GB2107698B - Alkali-free glass for photoetching mask( - Google Patents

Alkali-free glass for photoetching mask(

Info

Publication number
GB2107698B
GB2107698B GB08205828A GB8205828A GB2107698B GB 2107698 B GB2107698 B GB 2107698B GB 08205828 A GB08205828 A GB 08205828A GB 8205828 A GB8205828 A GB 8205828A GB 2107698 B GB2107698 B GB 2107698B
Authority
GB
United Kingdom
Prior art keywords
alkali
free glass
photoetching mask
photoetching
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08205828A
Other languages
English (en)
Other versions
GB2107698A (en
Inventor
Kenji Kakagawa
Isao Masuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of GB2107698A publication Critical patent/GB2107698A/en
Application granted granted Critical
Publication of GB2107698B publication Critical patent/GB2107698B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/105—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
    • C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB08205828A 1981-08-14 1982-02-26 Alkali-free glass for photoetching mask( Expired GB2107698B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56126805A JPS5832038A (ja) 1981-08-14 1981-08-14 フオトエツチングマスク用無アルカリガラス

Publications (2)

Publication Number Publication Date
GB2107698A GB2107698A (en) 1983-05-05
GB2107698B true GB2107698B (en) 1984-11-28

Family

ID=14944392

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08205828A Expired GB2107698B (en) 1981-08-14 1982-02-26 Alkali-free glass for photoetching mask(

Country Status (5)

Country Link
US (1) US4391916A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5832038A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3207315C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2511360B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2107698B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4501819A (en) * 1982-12-23 1985-02-26 Kabushiki Kaisha Ohara Kogaku Garasu Seizosho Glass for a photomask
NL8301604A (nl) * 1983-05-06 1984-12-03 Philips Nv Dielektrisch glas in meerlagenschakelingen en hiermee uitgeruste dikke filmschakelingen.
JPS6033556A (ja) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd ドライエッチング用フォトマスク素材
JPS6042247A (ja) * 1983-08-16 1985-03-06 Asahi Glass Co Ltd 低膨張性ガラス
US4554259A (en) * 1984-05-08 1985-11-19 Schott Glass Technologies, Inc. Low expansion, alkali-free borosilicate glass suitable for photomask applications
DD262653A1 (de) * 1987-06-15 1988-12-07 Jenaer Glaswerk Veb Photomaskenglas niedriger ausdehnung mit verbesserten hafteigenschaften
DE69701255T2 (de) * 1996-02-29 2000-08-10 Btg International Ltd., London Durch reaktion zwischen organischen polysäuren und basen hergestellter zement
GB2310663A (en) * 1996-02-29 1997-09-03 British Tech Group Organic polyacid/base reaction cement
JP4677710B2 (ja) * 2003-10-17 2011-04-27 東ソー株式会社 紫外線遮蔽ガラス、その製造方法、これを用いた紫外線遮蔽ガラス部材及び装置
CN105957803A (zh) * 2016-06-13 2016-09-21 四川洪芯微科技有限公司 一种半导体器件的钝化方法及半导体器件
BR102016022710A2 (pt) 2016-09-29 2018-05-02 Brf S.A. Processo de fabricação de um hidrolisado proteico animal, hidrolisado proteico animal e seus usos

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL63202C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1943-12-04
US3069294A (en) * 1954-06-03 1962-12-18 Corning Glass Works Electrical metal oxide resistor having a glass enamel coating
NL257758A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1958-12-02
DE1421909A1 (de) * 1960-11-14 1968-12-12 Owens Illinois Inc Feuerfeste Glaszusammensetzung
US3450546A (en) * 1966-05-26 1969-06-17 Corning Glass Works Transparent glass-ceramic articles and method for producing
JPS5110844B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-04-24 1976-04-07
GB1408256A (en) * 1974-02-08 1975-10-01 Du Pont Dielectric compositions and glass frits for use as components thereof
DE2615534C3 (de) * 1976-04-09 1978-10-05 Jenaer Glaswerk Schott & Gen., 6500 Mainz Für die Nachrichtenübertragung geeignete Lichtleitfaser mit Gradientenprofil aus Mehrkomponentengläsern mit angepaßtem Ausdehnungskoeffizienten zwischen Glaskern und Glasmantel sowie Verfahren zu ihrer Herstellung
JPS5645870A (en) * 1979-09-17 1981-04-25 Ngk Insulators Ltd Ceramic structure mounted in ceramic cylindrical body with ceramic member having diffrent coefficient of thermal expansion

Also Published As

Publication number Publication date
DE3207315C2 (de) 1987-11-12
JPS5832038A (ja) 1983-02-24
GB2107698A (en) 1983-05-05
JPS615665B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-02-20
FR2511360A1 (fr) 1983-02-18
US4391916A (en) 1983-07-05
DE3207315A1 (de) 1983-03-03
FR2511360B1 (fr) 1985-07-05

Similar Documents

Publication Publication Date Title
FI823162A0 (fi) Icke-iriserande glas
JPS57160472A (en) Gas mask
JPS57133847A (en) Simple glass
GB8300545D0 (en) Spacer frames for insulating glass
JPS554083A (en) Multilayer protection glass
GB2158431B (en) Low expansion, alkali-free borosilicate glass suitable for photomask applications
DE3270169D1 (en) Integrated circuit photomask
GB8322603D0 (en) Glass/vitreous ceramic laminate system
AT385239B (de) Feuerhemmende glastafel
GB2128365B (en) Photomask
GB2107698B (en) Alkali-free glass for photoetching mask(
GB8313476D0 (en) Glass composition
GR82484B (en) Borosilicate glass compositions
GB2102938B (en) Vitreous ceramic cooker-hob
GB2069478B (en) Apparatus for manufacturing vitreous slag
GB8301382D0 (en) Glass panes
GB2093820B (en) Glass manufacture
GB2108483B (en) Glass drawing
JPS57140342A (en) Double glass
JPS5722142A (en) Glass composition
JPS57175738A (en) Electron-control glass forming device
DE3478106D1 (en) Borosilicate glass compositions
GB2114062B (en) Etching glass
JPS57195475A (en) Gas mask
JPS56140031A (en) Cooler for float type glass furnace

Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20020225