DE3120964A1 - Kontaktbelichtungsverfahren - Google Patents

Kontaktbelichtungsverfahren

Info

Publication number
DE3120964A1
DE3120964A1 DE19813120964 DE3120964A DE3120964A1 DE 3120964 A1 DE3120964 A1 DE 3120964A1 DE 19813120964 DE19813120964 DE 19813120964 DE 3120964 A DE3120964 A DE 3120964A DE 3120964 A1 DE3120964 A1 DE 3120964A1
Authority
DE
Germany
Prior art keywords
film
lithographic
thickened
contact exposure
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19813120964
Other languages
German (de)
English (en)
Inventor
Yujiro Minami Ashigara Kanagawa Kaneko
Hiroshi Tokyo Shirakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE3120964A1 publication Critical patent/DE3120964A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/08Photoprinting; Processes and means for preventing photoprinting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
DE19813120964 1980-05-28 1981-05-26 Kontaktbelichtungsverfahren Withdrawn DE3120964A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7104080A JPS56167135A (en) 1980-05-28 1980-05-28 Contact exposing method

Publications (1)

Publication Number Publication Date
DE3120964A1 true DE3120964A1 (de) 1982-04-08

Family

ID=13449003

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19813120964 Withdrawn DE3120964A1 (de) 1980-05-28 1981-05-26 Kontaktbelichtungsverfahren

Country Status (2)

Country Link
JP (1) JPS56167135A (enrdf_load_stackoverflow)
DE (1) DE3120964A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0409169A3 (en) * 1989-07-20 1992-03-25 Ciba-Geigy Ag Exposing method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58188659A (ja) * 1982-04-30 1983-11-04 Toppan Printing Co Ltd 太りパタ−ンの作成方法
JPS59179038U (ja) * 1983-05-17 1984-11-30 サカタインクス株式会社 太らせ文字作成用写真焼付装置
US9041909B2 (en) * 2011-12-05 2015-05-26 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method
CN102591156B (zh) * 2011-12-05 2015-05-20 深圳市华星光电技术有限公司 曝光装置及曝光方法
US9383650B2 (en) * 2011-12-15 2016-07-05 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method
CN102436150A (zh) * 2011-12-15 2012-05-02 深圳市华星光电技术有限公司 曝光装置及曝光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0409169A3 (en) * 1989-07-20 1992-03-25 Ciba-Geigy Ag Exposing method

Also Published As

Publication number Publication date
JPS634174B2 (enrdf_load_stackoverflow) 1988-01-27
JPS56167135A (en) 1981-12-22

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Legal Events

Date Code Title Description
8128 New person/name/address of the agent

Representative=s name: KOHLER, M., DIPL.-CHEM. DR.RER.NAT., 8000 MUENCHEN

8128 New person/name/address of the agent

Representative=s name: SOLF, A., DR.-ING., 8000 MUENCHEN ZAPF, C., DIPL.-

8141 Disposal/no request for examination