DE2849933C2 - Elektronenstrahlverdampfungseinrichtung für Vakuumaufdampfanlagen - Google Patents
Elektronenstrahlverdampfungseinrichtung für VakuumaufdampfanlagenInfo
- Publication number
- DE2849933C2 DE2849933C2 DE2849933A DE2849933A DE2849933C2 DE 2849933 C2 DE2849933 C2 DE 2849933C2 DE 2849933 A DE2849933 A DE 2849933A DE 2849933 A DE2849933 A DE 2849933A DE 2849933 C2 DE2849933 C2 DE 2849933C2
- Authority
- DE
- Germany
- Prior art keywords
- electron beam
- evaporation
- evaporated
- holding
- holding device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005566 electron beam evaporation Methods 0.000 title claims description 6
- 238000007738 vacuum evaporation Methods 0.000 title claims description 3
- 239000000463 material Substances 0.000 claims description 17
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/023—Means for mechanically adjusting components not otherwise provided for
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S159/00—Concentrating evaporators
- Y10S159/26—Electric field
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1423577A CH624435A5 (https=) | 1977-11-22 | 1977-11-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2849933A1 DE2849933A1 (de) | 1979-05-23 |
| DE2849933C2 true DE2849933C2 (de) | 1983-01-20 |
Family
ID=4399104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2849933A Expired DE2849933C2 (de) | 1977-11-22 | 1978-11-17 | Elektronenstrahlverdampfungseinrichtung für Vakuumaufdampfanlagen |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4221629A (https=) |
| JP (1) | JPS5499562A (https=) |
| CH (1) | CH624435A5 (https=) |
| DE (1) | DE2849933C2 (https=) |
| FR (1) | FR2409596A1 (https=) |
| GB (1) | GB2008849B (https=) |
| IT (1) | IT1101171B (https=) |
| NL (1) | NL7800612A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH663037A5 (de) * | 1985-02-05 | 1987-11-13 | Balzers Hochvakuum | Dampfquelle fuer vakuumbeschichtungsanlagen. |
| US20050020368A1 (en) * | 1998-04-15 | 2005-01-27 | Burkholder Roy A. | Bowling lane advertising and method |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE553562A (https=) * | 1955-12-20 | 1900-01-01 | ||
| US3202794A (en) * | 1963-02-18 | 1965-08-24 | Thermionics Lab Inc | Permanent magnet transverse electron beam evaporation source |
| US3277865A (en) * | 1963-04-01 | 1966-10-11 | United States Steel Corp | Metal-vapor source with heated reflecting shield |
| US3389210A (en) * | 1965-03-29 | 1968-06-18 | Everette M. Whitson | Multiple crucible for a permanent magnet transverse electron beam evaporation source |
| DE1521252B2 (de) * | 1966-05-03 | 1969-10-30 | Farbenfabriken Bayer Aktiengesellschaft, 5090 Leverkusen | Vorrichtung zum Verdampfen von hochschmelzenden Materialien wie Quarz od. dgl., insbesondere zum Aufdampfen von Schichten |
| BE754553A (fr) * | 1969-08-13 | 1971-01-18 | Leybold Heraeus Verwaltung | Procede et dispositif d'evaporation sous vide de corps non metalliques a point de fusion eleve |
| US3582529A (en) * | 1969-09-24 | 1971-06-01 | Air Reduction | Electron beam heating apparatus and control system therein |
| GB1340701A (en) * | 1971-04-19 | 1973-12-12 | Craswell K B | Apparatus for use in coating a body with an evaporant |
-
1977
- 1977-11-22 CH CH1423577A patent/CH624435A5/de not_active IP Right Cessation
-
1978
- 1978-01-18 NL NL7800612A patent/NL7800612A/xx not_active Application Discontinuation
- 1978-11-16 IT IT29838/78A patent/IT1101171B/it active
- 1978-11-17 DE DE2849933A patent/DE2849933C2/de not_active Expired
- 1978-11-17 US US05/961,544 patent/US4221629A/en not_active Expired - Lifetime
- 1978-11-20 JP JP14324578A patent/JPS5499562A/ja active Pending
- 1978-11-20 GB GB7845224A patent/GB2008849B/en not_active Expired
- 1978-11-21 FR FR7832805A patent/FR2409596A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5499562A (en) | 1979-08-06 |
| NL7800612A (nl) | 1979-05-25 |
| IT7829838A0 (it) | 1978-11-16 |
| FR2409596A1 (fr) | 1979-06-15 |
| GB2008849A (en) | 1979-06-06 |
| FR2409596B1 (https=) | 1983-12-09 |
| GB2008849B (en) | 1982-03-10 |
| US4221629A (en) | 1980-09-09 |
| IT1101171B (it) | 1985-09-28 |
| DE2849933A1 (de) | 1979-05-23 |
| CH624435A5 (https=) | 1981-07-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8363 | Opposition against the patent | ||
| 8331 | Complete revocation |