JPS56167135A - Contact exposing method - Google Patents

Contact exposing method

Info

Publication number
JPS56167135A
JPS56167135A JP7104080A JP7104080A JPS56167135A JP S56167135 A JPS56167135 A JP S56167135A JP 7104080 A JP7104080 A JP 7104080A JP 7104080 A JP7104080 A JP 7104080A JP S56167135 A JPS56167135 A JP S56167135A
Authority
JP
Japan
Prior art keywords
film
engraving
original film
lithographic
original
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7104080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS634174B2 (enrdf_load_stackoverflow
Inventor
Yujiro Kaneko
Hiroshi Shirokura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP7104080A priority Critical patent/JPS56167135A/ja
Priority to DE19813120964 priority patent/DE3120964A1/de
Publication of JPS56167135A publication Critical patent/JPS56167135A/ja
Publication of JPS634174B2 publication Critical patent/JPS634174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/08—Photoprinting; Processes and means for preventing photoprinting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP7104080A 1980-05-28 1980-05-28 Contact exposing method Granted JPS56167135A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7104080A JPS56167135A (en) 1980-05-28 1980-05-28 Contact exposing method
DE19813120964 DE3120964A1 (de) 1980-05-28 1981-05-26 Kontaktbelichtungsverfahren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7104080A JPS56167135A (en) 1980-05-28 1980-05-28 Contact exposing method

Publications (2)

Publication Number Publication Date
JPS56167135A true JPS56167135A (en) 1981-12-22
JPS634174B2 JPS634174B2 (enrdf_load_stackoverflow) 1988-01-27

Family

ID=13449003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7104080A Granted JPS56167135A (en) 1980-05-28 1980-05-28 Contact exposing method

Country Status (2)

Country Link
JP (1) JPS56167135A (enrdf_load_stackoverflow)
DE (1) DE3120964A1 (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58188659A (ja) * 1982-04-30 1983-11-04 Toppan Printing Co Ltd 太りパタ−ンの作成方法
JPS59179038U (ja) * 1983-05-17 1984-11-30 サカタインクス株式会社 太らせ文字作成用写真焼付装置
US20130141705A1 (en) * 2011-12-05 2013-06-06 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method
WO2013082782A1 (zh) * 2011-12-05 2013-06-13 深圳市华星光电技术有限公司 曝光装置及曝光方法
US20130155383A1 (en) * 2011-12-15 2013-06-20 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method
WO2013086730A1 (zh) * 2011-12-15 2013-06-20 深圳市华星光电技术有限公司 曝光装置及曝光方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0409169A3 (en) * 1989-07-20 1992-03-25 Ciba-Geigy Ag Exposing method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58188659A (ja) * 1982-04-30 1983-11-04 Toppan Printing Co Ltd 太りパタ−ンの作成方法
JPS59179038U (ja) * 1983-05-17 1984-11-30 サカタインクス株式会社 太らせ文字作成用写真焼付装置
US20130141705A1 (en) * 2011-12-05 2013-06-06 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method
WO2013082782A1 (zh) * 2011-12-05 2013-06-13 深圳市华星光电技术有限公司 曝光装置及曝光方法
US9041909B2 (en) * 2011-12-05 2015-05-26 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method
US20130155383A1 (en) * 2011-12-15 2013-06-20 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method
WO2013086730A1 (zh) * 2011-12-15 2013-06-20 深圳市华星光电技术有限公司 曝光装置及曝光方法
US9383650B2 (en) * 2011-12-15 2016-07-05 Shenzhen China Star Optoelectronics Technology Co., Ltd. Exposure apparatus and exposure method

Also Published As

Publication number Publication date
JPS634174B2 (enrdf_load_stackoverflow) 1988-01-27
DE3120964A1 (de) 1982-04-08

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