DE3208659A1 - Bildreproduktionsmaterial und verfahren zu seiner herstellung - Google Patents

Bildreproduktionsmaterial und verfahren zu seiner herstellung

Info

Publication number
DE3208659A1
DE3208659A1 DE19823208659 DE3208659A DE3208659A1 DE 3208659 A1 DE3208659 A1 DE 3208659A1 DE 19823208659 DE19823208659 DE 19823208659 DE 3208659 A DE3208659 A DE 3208659A DE 3208659 A1 DE3208659 A1 DE 3208659A1
Authority
DE
Germany
Prior art keywords
metal
layer
photosensitive resin
resin layer
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19823208659
Other languages
German (de)
English (en)
Inventor
Kuniomi Shiga Etoh
Yoshiyasu Yono Itoh
Yoshio Otsu Katoh
Takeo Chiba Kohira
Takeo Tokorozawa Sugiura
Toshikiyo Toyonaka Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd, Toyobo Co Ltd filed Critical Toppan Printing Co Ltd
Publication of DE3208659A1 publication Critical patent/DE3208659A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE19823208659 1981-03-10 1982-03-10 Bildreproduktionsmaterial und verfahren zu seiner herstellung Withdrawn DE3208659A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3500881A JPS57148740A (en) 1981-03-10 1981-03-10 Image duplicating material

Publications (1)

Publication Number Publication Date
DE3208659A1 true DE3208659A1 (de) 1982-09-23

Family

ID=12430053

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19823208659 Withdrawn DE3208659A1 (de) 1981-03-10 1982-03-10 Bildreproduktionsmaterial und verfahren zu seiner herstellung

Country Status (3)

Country Link
US (1) US4419438A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS57148740A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3208659A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0425440A1 (de) * 1989-10-27 1991-05-02 Ciba-Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS59153861A (ja) * 1983-02-22 1984-09-01 Fuji Photo Film Co Ltd 平版印刷版用支持体
JPS59229563A (ja) * 1983-05-31 1984-12-24 Hitachi Chem Co Ltd 電子写真感光体
US4699859A (en) * 1984-09-07 1987-10-13 Toyo Boseki Kabushiki Kaisha Dot-etchable image-containing element useful in lithographic mask formation and its production
US4612275A (en) * 1985-04-26 1986-09-16 International Business Machines Corporation Multilayer resists with improved sensitivity and reduced proximity effect
JPS6270835A (ja) * 1985-09-24 1987-04-01 Kimoto & Co Ltd 剥離による画像形成材料
US4910117A (en) * 1987-07-27 1990-03-20 The Mead Corporation Microencapsulated imaging system employing a metallized backing
JPH0820733B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 ドライフイルムレジスト用光重合性組成物
US5552259A (en) * 1993-09-23 1996-09-03 Polaroid Corporation Adhesive composition, and imaging medium comprising this adhesive composition
JPH11237519A (ja) * 1998-02-24 1999-08-31 Oki Electric Ind Co Ltd 高分子パターンの形成方法
JP3769171B2 (ja) * 2000-05-17 2006-04-19 東京応化工業株式会社 フレキソ印刷版製造用多層感光材料
US7914949B2 (en) * 2005-02-24 2011-03-29 International Business Machines Corporation Method for testing a photomask

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2518451A1 (de) * 1974-04-25 1975-11-13 Fuji Photo Film Co Ltd Ein metallbild erzeugendes material
DE2830143A1 (de) * 1977-07-11 1979-01-18 Du Pont Photopolymerisierbare massen, ihre verwendung in materialien und verfahren zur erzeugung von polymerbildern

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
JPS516530A (ja) * 1974-07-04 1976-01-20 Toray Industries Gazokeiseizairyo
JPS59818B2 (ja) * 1979-03-23 1984-01-09 東洋紡績株式会社 感光性樹脂組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2518451A1 (de) * 1974-04-25 1975-11-13 Fuji Photo Film Co Ltd Ein metallbild erzeugendes material
DE2830143A1 (de) * 1977-07-11 1979-01-18 Du Pont Photopolymerisierbare massen, ihre verwendung in materialien und verfahren zur erzeugung von polymerbildern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0425440A1 (de) * 1989-10-27 1991-05-02 Ciba-Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen

Also Published As

Publication number Publication date
JPS57148740A (en) 1982-09-14
JPH0210936B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-03-12
US4419438A (en) 1983-12-06

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8130 Withdrawal