DE2626769A1 - Vernetzbare polymere verbindungen - Google Patents

Vernetzbare polymere verbindungen

Info

Publication number
DE2626769A1
DE2626769A1 DE19762626769 DE2626769A DE2626769A1 DE 2626769 A1 DE2626769 A1 DE 2626769A1 DE 19762626769 DE19762626769 DE 19762626769 DE 2626769 A DE2626769 A DE 2626769A DE 2626769 A1 DE2626769 A1 DE 2626769A1
Authority
DE
Germany
Prior art keywords
formula
maleimide
polymers
groups
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19762626769
Other languages
German (de)
English (en)
Inventor
Marcus Dr Baumann
Niklaus Dr Baumann
Hans Dr Zweifel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohner AG Pratteln
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH795775A external-priority patent/CH601384A5/de
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of DE2626769A1 publication Critical patent/DE2626769A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
    • C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/6858—Polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/44—Polyester-amides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/12—Unsaturated polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/14—Polyamide-imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/16—Polyester-imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE19762626769 1975-06-18 1976-06-15 Vernetzbare polymere verbindungen Withdrawn DE2626769A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH795775A CH601384A5 (en) 1975-06-18 1975-06-18 Polymers crosslinkable by electromagnetic radiation
CH1539175 1975-11-27

Publications (1)

Publication Number Publication Date
DE2626769A1 true DE2626769A1 (de) 1977-01-13

Family

ID=25702507

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19762626769 Withdrawn DE2626769A1 (de) 1975-06-18 1976-06-15 Vernetzbare polymere verbindungen
DE2661043A Expired DE2661043C2 (enExample) 1975-06-18 1976-06-15

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE2661043A Expired DE2661043C2 (enExample) 1975-06-18 1976-06-15

Country Status (6)

Country Link
US (1) US4079041A (enExample)
JP (1) JPS6037123B2 (enExample)
CA (1) CA1098245A (enExample)
DE (2) DE2626769A1 (enExample)
FR (1) FR2316257A1 (enExample)
GB (1) GB1544299A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0072780A1 (de) * 1981-08-17 1983-02-23 Ciba-Geigy Ag Imidylverbindungen, Polymere daraus und Verwendung der Polymeren
EP0079307A1 (de) * 1981-11-06 1983-05-18 Ciba-Geigy Ag Verwendung von lichtvernetzbaren Copolymeren zur Herstellung von semipermeablen Membranen
EP0094913A3 (en) * 1982-05-19 1984-09-12 Ciba-Geigy Ag Water-soluble photo-cross-linkable polymers, their preparation and use
EP0112134A3 (en) * 1982-12-10 1987-05-13 Sumitomo Electric Industries Limited Gas-selectively permeable membrane and method of forming said membrane
EP0176835A3 (de) * 1984-09-26 1988-01-07 Bayer Ag Polyamide gegen Lichteinwirkung stabilisiert
EP0848002A1 (fr) * 1996-12-12 1998-06-17 Institut Francais Du Petrole Ester de l'acide maléimidobenzoique
US6087066A (en) * 1998-10-15 2000-07-11 Kodak Polychrome Graphics Llc Polyvinyl acetals having imido groups and use thereof in photosensitive compositions
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6358669B1 (en) 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
EP1506857A2 (en) 1998-06-23 2005-02-16 Kodak Polychrome Graphics LLC Positive-working thermal imaging element and positive-working lithographic printing plate precursor
USRE41579E1 (en) 1997-10-17 2010-08-24 Fujifilm Corporation Positive type photosensitive image-forming material for use with an infrared laser
US20150132544A1 (en) * 2012-08-22 2015-05-14 Fujifilm Corporation Ink composition, image forming method, and printed material

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228540A (en) * 1975-08-29 1977-03-03 Agency Of Ind Science & Technol Composition curable with radiations
US4247660A (en) * 1977-10-14 1981-01-27 Ciba-Geigy Corporation Photo-crosslinkable polymers having azidophthalimidyl side groups
DE2750285A1 (de) * 1977-11-10 1979-05-17 Bayer Ag Elektronenstrahlvernetzbare polymere
GB2008784B (en) * 1977-11-17 1982-04-15 Asahi Chemical Ind Heat resistant photoresist composition and process for preparing the same
DE3061376D1 (en) * 1979-01-30 1983-01-27 Ciba Geigy Ag Light curable polymers with side groups derived from indenon, their production and utilization
EP0021019B1 (de) * 1979-05-18 1984-10-17 Ciba-Geigy Ag Lichtvernetzbare Copolymere, sie enthaltendes lichtempfindliches Aufzeichnungsmaterial, seine Verwendung zur Herstellung photographischer Abbildungen und Verfahren zur Herstellung von photographischen Abbildungen
US4323701A (en) * 1980-01-23 1982-04-06 Ciba-Geigy Corporation Process for the preparation of indenonecarboxylic acids
US4416975A (en) * 1981-02-04 1983-11-22 Ciba-Geigy Corporation Photopolymerization process employing compounds containing acryloyl groups and maleimide groups
US4459414A (en) * 1981-04-08 1984-07-10 Ciba-Geigy Corporation Tetrasubstituted phthalic acid derivatives, and a process for their preparation
EP0078233A1 (de) * 1981-10-15 1983-05-04 Ciba-Geigy Ag Lichtempfindliches, Polymerbilder lieferndes Aufzeichnungsmaterial und Farbstoffe
US4480106A (en) * 1981-10-28 1984-10-30 Ciba-Geigy Corporation Process for the preparation of asymmetrically substituted maleic anhydrides, and asymmetrically substituted maleic anhydrides
US4502957A (en) * 1981-11-24 1985-03-05 Ciba-Geigy Corporation Process for purifying organic solutions
US4656292A (en) * 1982-05-19 1987-04-07 Ciba-Geigy Corporation 2,3-dimethylmaleimido-alkyl haloacetates
US4615968A (en) * 1982-11-04 1986-10-07 Ciba-Geigy Corporation Compositions of matter which crosslink under the action of light in the presence of sensitizers
US5059513A (en) * 1983-11-01 1991-10-22 Hoechst Celanese Corporation Photochemical image process of positive photoresist element with maleimide copolymer
US4857435A (en) * 1983-11-01 1989-08-15 Hoechst Celanese Corporation Positive photoresist thermally stable compositions and elements having deep UV response with maleimide copolymer
US4524121A (en) * 1983-11-21 1985-06-18 Rohm And Haas Company Positive photoresists containing preformed polyglutarimide polymer
US4569897A (en) * 1984-01-16 1986-02-11 Rohm And Haas Company Negative photoresist compositions with polyglutarimide polymer
US4631249A (en) * 1984-01-16 1986-12-23 Rohm & Haas Company Process for forming thermally stable negative images on surfaces utilizing polyglutarimide polymer in photoresist composition
DE3443090A1 (de) * 1984-11-27 1986-05-28 Bayer Ag, 5090 Leverkusen Aromatische polyester mit dimethylmaleinimid-endgruppen, ihre herstellung und verwendung
JPS6278544A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
US4720445A (en) * 1986-02-18 1988-01-19 Allied Corporation Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist
JPS62294238A (ja) * 1986-06-13 1987-12-21 Fuji Photo Film Co Ltd 感光性組成物
US4851454A (en) * 1986-07-17 1989-07-25 The Dow Chemical Company Photolytically crosslinkable thermally stable composition
JPS6435547A (en) * 1987-07-31 1989-02-06 Fuji Photo Film Co Ltd Photosensitive planographic printing original plate requiring no dampening water
JPH0252229U (enExample) * 1988-10-06 1990-04-16
JP2598994B2 (ja) * 1988-11-14 1997-04-09 富士写真フイルム株式会社 感光性組性物
JP2639722B2 (ja) * 1989-01-18 1997-08-13 富士写真フイルム株式会社 感光性組成物
JP2883622B2 (ja) * 1989-02-03 1999-04-19 鐘淵化学工業株式会社 ポリイミド組成物
US5240808A (en) * 1989-04-27 1993-08-31 Fuji Photo Film Co., Ltd. Light-sensitive compositions containing photosensitive polymeric compound having both photocross-linkable groups capable of cycloaddition, and functional groups carrying P--OH bonds
JP2639732B2 (ja) * 1989-07-28 1997-08-13 富士写真フイルム株式会社 感光性組成物
JP2639734B2 (ja) * 1989-08-03 1997-08-13 富士写真フイルム株式会社 感光性組成物
US5171655A (en) * 1989-08-03 1992-12-15 Fuji Photo Film Co., Ltd. Photohardenable light-sensitive composition
JPH0390313A (ja) * 1989-09-01 1991-04-16 Kubota Corp 破砕圧縮装置
US5098982A (en) * 1989-10-10 1992-03-24 The B. F. Goodrich Company Radiation curable thermoplastic polyurethanes
JP2599003B2 (ja) * 1989-10-16 1997-04-09 富士写真フイルム株式会社 感光性組成物
JP2627565B2 (ja) * 1990-02-19 1997-07-09 富士写真フイルム株式会社 感光性平版印刷版
US5196550A (en) * 1990-04-30 1993-03-23 The B. F. Goodrich Company Maleimido group containing monomers
US5212268A (en) * 1990-04-30 1993-05-18 The B. F. Goodrich Company Multifunctional reactive polymeric diluent and method relating thereto
JPH0755047Y2 (ja) * 1990-12-20 1995-12-20 株式会社山本製作所 廃プラスチツク処理装置用の粗砕機
US5191088A (en) * 1991-03-11 1993-03-02 Ciba-Geigy Corporation Aromatic monoanhydride-esters
JPH04135305U (ja) * 1991-06-07 1992-12-16 株式会社山本製作所 廃プラスチツク処理装置
US5346975A (en) * 1991-09-20 1994-09-13 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPH0743115U (ja) * 1992-07-17 1995-08-18 株式会社ダイソー 発泡スチロール溶解装置
DE4416415A1 (de) * 1994-05-10 1995-11-16 Hoechst Ag Copolymere auf Basis von ethylenisch ungesättigten Dicarbonsäureanhydriden, langkettigen Olefinen und Fluorolefinen
US6011149A (en) * 1995-03-07 2000-01-04 Novartis Ag Photochemically cross-linked polysaccharide derivatives as supports for the chromatographic separation of enantiomers
US6034150A (en) * 1996-08-23 2000-03-07 University Of Southern Mississippi Polymerization processes using aliphatic maleimides
US20040235976A1 (en) * 1996-08-23 2004-11-25 Hoyle Charles E. Polymerization processes using alphatic maleimides
US6271339B1 (en) 1996-09-12 2001-08-07 Sartomer Company, Inc. Prepolymers having maleimide functions the process for preparing them and their uses
US6306923B1 (en) * 1996-09-12 2001-10-23 Sartomer Company, Inc. Ultraviolet or visible light polymerizable and/or crosslinkable maleimide-functional coating compositions
JP3599160B2 (ja) 1997-05-16 2004-12-08 大日本インキ化学工業株式会社 マレイミド誘導体を含有する活性エネルギー線硬化性組成物及び該活性エネルギー線硬化性組成物の硬化方法
AU776635B2 (en) * 1998-03-26 2004-09-16 Dainippon Ink And Chemicals Inc. Water compatible energy curable compositions containing maleimide derivatives
HK1041491A1 (zh) * 1998-07-31 2002-07-12 Fusion Uv Systems, Inc. 采用电荷转移复合体和阳离子光敏引发剂的光聚合方法和组合物
US6835758B2 (en) * 1998-11-14 2004-12-28 Sun Chemical Corporation Water compatible energy curable compositions containing malemide derivatives
EP1087261A1 (en) * 1999-09-24 2001-03-28 Sumitomo Bakelite Company Limited Photosensitive resin composition, multilayer printed wiring board and process for production thereof
EP1106659A1 (en) 1999-12-03 2001-06-13 Toagosei Co., Ltd. Paint composition
US6517988B1 (en) 2001-07-12 2003-02-11 Kodak Polychrome Graphics Llc Radiation-sensitive, positive working coating composition based on carboxylic copolymers
TWI312882B (en) * 2003-03-24 2009-08-01 Dainippon Printing Co Ltd Curable resin composition, curable resin composition for photo-process patterning, color filter, substrate for liquid crystal panel and liquid crystal panel
US7030201B2 (en) * 2003-11-26 2006-04-18 Az Electronic Materials Usa Corp. Bottom antireflective coatings
US7317059B2 (en) * 2004-09-24 2008-01-08 Fuji Xerox Co., Ltd. Ligand immobilization support
JP4720175B2 (ja) * 2004-12-15 2011-07-13 富士ゼロックス株式会社 マレイミジル基含有材料およびその製造方法
DE102005006421A1 (de) * 2005-02-12 2006-08-24 Clariant Produkte (Deutschland) Gmbh Polymere und ihre Herstellung und Verwendung als Gashydratinhibitoren
DE102005007287B4 (de) * 2005-02-17 2007-01-25 Clariant Produkte (Deutschland) Gmbh Verwendung von Polyestern als Gashydratinhibitoren
DE102005009134A1 (de) * 2005-03-01 2006-09-14 Clariant Produkte (Deutschland) Gmbh Biologisch abbaubare Gashydratinhibitoren
WO2008123478A1 (en) * 2007-03-29 2008-10-16 Canon Kabushiki Kaisha Active energy ray curable liquid composition and liquid cartridge
DE102007037016B4 (de) * 2007-08-06 2011-06-30 Clariant International Limited Verwendung von 1-Alkyl-5-oxo-pyrrolidin-3-carbonsäureestern als Gashydratinhibitoren mit verbesserter biologischer Abbaubarkeit
JP5615600B2 (ja) 2010-06-09 2014-10-29 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物
JP5680353B2 (ja) 2010-08-24 2015-03-04 富士フイルム株式会社 水性インク組成物、インクジェット記録方法及びインクジェット印画物
JP5579542B2 (ja) 2010-08-31 2014-08-27 富士フイルム株式会社 インク組成物、画像形成方法、及び印画物
JP5634888B2 (ja) 2011-01-12 2014-12-03 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP5295284B2 (ja) 2011-02-07 2013-09-18 富士フイルム株式会社 インク組成物及び画像形成方法。
JP5398760B2 (ja) 2011-02-23 2014-01-29 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP5611870B2 (ja) 2011-03-15 2014-10-22 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP5762172B2 (ja) 2011-06-24 2015-08-12 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
GB201121139D0 (en) 2011-12-08 2012-01-18 Sericol Ltd Radiation curable inks
JP5808684B2 (ja) 2012-02-01 2015-11-10 富士フイルム株式会社 水性インク組成物及び画像形成方法
US20130257034A1 (en) 2012-03-28 2013-10-03 Fujifilm Corporation Ink composition, image forming method, and printed article
JP5883144B2 (ja) 2012-08-23 2016-03-09 富士フイルム株式会社 インク組成物、画像形成方法、印画物、およびグラフト共重合体
JP2014169379A (ja) * 2013-03-04 2014-09-18 Fujifilm Corp 加飾シートの製造方法、加飾シート、加飾シート成形物、インモールド成形品の製造方法、及び、インモールド成形品
JP2014185235A (ja) 2013-03-22 2014-10-02 Fujifilm Corp 白色インク組成物、複層形成用インクセット、画像形成方法及び印画物
JP6021707B2 (ja) 2013-03-26 2016-11-09 富士フイルム株式会社 インクジェット記録方法及び印刷物
US10100247B2 (en) 2013-05-17 2018-10-16 Preferred Technology, Llc Proppant with enhanced interparticle bonding
US11208591B2 (en) * 2016-11-16 2021-12-28 Preferred Technology, Llc Hydrophobic coating of particulates for enhanced well productivity
US12330186B2 (en) 2017-11-02 2025-06-17 Preferred Technology, Llc Continuous mixers and methods of using the same
EP3842863A4 (en) * 2018-08-20 2021-11-03 Mitsubishi Gas Chemical Company, Inc. FILM EDUCATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, LAYER FILM FOR LITHOGRAPHY AND PATTERN GENERATION PROCESS

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2031573A1 (de) * 1969-07-01 1971-01-07 General Electric Co., Schenectady, N Y (V.St.A.) Imidosubstituierte Polyester und Verfahren zu ihrer Herstellung
US3652716A (en) * 1969-07-01 1972-03-28 Gen Electric Imido-substituted polyester compositions
DE2235298A1 (de) * 1971-07-21 1973-02-08 Gen Electric Verfahren zum beschichten von substraten und vorrichtung zur durchfuehrung dieses verfahrens

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2484423A (en) * 1945-10-30 1949-10-11 Eastman Kodak Co Process for the preparation of polyvinylamine salts
US3651012A (en) * 1969-04-25 1972-03-21 Gen Electric Novel bis-imide compositions and polymers therefrom

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2031573A1 (de) * 1969-07-01 1971-01-07 General Electric Co., Schenectady, N Y (V.St.A.) Imidosubstituierte Polyester und Verfahren zu ihrer Herstellung
US3652716A (en) * 1969-07-01 1972-03-28 Gen Electric Imido-substituted polyester compositions
DE2235298A1 (de) * 1971-07-21 1973-02-08 Gen Electric Verfahren zum beschichten von substraten und vorrichtung zur durchfuehrung dieses verfahrens

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0072780A1 (de) * 1981-08-17 1983-02-23 Ciba-Geigy Ag Imidylverbindungen, Polymere daraus und Verwendung der Polymeren
EP0079307A1 (de) * 1981-11-06 1983-05-18 Ciba-Geigy Ag Verwendung von lichtvernetzbaren Copolymeren zur Herstellung von semipermeablen Membranen
EP0094913A3 (en) * 1982-05-19 1984-09-12 Ciba-Geigy Ag Water-soluble photo-cross-linkable polymers, their preparation and use
EP0112134A3 (en) * 1982-12-10 1987-05-13 Sumitomo Electric Industries Limited Gas-selectively permeable membrane and method of forming said membrane
EP0176835A3 (de) * 1984-09-26 1988-01-07 Bayer Ag Polyamide gegen Lichteinwirkung stabilisiert
EP0848002A1 (fr) * 1996-12-12 1998-06-17 Institut Francais Du Petrole Ester de l'acide maléimidobenzoique
FR2757165A1 (fr) * 1996-12-12 1998-06-19 Inst Francais Du Petrole Ester de l'acide maleimidobenzoique
US5981763A (en) * 1996-12-12 1999-11-09 Institut Francais Du Petrole Ester of maleimibenzoic acid
USRE41579E1 (en) 1997-10-17 2010-08-24 Fujifilm Corporation Positive type photosensitive image-forming material for use with an infrared laser
EP1506857A2 (en) 1998-06-23 2005-02-16 Kodak Polychrome Graphics LLC Positive-working thermal imaging element and positive-working lithographic printing plate precursor
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6358669B1 (en) 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
EP1506856A2 (en) 1998-06-23 2005-02-16 Kodak Polychrome Graphics LLC Positive-working thermal imaging element and positive-working lithographic printing plate precursor
US6087066A (en) * 1998-10-15 2000-07-11 Kodak Polychrome Graphics Llc Polyvinyl acetals having imido groups and use thereof in photosensitive compositions
US20150132544A1 (en) * 2012-08-22 2015-05-14 Fujifilm Corporation Ink composition, image forming method, and printed material

Also Published As

Publication number Publication date
FR2316257A1 (fr) 1977-01-28
GB1544299A (en) 1979-04-19
JPS6037123B2 (ja) 1985-08-24
CA1098245A (en) 1981-03-24
US4079041A (en) 1978-03-14
JPS52988A (en) 1977-01-06
DE2661043C2 (enExample) 1989-08-31
FR2316257B1 (enExample) 1981-10-30

Similar Documents

Publication Publication Date Title
DE2626769A1 (de) Vernetzbare polymere verbindungen
US4158731A (en) Crosslinkable polymeric compounds
EP0062610B1 (de) Photopolymerisationsverfahren
DE2952697A1 (de) Durch strahlung polymerisierbares gemisch und damit hergestelltes strahlungsempfindliches kopiermaterial
EP0001597B1 (de) Unter der Einwirkung von Licht härtbare, Bis-Azidophthalimidyl-Derivate enthaltende Stoffgemische
EP0003552B1 (de) Unter der Einwirkung von Licht vernetzbare Polymere mit seitenständigen tricyclischen Imidylgruppen, ihre Herstellung und ihre Verwendung
EP0094913B1 (de) Photovernetzbare wasserlösliche Polymere, Verfahren zu ihrer Herstellung und ihre Verwendung
EP0031592A1 (de) Photopolymerisierbares Gemisch und damit hergestelltes photopolymerisierbares Kopiermaterial
DE60032943T2 (de) Imid-benzoxazolpolykondensat sowie verfahren zur herstellung
EP0339306B1 (de) Lichtempfindliches Gemisch mit Carboxylgruppen enthaltenden Bindemitteln
EP0212440B1 (de) Strahlungsempfindliches Gemisch, dieses enthaltendes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zur Herstellung von Reliefbildern
EP0440086B1 (de) Strahlungsempfindliches Gemisch, hiermit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zur Herstellung von Reliefaufzeichnungen
EP0107621A2 (de) Zur positiven Bilderzeugung geeignete Stoffgemische, Verfahren zur positiven Bilderzeugung und die damit erhaltenen Bilder
EP0440057B1 (de) Strahlungsempfindliches Gemisch und hieraus hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
EP0571899B1 (de) Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen
EP0206983A2 (de) Verfahren und Polymere zur Bilderzeugung
EP0041678A2 (de) Verfahren zur Herstellung hochwärmebeständiger Reliefstrukturen und deren Verwendung
EP0203030B1 (de) Beschichtetes Material und seine Verwendung
DE3820699A1 (de) Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE2457882C3 (enExample)
EP0113314B1 (de) In Gegenwart von Sensibilisatoren unter Lichteinwirkung vernetzbare Stoffgemische
CH617950A5 (enExample)
DE2626837A1 (de) Vernetzbare polymere
DE3703167A1 (de) Photoempfindliche polyimidvorstufe
EP0198798A2 (de) Strahlungsempfindliche Polykondensate, Verfahren zu deren Herstellung, beschichtetes Material und dessen Verwendung

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8128 New person/name/address of the agent

Representative=s name: ZUMSTEIN SEN., F., DR. ASSMANN, E., DIPL.-CHEM. DR

8172 Supplementary division/partition in:

Ref country code: DE

Ref document number: 2661043

Format of ref document f/p: P

Q171 Divided out to:

Ref country code: DE

Ref document number: 2661043

8125 Change of the main classification

Ipc: C08G 63/00

AH Division in

Ref country code: DE

Ref document number: 2661043

Format of ref document f/p: P

8127 New person/name/address of the applicant

Owner name: ROHNER AG, PRATTELN, CH

8128 New person/name/address of the agent

Representative=s name: ZUMSTEIN, F., DIPL.-CHEM. DR.RER.NAT. KLINGSEISEN,

8139 Disposal/non-payment of the annual fee