JPS5764738A - Photoplate - Google Patents

Photoplate

Info

Publication number
JPS5764738A
JPS5764738A JP14045380A JP14045380A JPS5764738A JP S5764738 A JPS5764738 A JP S5764738A JP 14045380 A JP14045380 A JP 14045380A JP 14045380 A JP14045380 A JP 14045380A JP S5764738 A JPS5764738 A JP S5764738A
Authority
JP
Japan
Prior art keywords
layer
exposed part
film
exposed
transparent substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14045380A
Other languages
Japanese (ja)
Inventor
Masahiro Dan
Yasusuke Kaishima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Microcomputer System Ltd
Hitachi Ltd
Original Assignee
Hitachi Ltd
Hitachi Microcomputer Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Microcomputer Engineering Ltd filed Critical Hitachi Ltd
Priority to JP14045380A priority Critical patent/JPS5764738A/en
Publication of JPS5764738A publication Critical patent/JPS5764738A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To enhance resolution, to enable formation of a micropattern, and to reduce dependence of size variation on pattern size, by forming a low reflection film and an emulsion photosensitive agent layer on a transparent substrate. CONSTITUTION:A low reflection film consisting of a Cr film 12 and a CrO film 14, and a silver halide emulsion layer 16 are formed on a transparent substrate 10, such as glass to prepare a photoplate. The emulsion layer 16 is exposed as shown in the figure (A), developed to make the exposed part of the layer 16 black as shown in the figure (B), the unexposed part of the layer 16 is removed, as shown in the figure (C), the exposed part on which the layer 16 remains is used as a resist, the films 14, 12 are etched, as shown in the figure (D), and then, the exposed part of the layer 16 is removed to form a desired pattern, as shown in the figure (E).
JP14045380A 1980-10-09 1980-10-09 Photoplate Pending JPS5764738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14045380A JPS5764738A (en) 1980-10-09 1980-10-09 Photoplate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14045380A JPS5764738A (en) 1980-10-09 1980-10-09 Photoplate

Publications (1)

Publication Number Publication Date
JPS5764738A true JPS5764738A (en) 1982-04-20

Family

ID=15268964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14045380A Pending JPS5764738A (en) 1980-10-09 1980-10-09 Photoplate

Country Status (1)

Country Link
JP (1) JPS5764738A (en)

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