DE2521727A1 - Verfahren zur herstellung eines resistbildes - Google Patents

Verfahren zur herstellung eines resistbildes

Info

Publication number
DE2521727A1
DE2521727A1 DE19752521727 DE2521727A DE2521727A1 DE 2521727 A1 DE2521727 A1 DE 2521727A1 DE 19752521727 DE19752521727 DE 19752521727 DE 2521727 A DE2521727 A DE 2521727A DE 2521727 A1 DE2521727 A1 DE 2521727A1
Authority
DE
Germany
Prior art keywords
layer
resist
diazoketone
substrate
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752521727
Other languages
German (de)
English (en)
Inventor
Leon H Kaplan
Steven M Zimmerman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2521727A1 publication Critical patent/DE2521727A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE19752521727 1974-06-06 1975-05-15 Verfahren zur herstellung eines resistbildes Withdrawn DE2521727A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US47683174A 1974-06-06 1974-06-06

Publications (1)

Publication Number Publication Date
DE2521727A1 true DE2521727A1 (de) 1975-12-18

Family

ID=23893432

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752521727 Withdrawn DE2521727A1 (de) 1974-06-06 1975-05-15 Verfahren zur herstellung eines resistbildes

Country Status (4)

Country Link
JP (1) JPS5857097B2 (fr)
DE (1) DE2521727A1 (fr)
FR (1) FR2274072A1 (fr)
GB (1) GB1501194A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4377633A (en) * 1981-08-24 1983-03-22 International Business Machines Corporation Methods of simultaneous contact and metal lithography patterning
DE3541451A1 (de) * 1985-02-27 1986-08-28 Imtec Products, Inc., Sunnyvale, Calif. Verfahren zum herstellen eines negativbildes

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6291938A (ja) * 1985-10-18 1987-04-27 Fuji Photo Film Co Ltd 製版方法
JPS62114478A (ja) * 1985-11-11 1987-05-26 Taga Denki Kk 超音波振動子とその駆動制御方法
JPS62152377A (ja) * 1985-12-24 1987-07-07 Taga Denki Kk 超音波振動子の駆動制御方法
JPS62171473A (ja) * 1986-01-23 1987-07-28 Taga Denki Kk 超音波振動子
JPS62152378A (ja) * 1985-12-24 1987-07-07 Taga Denki Kk 超音波振動子
JPS62126874A (ja) * 1985-11-27 1987-06-09 Taga Denki Kk 超音波振動子
JPS62141980A (ja) * 1985-12-16 1987-06-25 Taga Denki Kk 超音波振動子とその駆動制御方法
JPS63110980A (ja) * 1986-10-28 1988-05-16 Taga Electric Co Ltd 超音波モ−タの駆動方法
JPH0727220B2 (ja) * 1988-03-08 1995-03-29 三洋電機株式会社 パターン形成方法
GB2224362B (en) * 1988-11-01 1993-05-19 Yamatoya Shokai A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1058845B (de) * 1958-02-11 1959-06-04 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von wasserunloeslichen Diazoverbindungen
DE1224147B (de) * 1963-08-23 1966-09-01 Kalle Ag Verfahren zur Umkehrentwicklung von Diazo-verbindungen enthaltenden Kopierschichten
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1058845B (de) * 1958-02-11 1959-06-04 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von wasserunloeslichen Diazoverbindungen
DE1224147B (de) * 1963-08-23 1966-09-01 Kalle Ag Verfahren zur Umkehrentwicklung von Diazo-verbindungen enthaltenden Kopierschichten
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Chemical Abstracts, Vol. 60, Jan. 1964, Nr. 651h *
IBM Techn.Discl.Bul. Vol. 9, Nr. 4, Sep. 1966, S. 348-349 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4377633A (en) * 1981-08-24 1983-03-22 International Business Machines Corporation Methods of simultaneous contact and metal lithography patterning
DE3541451A1 (de) * 1985-02-27 1986-08-28 Imtec Products, Inc., Sunnyvale, Calif. Verfahren zum herstellen eines negativbildes

Also Published As

Publication number Publication date
JPS513633A (ja) 1976-01-13
FR2274072B1 (fr) 1982-02-05
GB1501194A (en) 1978-02-15
JPS5857097B2 (ja) 1983-12-19
FR2274072A1 (fr) 1976-01-02

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Legal Events

Date Code Title Description
OD Request for examination
8128 New person/name/address of the agent

Representative=s name: STREHL, P., DIPL.-ING. DIPL.-WIRTSCH.-ING. SCHUEBE

8125 Change of the main classification

Ipc: G03F 7/08

8136 Disposal/non-payment of the fee for publication/grant