DE2802814C2 - Verfahren zur Herstellung von Eisenoxidphotomasken - Google Patents
Verfahren zur Herstellung von EisenoxidphotomaskenInfo
- Publication number
- DE2802814C2 DE2802814C2 DE2802814A DE2802814A DE2802814C2 DE 2802814 C2 DE2802814 C2 DE 2802814C2 DE 2802814 A DE2802814 A DE 2802814A DE 2802814 A DE2802814 A DE 2802814A DE 2802814 C2 DE2802814 C2 DE 2802814C2
- Authority
- DE
- Germany
- Prior art keywords
- iron oxide
- solution
- temperature
- iron
- salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 title claims description 22
- 238000000034 method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 23
- 150000003839 salts Chemical class 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000007921 spray Substances 0.000 claims description 5
- 238000000354 decomposition reaction Methods 0.000 claims description 2
- 150000001728 carbonyl compounds Chemical class 0.000 claims 1
- 239000002360 explosive Substances 0.000 claims 1
- 229940087654 iron carbonyl Drugs 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 238000000197 pyrolysis Methods 0.000 claims 1
- 239000000243 solution Substances 0.000 description 15
- 239000002904 solvent Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 239000011521 glass Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 150000002505 iron Chemical class 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- 239000000443 aerosol Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000003495 polar organic solvent Substances 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- -1 B. butyl acetate Chemical class 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000002663 nebulization Methods 0.000 description 1
- 239000006199 nebulizer Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Laminated Bodies (AREA)
- ing And Chemical Polishing (AREA)
- Surface Treatment Of Glass (AREA)
- Compounds Of Iron (AREA)
- Soft Magnetic Materials (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7700808A NL7700808A (nl) | 1977-01-27 | 1977-01-27 | Werkwijze voor de vervaardiging van ijzer- oxidefotomaskers en ijzeroxidemaskers verkre- gen volgens deze werkwijze. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2802814A1 DE2802814A1 (de) | 1978-08-03 |
| DE2802814C2 true DE2802814C2 (de) | 1984-10-25 |
Family
ID=19827853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2802814A Expired DE2802814C2 (de) | 1977-01-27 | 1978-01-23 | Verfahren zur Herstellung von Eisenoxidphotomasken |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4199621A (OSRAM) |
| JP (1) | JPS596056B2 (OSRAM) |
| CA (1) | CA1110507A (OSRAM) |
| DE (1) | DE2802814C2 (OSRAM) |
| FR (1) | FR2378872A1 (OSRAM) |
| GB (1) | GB1592017A (OSRAM) |
| NL (1) | NL7700808A (OSRAM) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1268753A (en) * | 1968-05-20 | 1972-03-29 | United Glass Ltd | Containers resistant to ultra-violet light |
| GB1307216A (en) * | 1969-04-23 | 1973-02-14 | Pilkington Brothers Ltd | Treating glass |
| US3824100A (en) * | 1970-06-29 | 1974-07-16 | Corning Glass Works | Transparent iron oxide microcircuit mask |
| FR2110622A5 (OSRAM) * | 1970-10-23 | 1972-06-02 | Commissariat Energie Atomique | |
| IT996924B (it) * | 1972-12-21 | 1975-12-10 | Glaverbel | Procedimento per formare uno strato di ossido metallico |
-
1977
- 1977-01-27 NL NL7700808A patent/NL7700808A/xx not_active Application Discontinuation
-
1978
- 1978-01-18 CA CA295,241A patent/CA1110507A/en not_active Expired
- 1978-01-23 DE DE2802814A patent/DE2802814C2/de not_active Expired
- 1978-01-24 JP JP53006631A patent/JPS596056B2/ja not_active Expired
- 1978-01-24 GB GB2802/78A patent/GB1592017A/en not_active Expired
- 1978-01-24 FR FR7801889A patent/FR2378872A1/fr active Granted
- 1978-01-25 US US05/872,171 patent/US4199621A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5394185A (en) | 1978-08-17 |
| FR2378872A1 (fr) | 1978-08-25 |
| JPS596056B2 (ja) | 1984-02-08 |
| CA1110507A (en) | 1981-10-13 |
| GB1592017A (en) | 1981-07-01 |
| NL7700808A (nl) | 1978-07-31 |
| FR2378872B1 (OSRAM) | 1983-11-18 |
| US4199621A (en) | 1980-04-22 |
| DE2802814A1 (de) | 1978-08-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8125 | Change of the main classification |
Ipc: C23C 11/08 |
|
| D2 | Grant after examination | ||
| 8380 | Miscellaneous part iii |
Free format text: DER VERTRETER IST NACHZUTRAGEN PIEGLER, H., DIPL.-CHEM., PAT.-ASS., 2000 HAMBURG |
|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |