight high-ortho novolak type phenolic resin
KR100561898B1 (ko) * 1998-08-31 2006-10-24 스미또모 베이크라이트 가부시키가이샤 고-분자량 고-오르토 노볼락형 페놀수지
JP3894001B2 (ja) * 2001-09-06 2007-03-14 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP4283773B2 (ja) * 2002-08-30 2009-06-24 旭有機材工業株式会社 ノボラック型フェノール樹脂の製造方法
JP4661064B2 (ja) * 2004-03-18 2011-03-30 住友ベークライト株式会社 フォトレジスト用フェノール樹脂の製造方法及びフォトレジスト組成物
JP4837908B2 (ja) * 2004-10-12 2011-12-14 旭有機材工業株式会社 ノボラック型フェノール樹脂の製造方法
JP4033893B2 (ja) * 2005-10-27 2008-01-16 旭有機材工業株式会社 シェルモールド用ノボラック型フェノール樹脂及びその製造方法並びにレジンコーテッドサンド
JP2008101038A (ja) * 2006-10-17 2008-05-01 Asahi Organic Chem Ind Co Ltd ノボラック型フェノール樹脂の製造方法
US8394911B2 (en) * 2010-02-03 2013-03-12 Dic Corporation Phenol resin composition, production method therefor, curable resin composition, cured product thereof, and printed circuit board
CN102181024B (zh) * 2011-03-30 2012-08-15 山东圣泉化工股份有限公司 超高分子量酚醛树脂的制备方法
TW201806995A (zh) * 2016-04-06 2018-03-01 迪愛生股份有限公司 酚醛清漆型樹脂之製造方法
CN106085093B (zh) * 2016-06-20 2018-10-12 武汉源脉科技股份有限公司 耐高温高效隔热保温涂料、其制备方法及耐高温高效隔热保温材料
CN112961298A (zh) * 2021-03-09 2021-06-15 江苏准信自动化科技股份有限公司 一种酚醛树脂及其制备方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1133772A (en) * 1964-12-28 1968-11-20 Rank Xerox Ltd Frostable phenol-aldehyde resins
DE2616992C3 (de) * 1976-04-17 1987-10-22 Agfa-Gevaert Ag, 5090 Leverkusen Lichtempfindliches Kopiermaterial zur Herstellung von Reliefs
US4173470A (en) * 1977-11-09 1979-11-06 Bell Telephone Laboratories, Incorporated Novolak photoresist composition and preparation thereof
JPS54116081A (en) * 1978-02-28 1979-09-10 Matsushita Electric Works Ltd Preparation of high-molecular weight phenolic resin
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS5692908A (en) * 1979-12-27 1981-07-28 Mitsui Petrochem Ind Ltd High-molecular novolak type substituted phenolic resin, its preparation and application
JPS57113A (en) * 1980-06-03 1982-01-05 Mitsui Petrochem Ind Ltd Production of high-molecular novolak type substituted phenol resin
JPS5714615A (en) * 1980-06-03 1982-01-25 Mitsui Petrochem Ind Ltd High-molecular-weight novolak-type substituted phenolic resin and its use
US4345054A (en) * 1979-12-27 1982-08-17 Mitsui Petrochemical Industries, Ltd. High-molecular-weight novolak types substituted phenolic resins and process for preparation thereof
GB2073226B (en) * 1980-03-28 1983-06-08 Mitsui Toatsu Chemicals Colour-developer for pressure-sensitive recording sheets
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
JPS58210955A (ja) * 1982-06-02 1983-12-08 Mitsui Petrochem Ind Ltd 硬化型樹脂組成物
JPS5958019A (ja) * 1982-09-27 1984-04-03 Cosmo Co Ltd フエノ−ル樹脂の製造方法
CA1255952A (en) * 1983-03-04 1989-06-20 Akihiro Furuta Positive type photoresist composition
JPS59191710A (ja) * 1983-04-15 1984-10-30 Mitsui Petrochem Ind Ltd 高分子量ノボラツク型置換フエノ−ル樹脂の製法
EP0136110A3 (de) * 1983-08-30 1986-05-28 Mitsubishi Kasei Corporation Positive lichtempfindliche Zusammensetzung und Verwendung für Photolacke
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
JPS60260611A (ja) * 1984-06-08 1985-12-23 Mitsubishi Petrochem Co Ltd 高分子量クレゾ−ルノボラツク樹脂の製造方法
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
JPS6112714A (ja) * 1984-06-28 1986-01-21 Mitsubishi Petrochem Co Ltd 線状高分子量クレゾ−ルノボラツク樹脂の製造法
JPS6198717A (ja) * 1984-10-22 1986-05-17 Mitsui Petrochem Ind Ltd 高分子量ノボラツク型置換フエノ−ル樹脂の製法
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物

Also Published As

Publication number Publication date
EP0224911A3 (en) 1988-03-02
CA1279430C (en) 1991-01-22
US5023311A (en) 1991-06-11
JPS62230816A (ja) 1987-10-09
KR870006104A (ko) 1987-07-09
EP0224911A2 (de) 1987-06-10
EP0224911B1 (de) 1992-09-02
CN86108193A (zh) 1987-07-22
DE3686637T2 (de) 1993-04-08
JPH085942B2 (ja) 1996-01-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee