FR2534933B1 - Cellule d'evaporation par effusion pour des installations de metallisation sous vide - Google Patents

Cellule d'evaporation par effusion pour des installations de metallisation sous vide

Info

Publication number
FR2534933B1
FR2534933B1 FR8316992A FR8316992A FR2534933B1 FR 2534933 B1 FR2534933 B1 FR 2534933B1 FR 8316992 A FR8316992 A FR 8316992A FR 8316992 A FR8316992 A FR 8316992A FR 2534933 B1 FR2534933 B1 FR 2534933B1
Authority
FR
France
Prior art keywords
damping
vacuum metallization
evaporation cell
plants
metallization plants
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8316992A
Other languages
English (en)
Other versions
FR2534933A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of FR2534933A1 publication Critical patent/FR2534933A1/fr
Application granted granted Critical
Publication of FR2534933B1 publication Critical patent/FR2534933B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8316992A 1982-10-26 1983-10-25 Cellule d'evaporation par effusion pour des installations de metallisation sous vide Expired FR2534933B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH6224/82A CH651592A5 (de) 1982-10-26 1982-10-26 Dampfquelle fuer vakuumbedampfungsanlagen.

Publications (2)

Publication Number Publication Date
FR2534933A1 FR2534933A1 (fr) 1984-04-27
FR2534933B1 true FR2534933B1 (fr) 1985-07-19

Family

ID=4306235

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8316992A Expired FR2534933B1 (fr) 1982-10-26 1983-10-25 Cellule d'evaporation par effusion pour des installations de metallisation sous vide

Country Status (6)

Country Link
US (1) US4543467A (fr)
JP (1) JPS5993877A (fr)
CH (1) CH651592A5 (fr)
DE (2) DE8330196U1 (fr)
FR (1) FR2534933B1 (fr)
GB (1) GB2130252B (fr)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH654596A5 (de) * 1983-09-05 1986-02-28 Balzers Hochvakuum Verdampferzelle.
JPS60225422A (ja) * 1984-04-24 1985-11-09 Hitachi Ltd 薄膜形成方法およびその装置
DE8502409U1 (de) * 1985-01-30 1986-06-05 Globol-Werk Gmbh, 8858 Neuburg Vorrichtung zum Verdampfen von in Zellstoff oder anderen Trägermaterialien eingelagerten Wirkstoffen, wie zum Beispiel Pyrethrum
KR930007853B1 (ko) * 1986-12-10 1993-08-20 후지 세이끼 가부시기 가이샤 진공 증발장치
US5080870A (en) * 1988-09-08 1992-01-14 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
US5156815A (en) * 1988-09-08 1992-10-20 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
EP0393600B1 (fr) * 1989-04-19 1995-11-29 Siemens Aktiengesellschaft Appareil comportant un creuset d'une cellule d'effusion pour un système d'épitaxie par jets moléculaires
US5034604A (en) * 1989-08-29 1991-07-23 Board Of Regents, The University Of Texas System Refractory effusion cell to generate a reproducible, uniform and ultra-pure molecular beam of elemental molecules, utilizing reduced thermal gradient filament construction
US5157240A (en) * 1989-09-13 1992-10-20 Chow Loren A Deposition heaters
US5031229A (en) * 1989-09-13 1991-07-09 Chow Loren A Deposition heaters
CA2031912A1 (fr) * 1989-12-22 1991-06-23 Robert Fred Pfost Couvercle chauffe
US6152074A (en) * 1996-10-30 2000-11-28 Applied Materials, Inc. Deposition of a thin film on a substrate using a multi-beam source
US5906857A (en) * 1997-05-13 1999-05-25 Ultratherm, Inc. Apparatus, system and method for controlling emission parameters attending vaporized in a HV environment
US6011904A (en) * 1997-06-10 2000-01-04 Board Of Regents, University Of Texas Molecular beam epitaxy effusion cell
US6162300A (en) * 1998-09-25 2000-12-19 Bichrt; Craig E. Effusion cell
DE59914510D1 (de) * 1999-03-29 2007-11-08 Antec Solar Energy Ag Vorrichtung und Verfahren zur Beschichtung von Substraten durch Aufdampfen mittels eines PVD-Verfahrens
TW490714B (en) 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US20020011205A1 (en) 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US7517551B2 (en) * 2000-05-12 2009-04-14 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light-emitting device
SG113448A1 (en) * 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
EP1369499A3 (fr) 2002-04-15 2004-10-20 Semiconductor Energy Laboratory Co., Ltd. Méthode et appareillage pour fabriquer un dispositif émetteur de lumière
US20040035360A1 (en) * 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
TWI336905B (en) * 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
US20040123804A1 (en) 2002-09-20 2004-07-01 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
JP2004353085A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置
JP2004353084A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置の固定部材
JP2004353083A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置
JP2004353082A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置
JP2005029896A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 原材料の蒸発のために使用されるるつぼのための改良されたアセンブリ
JP4442558B2 (ja) * 2005-01-06 2010-03-31 三星モバイルディスプレイ株式會社 蒸発源の加熱制御方法，蒸発源の冷却制御方法および蒸発源の制御方法
JP5009816B2 (ja) * 2005-02-22 2012-08-22 イー−サイエンス，インコーポレイテッド 流出セルバルブ
FI118803B (fi) * 2005-04-22 2008-03-31 Beneq Oy Lähde, järjestely lähteen asentamiseksi sekä menetelmä lähteen asentamiseksi ja poistamiseksi
KR100645689B1 (ko) * 2005-08-31 2006-11-14 삼성에스디아이 주식회사 선형 증착원
KR100711885B1 (ko) * 2005-08-31 2007-04-25 삼성에스디아이 주식회사 유기 증착원 및 이의 가열원 제어방법
KR100711886B1 (ko) * 2005-08-31 2007-04-25 삼성에스디아이 주식회사 무기 증착원 및 이의 가열원 제어방법
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011065998A1 (fr) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Source de déposition linéaire
US20100285218A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
KR20120061394A (ko) * 2010-12-03 2012-06-13 삼성모바일디스플레이주식회사 증발원 및 유기물 증착 방법
US20190048460A1 (en) * 2017-08-14 2019-02-14 Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Evaporation Crucible and Evaporation System
CN108060392B (zh) * 2017-12-14 2023-07-18 深圳先进技术研究院 一种可控线性蒸发装置及镀膜方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1147775A (en) * 1913-06-30 1915-07-27 Antonio Zarella Apparatus for moistening cigars and tobacco.
US1990338A (en) * 1932-07-30 1935-02-05 Teco Mfg Corp Electric insecticide
FR872840A (fr) * 1940-06-04 1942-06-19 Fides Gmbh Procédé de revêtement de surfaces quelconques avec une couche métallique
DE747257C (de) * 1943-03-05 1944-09-18 Bosch Gmbh Robert Vorrichtung zur Metallisierung laufender Baender durch Metallbedampfung im Vakuum
US3105894A (en) * 1960-07-25 1963-10-01 Northern Electric Co Variable speed vaporizer
FR1451345A (fr) * 1964-06-30 1966-01-07 Ibm Source d'évaporation
FR1489583A (fr) * 1965-08-24 1967-07-21 United States Steel Corp Creuset pour la vaporisation de métaux comportant des parois verticales servant à contenir et à condenser la vapeur
US3751310A (en) * 1971-03-25 1973-08-07 Bell Telephone Labor Inc Germanium doped epitaxial films by the molecular beam method
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US4010349A (en) * 1975-02-27 1977-03-01 Lincoln Manufacturing Company, Inc. Proofing cabinet
US3971334A (en) * 1975-03-04 1976-07-27 Xerox Corporation Coating device
DE2917841A1 (de) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg Verdampfer fuer vakuumaufdampfanlagen
DD151476A1 (de) * 1980-06-17 1981-10-21 Egon Goldammer Verdampferblende in bedampfungsanlagen

Also Published As

Publication number Publication date
US4543467A (en) 1985-09-24
FR2534933A1 (fr) 1984-04-27
DE8330196U1 (fr) 1987-06-04
DE3338061C2 (de) 1986-07-17
GB2130252A (en) 1984-05-31
GB2130252B (en) 1986-10-15
JPH0241581B2 (fr) 1990-09-18
GB8328451D0 (en) 1983-11-23
CH651592A5 (de) 1985-09-30
DE3338061A1 (de) 1984-05-17
JPS5993877A (ja) 1984-05-30

Similar Documents

Publication Publication Date Title
FR2534933B1 (fr) Cellule d'evaporation par effusion pour des installations de metallisation sous vide
FR2698382B1 (fr) Cellule pour croissance cristalline.
FR2584100B1 (fr) Evaporateur pour l'obtention, par evaporation sous vide, de depots de films minces
DZ2291A1 (fr) Cellule immortelle pour l'accroissement des virus.
BE895862A (fr) Machine agricole pour la transplantation separee de plants empotes
FR2549857B1 (fr) Dispositif d'evaporation sous vide
MA20573A1 (fr) Agents inhibitant l'evaporation
BE896977A (fr) Procede perfectionne de depot anelectrolytique de l'or
DK228787A (da) Anlaeg til foroegelse af telefonliniers samtalekapacitet
BE846470A (fr) Dispositif de changement d'electrodes pour installation de refusion sous laitier
FR2496843B1 (fr) Dispositif pour la production de vapeur dans des installations de synthese d'ammoniac
FR2531104B1 (fr) Creuset de vaporisation pour installations de depot de materiaux vaporises sous vide
FR2333872A1 (fr) Creuset vaporisateur pour installations de metallisation sous vide
FR2564761B1 (fr) Dispositif d'introduction de coulee pour paniers de coulee d'installations de coulee continue
RO85533A (fr) Composition pour le reglage la croissance des plantes
GB2084197B (en) Deposition material by vacuum evaporation
RO76406A (fr) COMPOSITION SYNERGETIQUE POUR L'ATTRACTION DES MASCULS DE MAMESTRA BéASSICAE
FR2575471B1 (fr) Composes de type pyrone-3-carboxamide et leur application pour inhiber la croissance des vegetaux
FR2531154B1 (fr) Goujon d'attelage pour applications agricoles
BE896154A (fr) Agencement de couteau, notamment pour des rabots et l'analogue
IT1194307B (it) Dispositivo automatico per l'innaffiamento di piante
FR2564277B3 (fr) Recipient pour engrais pour machines ou installations d'irrigation
RO89009A (fr) Composition liquide pour le reglage de la pousse des plantes
FR2577378B1 (fr) Planteuse pour plants en mottes
FR2571746B1 (fr) Dispositif de maintien d'un porte-substrat en transfert pour la fabrication de semi-conducteurs par epitaxie sous vide

Legal Events

Date Code Title Description
ST Notification of lapse