JPS615665B2 - - Google Patents

Info

Publication number
JPS615665B2
JPS615665B2 JP12680581A JP12680581A JPS615665B2 JP S615665 B2 JPS615665 B2 JP S615665B2 JP 12680581 A JP12680581 A JP 12680581A JP 12680581 A JP12680581 A JP 12680581A JP S615665 B2 JPS615665 B2 JP S615665B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12680581A
Other languages
Japanese (ja)
Other versions
JPS5832038A (ja
Inventor
Isao Masuda
Kenji Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP56126805A priority Critical patent/JPS5832038A/ja
Priority to US06/351,688 priority patent/US4391916A/en
Priority to GB08205828A priority patent/GB2107698B/en
Priority to DE3207315A priority patent/DE3207315C2/de
Priority to FR8214129A priority patent/FR2511360B1/fr
Publication of JPS5832038A publication Critical patent/JPS5832038A/ja
Publication of JPS615665B2 publication Critical patent/JPS615665B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/105—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
    • C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP56126805A 1981-08-14 1981-08-14 フオトエツチングマスク用無アルカリガラス Granted JPS5832038A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP56126805A JPS5832038A (ja) 1981-08-14 1981-08-14 フオトエツチングマスク用無アルカリガラス
US06/351,688 US4391916A (en) 1981-08-14 1982-02-24 Alkali-free glass for photoetching mask
GB08205828A GB2107698B (en) 1981-08-14 1982-02-26 Alkali-free glass for photoetching mask(
DE3207315A DE3207315C2 (de) 1981-08-14 1982-03-01 Alkalifreies Glas für eine Maske zur Fotoätzung und seine Verwendung
FR8214129A FR2511360B1 (fr) 1981-08-14 1982-08-13 Composition de verre sans alcali pour la production de masques de photogravure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56126805A JPS5832038A (ja) 1981-08-14 1981-08-14 フオトエツチングマスク用無アルカリガラス

Publications (2)

Publication Number Publication Date
JPS5832038A JPS5832038A (ja) 1983-02-24
JPS615665B2 true JPS615665B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-02-20

Family

ID=14944392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56126805A Granted JPS5832038A (ja) 1981-08-14 1981-08-14 フオトエツチングマスク用無アルカリガラス

Country Status (5)

Country Link
US (1) US4391916A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5832038A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3207315C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2511360B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2107698B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018058218A1 (en) 2016-09-29 2018-04-05 Brf S.A A process for producing an animal protein hydrolysate, animal protein hydrolysates and its uses

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4501819A (en) * 1982-12-23 1985-02-26 Kabushiki Kaisha Ohara Kogaku Garasu Seizosho Glass for a photomask
NL8301604A (nl) * 1983-05-06 1984-12-03 Philips Nv Dielektrisch glas in meerlagenschakelingen en hiermee uitgeruste dikke filmschakelingen.
JPS6033556A (ja) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd ドライエッチング用フォトマスク素材
JPS6042247A (ja) * 1983-08-16 1985-03-06 Asahi Glass Co Ltd 低膨張性ガラス
US4554259A (en) * 1984-05-08 1985-11-19 Schott Glass Technologies, Inc. Low expansion, alkali-free borosilicate glass suitable for photomask applications
DD262653A1 (de) * 1987-06-15 1988-12-07 Jenaer Glaswerk Veb Photomaskenglas niedriger ausdehnung mit verbesserten hafteigenschaften
JP2000510803A (ja) * 1996-02-29 2000-08-22 ビーティージー・インターナショナル・リミテッド 有機ポリ酸／塩基反応セメント
GB2310663A (en) * 1996-02-29 1997-09-03 British Tech Group Organic polyacid/base reaction cement
JP4677710B2 (ja) * 2003-10-17 2011-04-27 東ソー株式会社 紫外線遮蔽ガラス、その製造方法、これを用いた紫外線遮蔽ガラス部材及び装置
CN105957803A (zh) * 2016-06-13 2016-09-21 四川洪芯微科技有限公司 一种半导体器件的钝化方法及半导体器件

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL63202C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1943-12-04
US3069294A (en) * 1954-06-03 1962-12-18 Corning Glass Works Electrical metal oxide resistor having a glass enamel coating
NL257758A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1958-12-02
DE1421909A1 (de) * 1960-11-14 1968-12-12 Owens Illinois Inc Feuerfeste Glaszusammensetzung
US3450546A (en) * 1966-05-26 1969-06-17 Corning Glass Works Transparent glass-ceramic articles and method for producing
JPS5110844B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-04-24 1976-04-07
GB1408256A (en) * 1974-02-08 1975-10-01 Du Pont Dielectric compositions and glass frits for use as components thereof
DE2615534C3 (de) * 1976-04-09 1978-10-05 Jenaer Glaswerk Schott & Gen., 6500 Mainz Für die Nachrichtenübertragung geeignete Lichtleitfaser mit Gradientenprofil aus Mehrkomponentengläsern mit angepaßtem Ausdehnungskoeffizienten zwischen Glaskern und Glasmantel sowie Verfahren zu ihrer Herstellung
JPS5645870A (en) * 1979-09-17 1981-04-25 Ngk Insulators Ltd Ceramic structure mounted in ceramic cylindrical body with ceramic member having diffrent coefficient of thermal expansion

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018058218A1 (en) 2016-09-29 2018-04-05 Brf S.A A process for producing an animal protein hydrolysate, animal protein hydrolysates and its uses

Also Published As

Publication number Publication date
JPS5832038A (ja) 1983-02-24
GB2107698A (en) 1983-05-05
FR2511360B1 (fr) 1985-07-05
DE3207315A1 (de) 1983-03-03
GB2107698B (en) 1984-11-28
US4391916A (en) 1983-07-05
DE3207315C2 (de) 1987-11-12
FR2511360A1 (fr) 1983-02-18

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