DE3249708C3 - Lichtempfindliches Element aus einem Träger und einer lichtempfindlichen Schicht - Google Patents
Lichtempfindliches Element aus einem Träger und einer lichtempfindlichen SchichtInfo
- Publication number
- DE3249708C3 DE3249708C3 DE3249708A DE3249708A DE3249708C3 DE 3249708 C3 DE3249708 C3 DE 3249708C3 DE 3249708 A DE3249708 A DE 3249708A DE 3249708 A DE3249708 A DE 3249708A DE 3249708 C3 DE3249708 C3 DE 3249708C3
- Authority
- DE
- Germany
- Prior art keywords
- photosensitive
- photosensitive element
- film
- acrylate
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Description
- (a) einem filmbildenden Polymerisat, das ein Vinyl copolymerisat ist, das als Comonomeres 0,1 bis 10 Gew.-% eines Monomeren, das eine Aminogruppe aufweist und das durch die Formel: dargestellt wird, enthält, worin n 0 oder eine ganze Zahl von 1 bis 3 bedeutet, R₁, R₂ und R₃ unabhängig voneinander ein Wasserstoffatom oder eine Methylgruppe, R₄ und R₅ unabhängig voneinander eine Alkylgruppe mit 1 bis 4 Kohlenstoffatomen bedeuten oder worin R₄ und R₅ zusammen mit dem Stickstoffatom einen gesättigten alicyclischen 4- bis 7gliedrigen Ring bilden,
- (b) einer ethylenisch ungesättigten Verbindung,
- (c) einem Photoinitiator und/oder einem Photo initiatorsystem,
- (d) einer organischen Bromverbindung, die Brom an ein aliphatisches Kohlenstoffatom gebunden enthält, und
- (e) gegebenenfalls weiteren üblichen Zusatzstoffen.
Bestandteile | |
Teile | |
P-1 | |
165,7 | |
Trimethylolpropantriacrylat | 35 |
Tetraethylenglykoldiacrylat | 5 |
Benzophenon | 4,5 |
Michler′s Keton | 0,5 |
Methylenbis-(1,1-di-t-butyl-4,4′-dimethylphenol) | 0,5 |
Tetrabromkohlenstoff | 2,5 |
Viktoria-Reinblau (C. I. 42 595) | 0,08 |
Leukokristall-Violett (Methyliden-tris-(N,N-di-methylanilin)) | 0,5 |
Methylethylketon | 40 |
Bestandteile | |
Teile | |
Methylmethacrylat | |
96 | |
Ethylacrylat | 2 |
Acrylamid | 1 |
Monomere der Formel (2), (3), (4) oder (5) | 1 |
Bestandteile | |
Teile | |
Polymerisat, das die Monomereinheiten von (2), (3), (4) oder (5) enthält | |
60 | |
Pentaerythrittriacrylat | 30 |
Tetraethylenglykoldiacrylat | 10 |
Benzophenon | 4,5 |
Michler′s Keton | 0,5 |
Methylenbis-(1,1-di-t-butyl-4,4′-dimethylphenol) | 0,6 |
Tetrabromkohlenstoff | 1,5 |
Pentabromethan | 0,5 |
Leukokristall-Violett (Methyliden-tris-(N,N-di-methylanilin)) | 0,3 |
Viktoria-Reinblau (C. I. 42 595) | 0,3 |
Methylethylketon | 40 |
ST-Stufenzahl | |
V-11 | |
7,8 | |
Vergleichsbeispiel 3 | 5,9 |
Claims (8)
- (a) einem filmbildenden Polymerisat, das ein Vinylcopoly merisat ist, das als Comonomeres 0,1 bis 10 Gew.-% eines Monomeren, das eine Aminogruppe aufweist und das durch die Formel: dargestellt wird, enthält, worin n 0 oder eine ganze Zahl von 1 bis 3 bedeutet, R₁, R₂ und R₃ unabhängig voneinander ein Wasserstoffatom oder eine Methylgruppe, R₄ und R₅ unab hängig voneinander eine Alkylgruppe mit 1 bis 4 Kohlenstoff atomen bedeuten oder worin R₄ und R₅ zusammen mit dem Stick stoffatom einen gesättigten alicyclischen 4- bis 7gliedrigen Ring bilden,
- (b) einer ethylenisch ungesättigten Verbindung,
- (c) einem Photoinitiator und/oder einem Photoinitiator system,
- (d) einer organischen Bromverbindung, die Brom an ein ali phatisches Kohlenstoffatom gebunden enthält, und
- (e) gegebenenfalls weiteren üblichen Zusatzstoffen.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823215513 DE3215513C3 (de) | 1981-04-27 | 1982-04-26 | Photoempfindliche Harzmasse |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6446581A JPS57192420A (en) | 1981-04-27 | 1981-04-27 | Photopolymer composition |
JP19126081A JPS5893046A (ja) | 1981-11-28 | 1981-11-28 | 感光性エレメント |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3249708C2 DE3249708C2 (de) | 1993-09-30 |
DE3249708C3 true DE3249708C3 (de) | 1993-09-30 |
Family
ID=26405577
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3249708A Expired - Lifetime DE3249708C3 (de) | 1981-04-27 | 1982-04-26 | Lichtempfindliches Element aus einem Träger und einer lichtempfindlichen Schicht |
Country Status (3)
Country | Link |
---|---|
US (1) | US4454219A (de) |
DE (1) | DE3249708C3 (de) |
GB (1) | GB2100278B (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3131448A1 (de) * | 1981-08-07 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse |
JPS6051833A (ja) * | 1983-07-01 | 1985-03-23 | Toray Ind Inc | 感光性樹脂組成物 |
US4532021A (en) * | 1983-07-18 | 1985-07-30 | Desoto, Inc. | Adherent ultraviolet cured coatings |
JPS6063532A (ja) * | 1983-08-16 | 1985-04-11 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS6318692A (ja) * | 1986-07-11 | 1988-01-26 | 日立化成工業株式会社 | 印刷配線板の製造方法 |
US4761435A (en) * | 1986-10-03 | 1988-08-02 | Desoto, Inc. | Polyamine-polyene ultraviolet coatings |
FR2606021B1 (fr) * | 1986-10-30 | 1989-08-25 | Provence Universite | Liants pour peintures resistant aux salissures marines et leur procede de preparation |
DE3706561A1 (de) * | 1987-02-28 | 1988-09-08 | Basf Ag | Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet |
DE3831782A1 (de) * | 1988-09-19 | 1990-03-29 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
US6060214A (en) * | 1990-07-02 | 2000-05-09 | Armstrong World Industries, Inc. | Photopolymerizable, coatable plastisol |
KR100520181B1 (ko) * | 1999-10-11 | 2005-10-10 | 주식회사 하이닉스반도체 | 신규한 포토레지스트 단량체, 그의 중합체 및 이를 함유하는 포토레지스트 조성물 |
WO2004041961A1 (en) * | 2002-11-04 | 2004-05-21 | Polymers Australia Pty Limited | Photochromic compositions and light transmissible articles |
DE602005019870D1 (de) * | 2004-04-30 | 2010-04-22 | Advanced Polymerik Pty Ltd | Photochrome zusammensetzungen und gegenstände mit polyetheroligomer |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3961961A (en) * | 1972-11-20 | 1976-06-08 | Minnesota Mining And Manufacturing Company | Positive or negative developable photosensitive composition |
CA1065085A (en) * | 1974-05-20 | 1979-10-23 | John P. Guarino | Radiation curable coating |
GB1547998A (en) * | 1975-03-26 | 1979-07-04 | Ici Ltd | Photopolymersisable compositions |
DE3131448A1 (de) * | 1981-08-07 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse |
-
1982
- 1982-04-20 US US06/370,295 patent/US4454219A/en not_active Expired - Lifetime
- 1982-04-26 DE DE3249708A patent/DE3249708C3/de not_active Expired - Lifetime
- 1982-04-26 GB GB8211964A patent/GB2100278B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US4454219A (en) | 1984-06-12 |
GB2100278A (en) | 1982-12-22 |
DE3249708C2 (de) | 1993-09-30 |
GB2100278B (en) | 1985-03-06 |
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Legal Events
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8363 | Opposition against the patent | ||
8325 | Change of the main classification |
Ipc: G03F 7/028 |
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8366 | Restricted maintained after opposition proceedings | ||
8305 | Restricted maintenance of patent after opposition | ||
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