DE3419710C2 - - Google Patents
Info
- Publication number
- DE3419710C2 DE3419710C2 DE3419710A DE3419710A DE3419710C2 DE 3419710 C2 DE3419710 C2 DE 3419710C2 DE 3419710 A DE3419710 A DE 3419710A DE 3419710 A DE3419710 A DE 3419710A DE 3419710 C2 DE3419710 C2 DE 3419710C2
- Authority
- DE
- Germany
- Prior art keywords
- silicon substrate
- operational amplifier
- semiconductor converter
- main surface
- strain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 47
- 239000000758 substrate Substances 0.000 claims description 32
- 229910021419 crystalline silicon Inorganic materials 0.000 claims description 15
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 15
- 230000035945 sensitivity Effects 0.000 claims description 11
- 238000009792 diffusion process Methods 0.000 claims description 5
- 238000010292 electrical insulation Methods 0.000 claims description 2
- 238000009413 insulation Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 6
- 206010040925 Skin striae Diseases 0.000 description 5
- 208000031439 Striae Distensae Diseases 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000002372 labelling Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/50—Devices controlled by mechanical forces, e.g. pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/14—Housings
- G01L19/148—Details about the circuit board integration, e.g. integrated with the diaphragm surface or encapsulation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0054—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements integral with a semiconducting diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/02—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning
- G01L9/06—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices
- G01L9/065—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices with temperature compensating means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58091443A JPS59217375A (ja) | 1983-05-26 | 1983-05-26 | 半導体機械−電気変換装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3419710A1 DE3419710A1 (de) | 1984-11-29 |
DE3419710C2 true DE3419710C2 (en, 2012) | 1987-12-03 |
Family
ID=14026507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3419710A Granted DE3419710A1 (de) | 1983-05-26 | 1984-05-26 | Halbleiterwandler |
Country Status (3)
Country | Link |
---|---|
US (1) | US4576052A (en, 2012) |
JP (1) | JPS59217375A (en, 2012) |
DE (1) | DE3419710A1 (en, 2012) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1993007457A1 (de) * | 1991-10-04 | 1993-04-15 | Robert Bosch Gmbh | Drucksensor |
WO1993010430A1 (de) * | 1991-11-15 | 1993-05-27 | Robert Bosch Gmbh | Silizium-chip zur verwendung in einem kraftsensor |
DE19527687A1 (de) * | 1995-07-28 | 1997-01-30 | Bosch Gmbh Robert | Sensor |
DE112015001090B4 (de) | 2014-03-05 | 2022-09-15 | Denso Corporation | Erfassungsvorrichtung für eine physikalische Quantität |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4777826A (en) * | 1985-06-20 | 1988-10-18 | Rosemount Inc. | Twin film strain gauge system |
IT206726Z2 (it) * | 1985-09-17 | 1987-10-01 | Marelli Autronica | Dispositivo misuratore di pressione |
JPS62108842U (en, 2012) * | 1985-12-26 | 1987-07-11 | ||
DE3616308C2 (de) * | 1986-05-14 | 1995-09-21 | Bosch Gmbh Robert | Sensor |
JPS6323371A (ja) * | 1986-07-16 | 1988-01-30 | Nippon Denso Co Ltd | 半導体歪検出器 |
EP0262366A1 (de) * | 1986-09-30 | 1988-04-06 | Siemens Aktiengesellschaft | Drucksensorelement |
US4966039A (en) * | 1988-04-21 | 1990-10-30 | Marelli Autronica S.P.A. | Electrical force and/or deformation sensor, particularly for use as a pressure sensor |
US5036286A (en) * | 1988-06-03 | 1991-07-30 | The Research Corporation Of The University Of Hawaii | Magnetic and electric force sensing method and apparatus |
US4883992A (en) * | 1988-09-06 | 1989-11-28 | Delco Electronics Corporation | Temperature compensated voltage generator |
JPH0777266B2 (ja) * | 1988-12-28 | 1995-08-16 | 株式会社豊田中央研究所 | 半導体歪み検出装置 |
US5135488A (en) * | 1989-03-17 | 1992-08-04 | Merit Medical Systems, Inc. | System and method for monitoring, displaying and recording balloon catheter inflation data |
US5184515A (en) * | 1989-06-22 | 1993-02-09 | Ic Sensors, Inc. | Single diaphragm transducer with multiple sensing elements |
JP3071202B2 (ja) * | 1989-07-19 | 2000-07-31 | 富士電機株式会社 | 半導体圧力センサの増巾補償回路 |
DE3925177A1 (de) * | 1989-07-27 | 1991-02-07 | Siemens Ag | Schaltungsanordnung zur temperaturstabilen verstaerkung einer differenzspannung |
US5184520A (en) * | 1989-10-18 | 1993-02-09 | Ishida Scales Mfg. Co., Ltd. | Load sensor |
JPH03233334A (ja) * | 1990-02-08 | 1991-10-17 | Nec Corp | 半導体圧力センサ |
JPH0465643A (ja) * | 1990-07-05 | 1992-03-02 | Mitsubishi Electric Corp | 半導体圧力センサ及びその製造方法 |
US5174014A (en) * | 1990-07-27 | 1992-12-29 | Data Instruments, Inc. | Method of manufacturing pressure transducers |
JPH04105369A (ja) * | 1990-08-24 | 1992-04-07 | Honda Motor Co Ltd | 半導体センサ |
US5289721A (en) * | 1990-09-10 | 1994-03-01 | Nippondenso Co., Ltd. | Semiconductor pressure sensor |
US5279164A (en) * | 1990-12-18 | 1994-01-18 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor pressure sensor with improved temperature compensation |
JP2643029B2 (ja) * | 1990-12-18 | 1997-08-20 | 三菱電機株式会社 | 半導体圧力センサ装置 |
US5606117A (en) * | 1991-02-27 | 1997-02-25 | Robert Bosch Gmbh | Pressure sensor for measuring pressure in an internal combustion engine |
JPH05149814A (ja) * | 1991-11-29 | 1993-06-15 | Fuji Electric Co Ltd | 二重ダイヤフラム式半導体圧力センサ |
JP2610736B2 (ja) * | 1991-12-11 | 1997-05-14 | 株式会社フジクラ | 半導体圧力センサの増幅補償回路 |
DE4211997A1 (de) * | 1992-04-09 | 1993-10-14 | Jaeger Erich Gmbh & Co Kg | Verfahren und Schaltungsanordnung zur elektrischen Kompensation des Temperatureinflusses auf das Meßsignal von mechanoelektrischen Meßwandlern |
US5343755A (en) * | 1993-05-05 | 1994-09-06 | Rosemount Inc. | Strain gage sensor with integral temperature signal |
JP2991014B2 (ja) * | 1993-10-08 | 1999-12-20 | 三菱電機株式会社 | 圧力センサ |
US5507171A (en) * | 1994-04-15 | 1996-04-16 | Ssi Technologies, Inc. | Electronic circuit for a transducer |
EP0702221A3 (en) * | 1994-09-14 | 1997-05-21 | Delco Electronics Corp | Sensor integrated on a chip |
US5668320A (en) * | 1995-06-19 | 1997-09-16 | Cardiometrics, Inc. | Piezoresistive pressure transducer circuitry accommodating transducer variability |
US5551301A (en) * | 1995-06-19 | 1996-09-03 | Cardiometrics, Inc. | Piezoresistive pressure transducer circuitry accommodating transducer variability |
JP3727133B2 (ja) * | 1997-03-14 | 2005-12-14 | 日本たばこ産業株式会社 | 荷重測定方法及び荷重測定装置 |
CA2320857A1 (en) * | 1998-02-18 | 1999-08-26 | Honeywell Data Instruments, Inc. | Electrically insulated strain gage |
US6729187B1 (en) | 1999-04-29 | 2004-05-04 | The Board Of Governors For Higher Education, State Of Rhode Island And Providence Plantations | Self-compensated ceramic strain gage for use at high temperatures |
CN1384914A (zh) * | 1999-04-29 | 2002-12-11 | 罗得岛及普罗维登斯属地高等教育管理委员会 | 在高温下使用的自动补偿陶瓷应变计量器 |
DE10013904A1 (de) * | 2000-03-21 | 2001-09-27 | Bosch Gmbh Robert | Mikromechanisches Bauelement und Abgleichverfahren |
JP2002148131A (ja) * | 2000-11-10 | 2002-05-22 | Denso Corp | 物理量検出装置 |
US6739199B1 (en) | 2003-03-10 | 2004-05-25 | Hewlett-Packard Development Company, L.P. | Substrate and method of forming substrate for MEMS device with strain gage |
US6868731B1 (en) * | 2003-11-20 | 2005-03-22 | Honeywell International, Inc. | Digital output MEMS pressure sensor and method |
DE102004026145A1 (de) * | 2004-05-28 | 2006-05-11 | Advanced Micro Devices, Inc., Sunnyvale | Halbleiterstruktur mit einem spannungsempfindlichen Element und Verfahren zum Messen einer elastischen Spannung in einer Halbleiterstruktur |
DE102004043874A1 (de) * | 2004-09-10 | 2006-03-16 | Robert Bosch Gmbh | Vorrichtung zur Erfassung des Drucks in einem Brennraum einer Verbrennungskraftmaschine |
US7032456B1 (en) * | 2004-12-30 | 2006-04-25 | The United States Of America As Represented By The Secretary Of The Navy | Isostatic piezoresistive pressure transducer with temperature output |
US7293466B2 (en) * | 2005-07-19 | 2007-11-13 | Hitachi, Ltd. | Bolt with function of measuring strain |
JP2007205803A (ja) * | 2006-01-31 | 2007-08-16 | Fujitsu Ltd | センサ信号処理システムおよびディテクタ |
JP4697004B2 (ja) * | 2006-03-29 | 2011-06-08 | 株式会社日立製作所 | 力学量測定装置 |
WO2011039567A1 (de) * | 2009-09-30 | 2011-04-07 | Tecsis Gmbh | Messvorrichtung mit verstimmbarem widerstand |
US8881597B2 (en) * | 2009-09-30 | 2014-11-11 | Tecsis Gmbh | Measuring device including detection of deformations |
US9157822B2 (en) * | 2011-02-01 | 2015-10-13 | Kulite Semiconductor Products, Inc. | Electronic interface for LVDT-type pressure transducers using piezoresistive sensors |
US9297687B2 (en) * | 2013-05-17 | 2016-03-29 | Sensata Technologies, Inc. | Sense element having a stud fitted within the sense element |
WO2015072189A1 (ja) * | 2013-11-14 | 2015-05-21 | シャープ株式会社 | 圧力センサー、圧力センシングシステム、および圧力センサーの製造方法 |
CN105806520A (zh) * | 2016-05-18 | 2016-07-27 | 北京科技大学 | 一种电阻应变式压力传感器及其测试方法 |
JP7629762B2 (ja) * | 2021-03-12 | 2025-02-14 | Tdk株式会社 | 圧力センサおよびセンサシステム |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2065640B1 (en, 2012) * | 1969-09-09 | 1976-03-19 | Bordeaux Sud | |
US3836796A (en) * | 1973-09-24 | 1974-09-17 | Nat Semiconductor Corp | Semiconductor pressure transducer employing novel temperature compensation means |
US4300395A (en) * | 1978-11-08 | 1981-11-17 | Tokyo Shibaura Denki Kabushiki Kaisha | Semiconductor pressure detection device |
US4333349A (en) * | 1980-10-06 | 1982-06-08 | Kulite Semiconductor Products, Inc. | Binary balancing apparatus for semiconductor transducer structures |
US4462018A (en) * | 1982-11-05 | 1984-07-24 | Gulton Industries, Inc. | Semiconductor strain gauge with integral compensation resistors |
-
1983
- 1983-05-26 JP JP58091443A patent/JPS59217375A/ja active Granted
-
1984
- 1984-05-24 US US06/613,968 patent/US4576052A/en not_active Expired - Fee Related
- 1984-05-26 DE DE3419710A patent/DE3419710A1/de active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1993007457A1 (de) * | 1991-10-04 | 1993-04-15 | Robert Bosch Gmbh | Drucksensor |
WO1993010430A1 (de) * | 1991-11-15 | 1993-05-27 | Robert Bosch Gmbh | Silizium-chip zur verwendung in einem kraftsensor |
DE19527687A1 (de) * | 1995-07-28 | 1997-01-30 | Bosch Gmbh Robert | Sensor |
DE112015001090B4 (de) | 2014-03-05 | 2022-09-15 | Denso Corporation | Erfassungsvorrichtung für eine physikalische Quantität |
Also Published As
Publication number | Publication date |
---|---|
DE3419710A1 (de) | 1984-11-29 |
US4576052A (en) | 1986-03-18 |
JPH0367211B2 (en, 2012) | 1991-10-22 |
JPS59217375A (ja) | 1984-12-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
8128 | New person/name/address of the agent |
Representative=s name: SCHWABE, H., DIPL.-ING. SANDMAIR, K., DIPL.-CHEM. |
|
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |