DE3486317D1 - Vorrichtung und Verfahren zur Plasmabehandlung von Kunstharz. - Google Patents

Vorrichtung und Verfahren zur Plasmabehandlung von Kunstharz.

Info

Publication number
DE3486317D1
DE3486317D1 DE3486317T DE3486317T DE3486317D1 DE 3486317 D1 DE3486317 D1 DE 3486317D1 DE 3486317 T DE3486317 T DE 3486317T DE 3486317 T DE3486317 T DE 3486317T DE 3486317 D1 DE3486317 D1 DE 3486317D1
Authority
DE
Germany
Prior art keywords
synthetic resin
plasma treatment
plasma
treatment
synthetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3486317T
Other languages
English (en)
Other versions
DE3486317T2 (de
Inventor
Kenji Fukuta
Takaoki Kaneko
Yoshinobu Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP58029370A external-priority patent/JPS59155440A/ja
Priority claimed from JP6373483A external-priority patent/JPS59189130A/ja
Priority claimed from JP6373583A external-priority patent/JPS59189131A/ja
Priority claimed from JP6373383A external-priority patent/JPS59189129A/ja
Priority claimed from JP11527383A external-priority patent/JPS608048A/ja
Priority claimed from JP11527483A external-priority patent/JPS608049A/ja
Priority claimed from JP13441683A external-priority patent/JPS6025733A/ja
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Publication of DE3486317D1 publication Critical patent/DE3486317D1/de
Publication of DE3486317T2 publication Critical patent/DE3486317T2/de
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/19—Details relating to the geometry of the reactor
    • B01J2219/194—Details relating to the geometry of the reactor round
    • B01J2219/1941—Details relating to the geometry of the reactor round circular or disk-shaped
    • B01J2219/1942—Details relating to the geometry of the reactor round circular or disk-shaped spherical
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2023/00—Use of polyalkenes or derivatives thereof as moulding material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/336—Changing physical properties of treated surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE3486317T 1983-02-25 1984-02-23 Vorrichtung und Verfahren zur Plasmabehandlung von Kunstharz. Expired - Fee Related DE3486317T2 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP58029370A JPS59155440A (ja) 1983-02-25 1983-02-25 プラズマ処理装置
JP6373383A JPS59189129A (ja) 1983-04-13 1983-04-13 プラズマ分岐処理方法
JP6373583A JPS59189131A (ja) 1983-04-13 1983-04-13 プラズマ処理装置
JP6373483A JPS59189130A (ja) 1983-04-13 1983-04-13 プラズマ処理方法
JP11527483A JPS608049A (ja) 1983-06-28 1983-06-28 プラズマ処理方法
JP11527383A JPS608048A (ja) 1983-06-28 1983-06-28 プラズマ処理方法
JP13441683A JPS6025733A (ja) 1983-07-25 1983-07-25 プラズマ処理方法

Publications (2)

Publication Number Publication Date
DE3486317D1 true DE3486317D1 (de) 1994-07-28
DE3486317T2 DE3486317T2 (de) 1994-10-13

Family

ID=27564219

Family Applications (2)

Application Number Title Priority Date Filing Date
DE3486317T Expired - Fee Related DE3486317T2 (de) 1983-02-25 1984-02-23 Vorrichtung und Verfahren zur Plasmabehandlung von Kunstharz.
DE3486470T Expired - Fee Related DE3486470T2 (de) 1983-02-25 1984-02-23 Verfahren zum Plasmabehandeln von Kunststoffharz

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE3486470T Expired - Fee Related DE3486470T2 (de) 1983-02-25 1984-02-23 Verfahren zum Plasmabehandeln von Kunststoffharz

Country Status (4)

Country Link
US (1) US4678644A (de)
EP (2) EP0461683B1 (de)
AU (5) AU549376B2 (de)
DE (2) DE3486317T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752426A (en) * 1985-06-27 1988-06-21 Yoshito Ikada Process for manufacture of plastic resinous tubes
JPH01127679A (ja) * 1987-03-27 1989-05-19 Canon Inc 堆積膜形成方法
JPH0754759B2 (ja) * 1987-04-27 1995-06-07 日本電信電話株式会社 プラズマ処理方法および装置並びにプラズマ処理装置用モード変換器
FR2616088B1 (fr) * 1987-06-03 1991-07-05 Rifa Sa Procede et installation pour traiter la surface d'objets
DE3843098A1 (de) * 1988-12-21 1990-06-28 Technics Plasma Gmbh Verfahren und vorrichtung zur kunststoffbeschichtung von strangprofilen
FR2658115B1 (fr) * 1990-02-15 1992-05-07 Elf Aquitaine Procede d'amelioration de l'aptitude a la mise en peinture d'objets faconnes a partir d'alliages polyamide/polyolefine.
US5419861A (en) * 1990-02-15 1995-05-30 Elf Aquitaine Production Method for improving the paintability of objects fashioned from polyamide and polyolefin blends
US5053246A (en) * 1990-03-30 1991-10-01 The Goodyear Tire & Rubber Company Process for the surface treatment of polymers for reinforcement-to-rubber adhesion
JP3063769B2 (ja) * 1990-07-17 2000-07-12 イーシー化学株式会社 大気圧プラズマ表面処理法
DE59206558D1 (de) * 1991-12-23 1996-07-18 Balzers Hochvakuum Verfahren zur Plasmabehandlung einer Werkstückoberfläche, Vakuumbehandlungsanlage zu dessen Ausführung und Verwendung des Verfahrens bzw. der Anlage und lackierter, vorgängig plasmabehandelter Kunststoffteil
US7250196B1 (en) * 1999-10-26 2007-07-31 Basic Resources, Inc. System and method for plasma plating
JP5138131B2 (ja) * 2001-03-28 2013-02-06 忠弘 大見 マイクロ波プラズマプロセス装置及びプラズマプロセス制御方法
GB0902784D0 (en) * 2009-02-19 2009-04-08 Gasplas As Plasma reactor
NO339087B1 (no) * 2010-08-17 2016-11-14 Gasplas As Anordning, system og fremgangsmåte for fremstilling av hydrogen
GB2490355B (en) 2011-04-28 2015-10-14 Gasplas As Method for processing a gas and a device for performing the method
US11633710B2 (en) 2018-08-23 2023-04-25 Transform Materials Llc Systems and methods for processing gases
CN112867702B (zh) 2018-08-23 2024-07-26 转化材料有限公司 处理气体的系统和方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018561A (en) * 1958-12-15 1962-01-30 Ind Refrigeration Co Inc High vacuum system
US4192706A (en) * 1975-01-22 1980-03-11 Tokyo Shibaura Electric Co., Ltd. Gas-etching device
JPS5211175A (en) * 1975-07-18 1977-01-27 Toshiba Corp Activated gas reacting apparatus
JPS5242075A (en) * 1975-09-29 1977-04-01 Nippon Denso Co Ltd Device for controlling gas atmosphere in semiconductor producing equip ment
US4233109A (en) * 1976-01-16 1980-11-11 Zaidan Hojin Handotai Kenkyu Shinkokai Dry etching method
JPS5378170A (en) * 1976-12-22 1978-07-11 Toshiba Corp Continuous processor for gas plasma etching
FR2380070A1 (fr) * 1977-02-09 1978-09-08 Cit Alcatel Machine d'evaporation sous vide a cycle simplifie
JPS53121469A (en) * 1977-03-31 1978-10-23 Toshiba Corp Gas etching unit
JPS5939178B2 (ja) * 1977-04-25 1984-09-21 株式会社東芝 活性化ガス発生装置
JPS5432184A (en) * 1977-08-18 1979-03-09 Toshiba Corp Forming apparatus for nitride coating
JPS54123599A (en) * 1978-03-17 1979-09-25 Toshiba Corp Forming method for silicon nitride film
JPS55131175A (en) * 1979-03-30 1980-10-11 Toshiba Corp Surface treatment apparatus with microwave plasma
JPS55161067A (en) * 1979-06-04 1980-12-15 Hitachi Ltd Manufacturing apparatus of thin film
FR2463975A1 (fr) * 1979-08-22 1981-02-27 Onera (Off Nat Aerospatiale) Procede et appareil pour la gravure chimique par voie seche des circuits integres
US4282267A (en) * 1979-09-20 1981-08-04 Western Electric Co., Inc. Methods and apparatus for generating plasmas
JPS5673539A (en) * 1979-11-22 1981-06-18 Toshiba Corp Surface treating apparatus of microwave plasma
JPS56102577A (en) * 1980-01-18 1981-08-17 Mitsubishi Electric Corp Method and device for forming thin film
JPS56114332A (en) * 1980-02-15 1981-09-08 Nippon Telegr & Teleph Corp <Ntt> Forming method for semiconductor insulating film
JPS56147831A (en) * 1980-04-16 1981-11-17 Toshiba Corp Modifying method of plastic surface
JPS56147832A (en) * 1980-04-16 1981-11-17 Toshiba Corp Surface treating device
CA1159012A (en) * 1980-05-02 1983-12-20 Seitaro Matsuo Plasma deposition apparatus
FR2483310A1 (fr) * 1980-05-29 1981-12-04 Fibar Ste Civile Immob Procede de traitement permettant de rendre hydrophiles des lentilles corneennes de contact
JPS57167631A (en) * 1981-03-13 1982-10-15 Fujitsu Ltd Plasma vapor-phase growing method
DD201461A1 (de) * 1981-12-24 1983-07-20 Hecht Hans Christian Verfahren zur erzeugung eines oertlich konstanten arbeitsgasdruckes
JPS58147433A (ja) * 1982-02-26 1983-09-02 Hashimoto Forming Co Ltd 合成樹脂成形面のプラズマ処理方法
JPS58208326A (ja) * 1982-05-31 1983-12-05 Hashimoto Forming Co Ltd プラズマ処理方法
JPS5920332A (ja) * 1982-07-27 1984-02-02 Toyota Motor Corp プラズマ処理を施す方法および装置
JPS5925902A (ja) * 1982-07-31 1984-02-10 Sumitomo Electric Ind Ltd 焼結法
JPS5986633A (ja) * 1982-11-10 1984-05-18 Toyota Motor Corp プラズマ処理を施す方法および装置
JPS5986228A (ja) * 1982-11-10 1984-05-18 Toshiba Corp 窒化膜生成方法
JPS59100143A (ja) * 1982-11-30 1984-06-09 Toyota Motor Corp 合成樹脂製品のプラズマ処理装置

Also Published As

Publication number Publication date
EP0120307A2 (de) 1984-10-03
AU8223787A (en) 1988-03-31
EP0461683A3 (en) 1993-09-22
AU549376B2 (en) 1986-01-23
AU603397B2 (en) 1990-11-15
DE3486470T2 (de) 1999-04-29
EP0120307A3 (en) 1989-05-03
AU8223987A (en) 1988-03-31
EP0461683B1 (de) 1998-09-23
AU8223887A (en) 1988-04-14
AU2467184A (en) 1984-10-11
EP0461683A2 (de) 1991-12-18
EP0120307B1 (de) 1994-06-15
DE3486317T2 (de) 1994-10-13
DE3486470D1 (de) 1998-10-29
US4678644A (en) 1987-07-07
AU8224087A (en) 1988-04-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee