DE3586452D1 - Festkoerperbildsensor und verfahren zu seiner herstellung. - Google Patents
Festkoerperbildsensor und verfahren zu seiner herstellung.Info
- Publication number
- DE3586452D1 DE3586452D1 DE8585113198T DE3586452T DE3586452D1 DE 3586452 D1 DE3586452 D1 DE 3586452D1 DE 8585113198 T DE8585113198 T DE 8585113198T DE 3586452 T DE3586452 T DE 3586452T DE 3586452 D1 DE3586452 D1 DE 3586452D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- image sensor
- solid image
- solid
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007787 solid Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14887—Blooming suppression
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14831—Area CCD imagers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59220016A JPS6197861A (ja) | 1984-10-18 | 1984-10-18 | 固体撮像装置の製造方法 |
JP60063369A JPH0680812B2 (ja) | 1985-03-29 | 1985-03-29 | 固体撮像装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3586452D1 true DE3586452D1 (de) | 1992-09-10 |
DE3586452T2 DE3586452T2 (de) | 1993-03-18 |
Family
ID=26404482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585113198T Expired - Lifetime DE3586452T2 (de) | 1984-10-18 | 1985-10-17 | Festkoerperbildsensor und verfahren zu seiner herstellung. |
Country Status (3)
Country | Link |
---|---|
US (2) | US4947224A (de) |
EP (1) | EP0178664B1 (de) |
DE (1) | DE3586452T2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02309877A (ja) * | 1989-05-25 | 1990-12-25 | Sony Corp | 固体撮像装置 |
US5262661A (en) * | 1990-06-25 | 1993-11-16 | Matsushita Electric Industrial Co., Ltd. | Solid-state image pickup device, having increased charge storage and improved electronic shutter operation |
KR930008527B1 (ko) * | 1990-10-13 | 1993-09-09 | 금성일렉트론 주식회사 | Npn형 vccd 구조의 고체촬상 소자 |
JPH04286361A (ja) * | 1991-03-15 | 1992-10-12 | Sony Corp | 固体撮像装置 |
US5288656A (en) * | 1991-03-15 | 1994-02-22 | Sony Corporation | Method of manufacturing a CCD solid state image sensing device |
KR940009648B1 (ko) * | 1991-10-15 | 1994-10-15 | 금성일렉트론 주식회사 | 전하결합소자의 제조방법 |
JP2970307B2 (ja) * | 1993-05-17 | 1999-11-02 | 日本電気株式会社 | 固体撮像装置の製造方法 |
JP2755176B2 (ja) * | 1994-06-30 | 1998-05-20 | 日本電気株式会社 | 固体撮像素子 |
JP2797993B2 (ja) * | 1995-02-21 | 1998-09-17 | 日本電気株式会社 | 固体撮像装置およびその製造方法 |
JP2003060192A (ja) * | 2001-08-20 | 2003-02-28 | Sony Corp | 固体撮像装置の製造方法 |
JP3530159B2 (ja) * | 2001-08-22 | 2004-05-24 | 松下電器産業株式会社 | 固体撮像装置およびその製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1199934A (en) * | 1966-10-14 | 1970-07-22 | Plessey Co Ltd | Improvements in or relating to Photo-Electric Devices |
US3838439A (en) * | 1970-03-18 | 1974-09-24 | Texas Instruments Inc | Phototransistor having a buried base |
GB1447410A (en) * | 1973-10-20 | 1976-08-25 | Ferranti Ltd | Photocells |
US4079358A (en) * | 1976-10-04 | 1978-03-14 | Micro-Bit Corporation | Buried junction MOS memory capacitor target for electron beam addressable memory and method of using same |
JPS5812744B2 (ja) * | 1978-04-06 | 1983-03-10 | シャープ株式会社 | 半導体装置 |
JPS55156358A (en) * | 1979-05-25 | 1980-12-05 | Hitachi Ltd | Semiconductor memory device |
US4450464A (en) * | 1980-07-23 | 1984-05-22 | Matsushita Electric Industrial Co., Ltd. | Solid state area imaging apparatus having a charge transfer arrangement |
DE3168333D1 (en) * | 1980-09-19 | 1985-02-28 | Nec Corp | Semiconductor photoelectric converter |
JPS57125332A (en) * | 1981-01-28 | 1982-08-04 | Fujitsu Ltd | Infrared rays detector |
JPS5838081A (ja) * | 1981-08-29 | 1983-03-05 | Sony Corp | 固体撮像装置 |
NL8202761A (nl) * | 1982-07-08 | 1984-02-01 | Stichting Fund Ond Material | Halfgeleiderinrichting. |
JPS5919480A (ja) * | 1982-07-26 | 1984-01-31 | Olympus Optical Co Ltd | 固体撮像装置 |
JPS59196669A (ja) * | 1983-04-22 | 1984-11-08 | Matsushita Electronics Corp | 固体撮像装置 |
JPS6097681A (ja) * | 1983-10-31 | 1985-05-31 | Matsushita Electric Works Ltd | モノリシツク集積回路 |
NL8304035A (nl) * | 1983-11-24 | 1985-06-17 | Philips Nv | Blooming ongevoelige beeldopneeminrichting en werkwijze ter vervaardiging daarvan. |
-
1985
- 1985-10-17 DE DE8585113198T patent/DE3586452T2/de not_active Expired - Lifetime
- 1985-10-17 EP EP85113198A patent/EP0178664B1/de not_active Expired
-
1988
- 1988-09-26 US US07/251,026 patent/US4947224A/en not_active Expired - Lifetime
-
1990
- 1990-06-27 US US07/544,620 patent/US5041392A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0178664A3 (en) | 1986-10-15 |
US5041392A (en) | 1991-08-20 |
EP0178664B1 (de) | 1992-08-05 |
DE3586452T2 (de) | 1993-03-18 |
US4947224A (en) | 1990-08-07 |
EP0178664A2 (de) | 1986-04-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3785901D1 (de) | Festes elektrochemisches element und verfahren zu seiner herstellung. | |
DE3783103D1 (de) | Elektrochemischer gassensor und verfahren zu seiner herstellung. | |
DE3583757D1 (de) | Keramisches material und verfahren zu seiner herstellung. | |
DE3688093D1 (de) | Durchsichtiger gegenstand und verfahren zu seiner herstellung. | |
DE3784612D1 (de) | Thermistor und verfahren zu seiner herstellung. | |
DE58904551D1 (de) | Drucksensor und verfahren zu seiner herstellung. | |
DE3766878D1 (de) | Prothesenteil sowie verfahren zu seiner herstellung. | |
DE3482814D1 (de) | Behaelter und verfahren zu seiner herstellung. | |
DE3867724D1 (de) | Modifiziertes feinpulveriges polytetrafluoraethylen und verfahren zu seiner herstellung. | |
DE3681938D1 (de) | Halbleitersensor und verfahren zu seiner herstellung. | |
DE3877256D1 (de) | Beschichteter gegenstand und verfahren zu seiner herstellung. | |
DE3865616D1 (de) | Poroeser kohlenstoff-kohlenstoff-verbundwerkstoff und verfahren zu seiner herstellung. | |
DE3684654D1 (de) | Elektrochemisches element und verfahren zu seiner herstellung. | |
DE3579367D1 (de) | Halbleiterphotodetektor und verfahren zu seiner herstellung. | |
DE3578375D1 (de) | Knochenzement und verfahren zu seiner herstellung. | |
DE3765673D1 (de) | Kernbrennstoffsinterkoerper und verfahren zu seiner herstellung. | |
DE3582211D1 (de) | Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung. | |
DE59005531D1 (de) | Temperatursensor und verfahren zu seiner herstellung. | |
DE3867578D1 (de) | Poroeser kohlenstoff-kohlenstoff-verbundwerkstoff und verfahren zu seiner herstellung. | |
DE3579765D1 (de) | Strukturelles betonteil und verfahren zu seiner herstellung. | |
DE3670911D1 (de) | Elektrochemisches geraet und verfahren zu seiner herstellung. | |
DE3878475D1 (de) | Organopolysiloxanemulsion und verfahren zu ihrer herstellung. | |
DE3676655D1 (de) | Verbundwerkstoff und verfahren zu seiner herstellung. | |
DE3586452D1 (de) | Festkoerperbildsensor und verfahren zu seiner herstellung. | |
DE3679698D1 (de) | Mos-kondensator und verfahren zu seiner herstellung. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., KADOMA, |