JPS57125332A - Infrared rays detector - Google Patents
Infrared rays detectorInfo
- Publication number
- JPS57125332A JPS57125332A JP56012130A JP1213081A JPS57125332A JP S57125332 A JPS57125332 A JP S57125332A JP 56012130 A JP56012130 A JP 56012130A JP 1213081 A JP1213081 A JP 1213081A JP S57125332 A JPS57125332 A JP S57125332A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type impurity
- semiconductor
- infrared rays
- dotted line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 abstract 4
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000009413 insulation Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Radiation Pyrometers (AREA)
Abstract
PURPOSE:To obtain an infrared detector highly sensitive and fast responsive with a low power consumption particularly excellent in the reverse current/voltage characteristic by exposing a region surrounded by a p-n junction to the surface of a semiconductor in a compound semiconductor with a smaller area than that in a semiconductor bulk. CONSTITUTION:An n type impurity is diffused from the top of a p type compound semiconductor substrate 1 to form an impurity-doped region 2. Then, after a given area of a region 2 is covered with a photoresist 7, a p type impurity is injected in the direction of the arrow a to form a p type impurity-doped region 6 at a greater part of the region 2 in such a manner as to join the substrate 1 at the dotted line 9. Then, except for the resist 7, a ZnS insulation film 3 is applied and a contact hole 8 is made to provide a leader wire 4 such an In. This allows the reduction of the diameter D3 of the region 2 surrounded by the dotted line 5 keeping the diameter D1 of the region 2 in a bulk thereby providing a highly sensitive infrared rays detector.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56012130A JPS57125332A (en) | 1981-01-28 | 1981-01-28 | Infrared rays detector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56012130A JPS57125332A (en) | 1981-01-28 | 1981-01-28 | Infrared rays detector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57125332A true JPS57125332A (en) | 1982-08-04 |
Family
ID=11796944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56012130A Pending JPS57125332A (en) | 1981-01-28 | 1981-01-28 | Infrared rays detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57125332A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0178664A2 (en) * | 1984-10-18 | 1986-04-23 | Matsushita Electronics Corporation | Solid state image sensing device and method for making the same |
-
1981
- 1981-01-28 JP JP56012130A patent/JPS57125332A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0178664A2 (en) * | 1984-10-18 | 1986-04-23 | Matsushita Electronics Corporation | Solid state image sensing device and method for making the same |
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