DE2634434A1 - Entwickler fuer offsetschichten - Google Patents

Entwickler fuer offsetschichten

Info

Publication number
DE2634434A1
DE2634434A1 DE19762634434 DE2634434A DE2634434A1 DE 2634434 A1 DE2634434 A1 DE 2634434A1 DE 19762634434 DE19762634434 DE 19762634434 DE 2634434 A DE2634434 A DE 2634434A DE 2634434 A1 DE2634434 A1 DE 2634434A1
Authority
DE
Germany
Prior art keywords
acid
general formula
developer according
developer
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19762634434
Other languages
German (de)
English (en)
Inventor
Shinichi Bunya
Chihiro Eguchi
Konoe Miura
Akinobu Oshima
Yoshihiro Takahashi
Kazuo Torige
Kanagawa Yokohama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Publication of DE2634434A1 publication Critical patent/DE2634434A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE19762634434 1975-07-31 1976-07-30 Entwickler fuer offsetschichten Pending DE2634434A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50093467A JPS5217901A (en) 1975-07-31 1975-07-31 Developer for lithographic press plate

Publications (1)

Publication Number Publication Date
DE2634434A1 true DE2634434A1 (de) 1977-02-10

Family

ID=14083130

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19762634434 Pending DE2634434A1 (de) 1975-07-31 1976-07-30 Entwickler fuer offsetschichten

Country Status (7)

Country Link
US (1) US4267260A (enExample)
JP (1) JPS5217901A (enExample)
DE (1) DE2634434A1 (enExample)
FR (1) FR2319923A1 (enExample)
GB (1) GB1536047A (enExample)
NL (1) NL7608283A (enExample)
SE (1) SE7608622L (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5587151A (en) * 1978-12-25 1980-07-01 Mitsubishi Chem Ind Ltd Developing solution composition for lithographic printing plate
DE3012522A1 (de) * 1980-03-31 1981-10-08 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklerloesung zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
DE3039110A1 (de) * 1980-10-16 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Verfahren fuer die spannungsfreie entwicklung von bestrahlten polymethylmetacrylatschichten
US4628023A (en) * 1981-04-10 1986-12-09 Shipley Company Inc. Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant
US4351895A (en) * 1981-10-19 1982-09-28 American Hoechst Corporation Deletion fluid for positive printing plates
JPS6097358A (ja) * 1983-11-01 1985-05-31 Nippon Seihaku Kk 感光性平版印刷版用現像剤
JPS60130741A (ja) * 1983-12-19 1985-07-12 Nippon Seihaku Kk 感光性平版印刷版用現像剤
DE3569703D1 (en) * 1984-01-17 1989-06-01 Fuji Photo Film Co Ltd Presensitized plate having an anodized aluminum base with an improved hydrophilic layer
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
US5066561A (en) * 1984-06-11 1991-11-19 Hoechst Celanese Corporation Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US4665009A (en) * 1984-07-10 1987-05-12 Hughes Aircraft Company Method of developing radiation sensitive negative resists
US5354645A (en) * 1988-08-23 1994-10-11 E. I. Du Pont De Nemours And Company Process for the production of flexographic printing reliefs
AU628399B2 (en) * 1988-08-23 1992-09-17 E.I. Du Pont De Nemours And Company Process for the production of flexographic printing reliefs
GB2226150A (en) * 1988-12-15 1990-06-20 Nordisk Tidningsplat Ab A developer for use with lithographic printing plates
US5204227A (en) * 1990-05-10 1993-04-20 3D Agency, Inc. Method of developing photopolymerizable printing plates and composition therefor
EP0501546A1 (en) * 1991-02-26 1992-09-02 Agfa-Gevaert N.V. High contrast developer containing an aprotic solvent
US5780406A (en) * 1996-09-06 1998-07-14 Honda; Kenji Non-corrosive cleaning composition for removing plasma etching residues
US6162593A (en) 1999-10-26 2000-12-19 Wyatt; Marion F. Diisopropylbenzene containing solvent and method of developing flexographic printing plates
US6413923B2 (en) 1999-11-15 2002-07-02 Arch Specialty Chemicals, Inc. Non-corrosive cleaning composition for removing plasma etching residues
TWI276929B (en) * 2003-12-16 2007-03-21 Showa Denko Kk Photosensitive composition remover
US20060040218A1 (en) * 2004-08-18 2006-02-23 Wyatt Marion F Terpene ether solvents

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2670286A (en) * 1951-01-20 1954-02-23 Eastman Kodak Co Photosensitization of polymeric cinnamic acid esters
BE525225A (enExample) * 1951-08-20
US3796602A (en) * 1972-02-07 1974-03-12 Du Pont Process for stripping polymer masks from circuit boards

Also Published As

Publication number Publication date
JPS5217901A (en) 1977-02-10
NL7608283A (nl) 1977-02-02
JPS5430321B2 (enExample) 1979-09-29
SE7608622L (sv) 1977-02-01
FR2319923A1 (fr) 1977-02-25
GB1536047A (en) 1978-12-20
US4267260A (en) 1981-05-12

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