FR2409596A1 - Dispositif d'evaporation a faisceau electronique pour des installations de depot par evaporation sous vide - Google Patents

Dispositif d'evaporation a faisceau electronique pour des installations de depot par evaporation sous vide

Info

Publication number
FR2409596A1
FR2409596A1 FR7832805A FR7832805A FR2409596A1 FR 2409596 A1 FR2409596 A1 FR 2409596A1 FR 7832805 A FR7832805 A FR 7832805A FR 7832805 A FR7832805 A FR 7832805A FR 2409596 A1 FR2409596 A1 FR 2409596A1
Authority
FR
France
Prior art keywords
electronic beam
vacuum evaporation
deposit systems
vacuum
evaporation device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7832805A
Other languages
English (en)
Other versions
FR2409596B1 (fr
Inventor
Erich Sollinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of FR2409596A1 publication Critical patent/FR2409596A1/fr
Application granted granted Critical
Publication of FR2409596B1 publication Critical patent/FR2409596B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/023—Means for mechanically adjusting components not otherwise provided for
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S159/00—Concentrating evaporators
    • Y10S159/26—Electric field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

DISPOSITIF D'EVAPORATION A FAISCEAU ELECTRONIQUE POUR DES INSTALLATIONS DE DEPOT PAR EVAPORATION SOUS VIDE. IL COMPORTE NOTAMMENT COMME ELEMENTS CONSTITUTIFS UN SUPPORT POUR LE MATERIAU A EVAPORER, UNE SOURCE DE FAISCEAU ELECTRONIQUE ET UN AIMANT DE DEFLEXION POUR GUIDER LE FAISCEAU ELECTRONIQUE SUR LE MATERIAU A EVAPORER. CES TROIS ELEMENTS CONSTITUTIFS SONT FIXES SUR UNE TIGE DE SUPPORT ET AU MOINS DEUX DE CES ELEMENTS Y SONT MONTES DE FACON MOBILE. APPLICATION AU DEPOT PAR EVAPORATION SOUS VIDE DE MATERIAUX SUR DES SUBSTRATS.
FR7832805A 1977-11-22 1978-11-21 Dispositif d'evaporation a faisceau electronique pour des installations de depot par evaporation sous vide Granted FR2409596A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1423577A CH624435A5 (fr) 1977-11-22 1977-11-22

Publications (2)

Publication Number Publication Date
FR2409596A1 true FR2409596A1 (fr) 1979-06-15
FR2409596B1 FR2409596B1 (fr) 1983-12-09

Family

ID=4399104

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7832805A Granted FR2409596A1 (fr) 1977-11-22 1978-11-21 Dispositif d'evaporation a faisceau electronique pour des installations de depot par evaporation sous vide

Country Status (8)

Country Link
US (1) US4221629A (fr)
JP (1) JPS5499562A (fr)
CH (1) CH624435A5 (fr)
DE (1) DE2849933C2 (fr)
FR (1) FR2409596A1 (fr)
GB (1) GB2008849B (fr)
IT (1) IT1101171B (fr)
NL (1) NL7800612A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH663037A5 (de) * 1985-02-05 1987-11-13 Balzers Hochvakuum Dampfquelle fuer vakuumbeschichtungsanlagen.
US20050020368A1 (en) * 1998-04-15 2005-01-27 Burkholder Roy A. Bowling lane advertising and method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB826132A (en) * 1955-12-20 1959-12-31 Nat Res Dev Zone melting and refining of refractory materials
US3389210A (en) * 1965-03-29 1968-06-18 Everette M. Whitson Multiple crucible for a permanent magnet transverse electron beam evaporation source
DE1521252A1 (de) * 1966-05-03 1969-05-08 Bayer Ag Vorrichtung zum Verdampfen von hochschmelzenden Materialien wie Quarz od.dgl
DE1941215B2 (de) * 1969-08-13 1971-04-08 Leybold Heraeus Gmbh & Co Kg Verfahren und anordnung zum vakuumaufdampfen von nicht metallischen hochschmelzenden stoffen mittels elektronen strahlen
GB1340701A (en) * 1971-04-19 1973-12-12 Craswell K B Apparatus for use in coating a body with an evaporant

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source
US3277865A (en) * 1963-04-01 1966-10-11 United States Steel Corp Metal-vapor source with heated reflecting shield
US3582529A (en) * 1969-09-24 1971-06-01 Air Reduction Electron beam heating apparatus and control system therein

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB826132A (en) * 1955-12-20 1959-12-31 Nat Res Dev Zone melting and refining of refractory materials
US3389210A (en) * 1965-03-29 1968-06-18 Everette M. Whitson Multiple crucible for a permanent magnet transverse electron beam evaporation source
DE1521252A1 (de) * 1966-05-03 1969-05-08 Bayer Ag Vorrichtung zum Verdampfen von hochschmelzenden Materialien wie Quarz od.dgl
DE1941215B2 (de) * 1969-08-13 1971-04-08 Leybold Heraeus Gmbh & Co Kg Verfahren und anordnung zum vakuumaufdampfen von nicht metallischen hochschmelzenden stoffen mittels elektronen strahlen
GB1340701A (en) * 1971-04-19 1973-12-12 Craswell K B Apparatus for use in coating a body with an evaporant

Also Published As

Publication number Publication date
GB2008849A (en) 1979-06-06
US4221629A (en) 1980-09-09
FR2409596B1 (fr) 1983-12-09
DE2849933C2 (de) 1983-01-20
JPS5499562A (en) 1979-08-06
NL7800612A (nl) 1979-05-25
GB2008849B (en) 1982-03-10
CH624435A5 (fr) 1981-07-31
IT1101171B (it) 1985-09-28
DE2849933A1 (de) 1979-05-23
IT7829838A0 (it) 1978-11-16

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Legal Events

Date Code Title Description
ST Notification of lapse