DE3207315C2 - Alkalifreies Glas für eine Maske zur Fotoätzung und seine Verwendung - Google Patents
Alkalifreies Glas für eine Maske zur Fotoätzung und seine VerwendungInfo
- Publication number
- DE3207315C2 DE3207315C2 DE3207315A DE3207315A DE3207315C2 DE 3207315 C2 DE3207315 C2 DE 3207315C2 DE 3207315 A DE3207315 A DE 3207315A DE 3207315 A DE3207315 A DE 3207315A DE 3207315 C2 DE3207315 C2 DE 3207315C2
- Authority
- DE
- Germany
- Prior art keywords
- glass
- mask
- same
- mol
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 title claims abstract description 59
- 238000001259 photo etching Methods 0.000 title claims abstract description 16
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 8
- 229910052785 arsenic Inorganic materials 0.000 claims abstract description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 7
- 239000000203 mixture Substances 0.000 abstract description 25
- 230000007547 defect Effects 0.000 abstract description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 19
- 230000000694 effects Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000011787 zinc oxide Substances 0.000 description 9
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 8
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000004031 devitrification Methods 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
- C03C3/105—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
- C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56126805A JPS5832038A (ja) | 1981-08-14 | 1981-08-14 | フオトエツチングマスク用無アルカリガラス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3207315A1 DE3207315A1 (de) | 1983-03-03 |
| DE3207315C2 true DE3207315C2 (de) | 1987-11-12 |
Family
ID=14944392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3207315A Expired DE3207315C2 (de) | 1981-08-14 | 1982-03-01 | Alkalifreies Glas für eine Maske zur Fotoätzung und seine Verwendung |
Country Status (5)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3808573A1 (de) * | 1987-06-15 | 1988-12-29 | Jenaer Glaswerk Veb | Photomaskenglas niedriger ausdehnung mit verbesserten hafteigenschaften |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4501819A (en) * | 1982-12-23 | 1985-02-26 | Kabushiki Kaisha Ohara Kogaku Garasu Seizosho | Glass for a photomask |
| NL8301604A (nl) * | 1983-05-06 | 1984-12-03 | Philips Nv | Dielektrisch glas in meerlagenschakelingen en hiermee uitgeruste dikke filmschakelingen. |
| JPS6033556A (ja) * | 1983-08-05 | 1985-02-20 | Konishiroku Photo Ind Co Ltd | ドライエッチング用フォトマスク素材 |
| JPS6042247A (ja) * | 1983-08-16 | 1985-03-06 | Asahi Glass Co Ltd | 低膨張性ガラス |
| US4554259A (en) * | 1984-05-08 | 1985-11-19 | Schott Glass Technologies, Inc. | Low expansion, alkali-free borosilicate glass suitable for photomask applications |
| DE69701255T2 (de) * | 1996-02-29 | 2000-08-10 | Btg International Ltd., London | Durch reaktion zwischen organischen polysäuren und basen hergestellter zement |
| GB2310663A (en) * | 1996-02-29 | 1997-09-03 | British Tech Group | Organic polyacid/base reaction cement |
| JP4677710B2 (ja) * | 2003-10-17 | 2011-04-27 | 東ソー株式会社 | 紫外線遮蔽ガラス、その製造方法、これを用いた紫外線遮蔽ガラス部材及び装置 |
| CN105957803A (zh) * | 2016-06-13 | 2016-09-21 | 四川洪芯微科技有限公司 | 一种半导体器件的钝化方法及半导体器件 |
| BR102016022710A2 (pt) | 2016-09-29 | 2018-05-02 | Brf S.A. | Processo de fabricação de um hidrolisado proteico animal, hidrolisado proteico animal e seus usos |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL63202C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1943-12-04 | |||
| US3069294A (en) * | 1954-06-03 | 1962-12-18 | Corning Glass Works | Electrical metal oxide resistor having a glass enamel coating |
| NL257758A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1958-12-02 | |||
| DE1421909A1 (de) * | 1960-11-14 | 1968-12-12 | Owens Illinois Inc | Feuerfeste Glaszusammensetzung |
| US3450546A (en) * | 1966-05-26 | 1969-06-17 | Corning Glass Works | Transparent glass-ceramic articles and method for producing |
| JPS5110844B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-04-24 | 1976-04-07 | ||
| GB1408256A (en) * | 1974-02-08 | 1975-10-01 | Du Pont | Dielectric compositions and glass frits for use as components thereof |
| DE2615534C3 (de) * | 1976-04-09 | 1978-10-05 | Jenaer Glaswerk Schott & Gen., 6500 Mainz | Für die Nachrichtenübertragung geeignete Lichtleitfaser mit Gradientenprofil aus Mehrkomponentengläsern mit angepaßtem Ausdehnungskoeffizienten zwischen Glaskern und Glasmantel sowie Verfahren zu ihrer Herstellung |
| JPS5645870A (en) * | 1979-09-17 | 1981-04-25 | Ngk Insulators Ltd | Ceramic structure mounted in ceramic cylindrical body with ceramic member having diffrent coefficient of thermal expansion |
-
1981
- 1981-08-14 JP JP56126805A patent/JPS5832038A/ja active Granted
-
1982
- 1982-02-24 US US06/351,688 patent/US4391916A/en not_active Expired - Lifetime
- 1982-02-26 GB GB08205828A patent/GB2107698B/en not_active Expired
- 1982-03-01 DE DE3207315A patent/DE3207315C2/de not_active Expired
- 1982-08-13 FR FR8214129A patent/FR2511360B1/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3808573A1 (de) * | 1987-06-15 | 1988-12-29 | Jenaer Glaswerk Veb | Photomaskenglas niedriger ausdehnung mit verbesserten hafteigenschaften |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5832038A (ja) | 1983-02-24 |
| GB2107698B (en) | 1984-11-28 |
| GB2107698A (en) | 1983-05-05 |
| JPS615665B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-02-20 |
| FR2511360A1 (fr) | 1983-02-18 |
| US4391916A (en) | 1983-07-05 |
| DE3207315A1 (de) | 1983-03-03 |
| FR2511360B1 (fr) | 1985-07-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8363 | Opposition against the patent | ||
| 8366 | Restricted maintained after opposition proceedings | ||
| 8305 | Restricted maintenance of patent after opposition | ||
| D4 | Patent maintained restricted |