JPS57148740A - Image duplicating material - Google Patents
Image duplicating materialInfo
- Publication number
- JPS57148740A JPS57148740A JP3500881A JP3500881A JPS57148740A JP S57148740 A JPS57148740 A JP S57148740A JP 3500881 A JP3500881 A JP 3500881A JP 3500881 A JP3500881 A JP 3500881A JP S57148740 A JPS57148740 A JP S57148740A
- Authority
- JP
- Japan
- Prior art keywords
- compd
- layer
- photosensitive resin
- photochromism
- resin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3500881A JPS57148740A (en) | 1981-03-10 | 1981-03-10 | Image duplicating material |
US06/356,410 US4419438A (en) | 1981-03-10 | 1982-03-09 | Image forming material and method |
DE19823208659 DE3208659A1 (de) | 1981-03-10 | 1982-03-10 | Bildreproduktionsmaterial und verfahren zu seiner herstellung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3500881A JPS57148740A (en) | 1981-03-10 | 1981-03-10 | Image duplicating material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57148740A true JPS57148740A (en) | 1982-09-14 |
JPH0210936B2 JPH0210936B2 (ja) | 1990-03-12 |
Family
ID=12430053
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3500881A Granted JPS57148740A (en) | 1981-03-10 | 1981-03-10 | Image duplicating material |
Country Status (3)
Country | Link |
---|---|
US (1) | US4419438A (ja) |
JP (1) | JPS57148740A (ja) |
DE (1) | DE3208659A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59229563A (ja) * | 1983-05-31 | 1984-12-24 | Hitachi Chem Co Ltd | 電子写真感光体 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5956403A (ja) * | 1982-09-27 | 1984-03-31 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
JPS59153861A (ja) * | 1983-02-22 | 1984-09-01 | Fuji Photo Film Co Ltd | 平版印刷版用支持体 |
US4699859A (en) * | 1984-09-07 | 1987-10-13 | Toyo Boseki Kabushiki Kaisha | Dot-etchable image-containing element useful in lithographic mask formation and its production |
US4612275A (en) * | 1985-04-26 | 1986-09-16 | International Business Machines Corporation | Multilayer resists with improved sensitivity and reduced proximity effect |
JPS6270835A (ja) * | 1985-09-24 | 1987-04-01 | Kimoto & Co Ltd | 剥離による画像形成材料 |
US4910117A (en) * | 1987-07-27 | 1990-03-20 | The Mead Corporation | Microencapsulated imaging system employing a metallized backing |
JPH0820733B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | ドライフイルムレジスト用光重合性組成物 |
EP0425440B1 (de) * | 1989-10-27 | 1994-11-17 | Ciba-Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen |
US5552259A (en) * | 1993-09-23 | 1996-09-03 | Polaroid Corporation | Adhesive composition, and imaging medium comprising this adhesive composition |
JPH11237519A (ja) * | 1998-02-24 | 1999-08-31 | Oki Electric Ind Co Ltd | 高分子パターンの形成方法 |
JP3769171B2 (ja) * | 2000-05-17 | 2006-04-19 | 東京応化工業株式会社 | フレキソ印刷版製造用多層感光材料 |
US7914949B2 (en) * | 2005-02-24 | 2011-03-29 | International Business Machines Corporation | Method for testing a photomask |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS516530A (ja) * | 1974-07-04 | 1976-01-20 | Toray Industries | Gazokeiseizairyo |
JPS55127550A (en) * | 1979-03-23 | 1980-10-02 | Toyobo Co Ltd | Photosensitive resin composition |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3479185A (en) * | 1965-06-03 | 1969-11-18 | Du Pont | Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers |
JPS5821257B2 (ja) * | 1974-04-25 | 1983-04-28 | 富士写真フイルム株式会社 | キンゾクガゾウケイセイザイリヨウ |
GB1587476A (en) * | 1977-07-11 | 1981-04-01 | Du Pont | Photopolymerizable compositions and elements and methods of imaging |
-
1981
- 1981-03-10 JP JP3500881A patent/JPS57148740A/ja active Granted
-
1982
- 1982-03-09 US US06/356,410 patent/US4419438A/en not_active Expired - Fee Related
- 1982-03-10 DE DE19823208659 patent/DE3208659A1/de not_active Withdrawn
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS516530A (ja) * | 1974-07-04 | 1976-01-20 | Toray Industries | Gazokeiseizairyo |
JPS55127550A (en) * | 1979-03-23 | 1980-10-02 | Toyobo Co Ltd | Photosensitive resin composition |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59229563A (ja) * | 1983-05-31 | 1984-12-24 | Hitachi Chem Co Ltd | 電子写真感光体 |
JPH0578028B2 (ja) * | 1983-05-31 | 1993-10-27 | Hitachi Chemical Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
US4419438A (en) | 1983-12-06 |
JPH0210936B2 (ja) | 1990-03-12 |
DE3208659A1 (de) | 1982-09-23 |
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