BE754553A - Procede et dispositif d'evaporation sous vide de corps non metalliques a point de fusion eleve - Google Patents

Procede et dispositif d'evaporation sous vide de corps non metalliques a point de fusion eleve

Info

Publication number
BE754553A
BE754553A BE754553DA BE754553A BE 754553 A BE754553 A BE 754553A BE 754553D A BE754553D A BE 754553DA BE 754553 A BE754553 A BE 754553A
Authority
BE
Belgium
Prior art keywords
melting point
high melting
vacuum evaporation
metallic bodies
metallic
Prior art date
Application number
Other languages
English (en)
Inventor
G.M.B.H. + Co. Leybold-Heraeus
Original Assignee
Leybold Heraeus Verwaltung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE754553A publication Critical patent/BE754553A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
BE754553D 1969-08-13 Procede et dispositif d'evaporation sous vide de corps non metalliques a point de fusion eleve BE754553A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691941215 DE1941215B2 (de) 1969-08-13 1969-08-13 Verfahren und anordnung zum vakuumaufdampfen von nicht metallischen hochschmelzenden stoffen mittels elektronen strahlen

Publications (1)

Publication Number Publication Date
BE754553A true BE754553A (fr) 1971-01-18

Family

ID=5742694

Family Applications (1)

Application Number Title Priority Date Filing Date
BE754553D BE754553A (fr) 1969-08-13 Procede et dispositif d'evaporation sous vide de corps non metalliques a point de fusion eleve

Country Status (4)

Country Link
US (1) US3684557A (fr)
BE (1) BE754553A (fr)
DE (1) DE1941215B2 (fr)
FR (1) FR2056639A5 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4956677A (fr) * 1972-09-29 1974-06-01
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
CH624435A5 (fr) * 1977-11-22 1981-07-31 Balzers Hochvakuum
US4321310A (en) * 1980-01-07 1982-03-23 United Technologies Corporation Columnar grain ceramic thermal barrier coatings on polished substrates
US4321311A (en) * 1980-01-07 1982-03-23 United Technologies Corporation Columnar grain ceramic thermal barrier coatings
DE3316554C1 (de) * 1983-05-06 1984-07-12 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Verdampfervorrichtung mit Strahlheizung zum Aufdampfen mehrerer Materialien
DE4113364C1 (fr) * 1991-04-24 1992-04-02 Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De
KR102319130B1 (ko) * 2020-03-11 2021-10-29 티오에스주식회사 가변 온도조절 장치를 구비한 금속-산화물 전자빔 증발원

Also Published As

Publication number Publication date
FR2056639A5 (fr) 1971-05-14
DE1941215A1 (fr) 1971-04-08
DE1941215B2 (de) 1971-04-08
US3684557A (en) 1972-08-15

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