DE2517743C3 - Passivierender Schutzüberzug für Siliziumhalbleiterbauelemente - Google Patents

Passivierender Schutzüberzug für Siliziumhalbleiterbauelemente

Info

Publication number
DE2517743C3
DE2517743C3 DE2517743A DE2517743A DE2517743C3 DE 2517743 C3 DE2517743 C3 DE 2517743C3 DE 2517743 A DE2517743 A DE 2517743A DE 2517743 A DE2517743 A DE 2517743A DE 2517743 C3 DE2517743 C3 DE 2517743C3
Authority
DE
Germany
Prior art keywords
glass
cordierite
thermal expansion
glasses
coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2517743A
Other languages
German (de)
English (en)
Other versions
DE2517743A1 (de
DE2517743B2 (de
Inventor
Gerd Dr. 6500 Mainz Mueller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Jenaer Glaswerk Schott and Gen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jenaer Glaswerk Schott and Gen filed Critical Jenaer Glaswerk Schott and Gen
Priority to DE2517743A priority Critical patent/DE2517743C3/de
Priority to JP51043792A priority patent/JPS51130172A/ja
Priority to US05/678,445 priority patent/US4133690A/en
Publication of DE2517743A1 publication Critical patent/DE2517743A1/de
Publication of DE2517743B2 publication Critical patent/DE2517743B2/de
Application granted granted Critical
Publication of DE2517743C3 publication Critical patent/DE2517743C3/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/004—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of particles or flakes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
    • H10W74/137—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations being directly on the semiconductor body
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/43—Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2214/00—Nature of the non-vitreous component
    • C03C2214/04—Particles; Flakes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/252—Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Inorganic Insulating Materials (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
DE2517743A 1975-04-22 1975-04-22 Passivierender Schutzüberzug für Siliziumhalbleiterbauelemente Expired DE2517743C3 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE2517743A DE2517743C3 (de) 1975-04-22 1975-04-22 Passivierender Schutzüberzug für Siliziumhalbleiterbauelemente
JP51043792A JPS51130172A (en) 1975-04-22 1976-04-19 Glass for making semiconductor surface nonconductive
US05/678,445 US4133690A (en) 1975-04-22 1976-04-19 Glass composition for passivating semiconductor surfaces

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2517743A DE2517743C3 (de) 1975-04-22 1975-04-22 Passivierender Schutzüberzug für Siliziumhalbleiterbauelemente

Publications (3)

Publication Number Publication Date
DE2517743A1 DE2517743A1 (de) 1976-11-04
DE2517743B2 DE2517743B2 (de) 1979-06-28
DE2517743C3 true DE2517743C3 (de) 1980-03-06

Family

ID=5944647

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2517743A Expired DE2517743C3 (de) 1975-04-22 1975-04-22 Passivierender Schutzüberzug für Siliziumhalbleiterbauelemente

Country Status (3)

Country Link
US (1) US4133690A (enExample)
JP (1) JPS51130172A (enExample)
DE (1) DE2517743C3 (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5819125B2 (ja) * 1976-08-11 1983-04-16 株式会社日立製作所 半導体装置の製造方法
JPS5529161A (en) * 1978-08-22 1980-03-01 Mitsubishi Electric Corp Glass for semiconductor passivation
DE2842492C2 (de) * 1978-09-29 1986-04-17 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur Herstellung einer aus einem Halbleiter-Glas-Verbundwerkstoff bestehenden Photokathode
US4235645A (en) * 1978-12-15 1980-11-25 Westinghouse Electric Corp. Process for forming glass-sealed multichip semiconductor devices
US4405722A (en) * 1979-01-23 1983-09-20 Asahi Glass Company Ltd. Sealing glass compositions
US4246034A (en) * 1980-01-14 1981-01-20 Corning Glass Works Devitrifying solder sealing glasses
FR2509285A1 (fr) * 1981-07-09 1983-01-14 Comp Generale Electricite Materiau vitreux et application a un composant a semi-conducteur
US4492717A (en) * 1981-07-27 1985-01-08 International Business Machines Corporation Method for forming a planarized integrated circuit
JPS58125638A (ja) * 1982-01-21 1983-07-26 Toshiba Corp 半導体被覆用ガラス組成物
JPS5911700A (ja) * 1982-07-12 1984-01-21 株式会社日立製作所 セラミツク多層配線回路板
JPS6028296A (ja) * 1983-07-27 1985-02-13 株式会社日立製作所 セラミツク多層配線回路板
US4655864A (en) * 1985-03-25 1987-04-07 E. I. Du Pont De Nemours And Company Dielectric compositions and method of forming a multilayer interconnection using same
US4654095A (en) * 1985-03-25 1987-03-31 E. I. Du Pont De Nemours And Company Dielectric composition
US4946716A (en) * 1985-05-31 1990-08-07 Tektronix, Inc. Method of thinning a silicon wafer using a reinforcing material
JP2507418B2 (ja) * 1986-05-02 1996-06-12 旭硝子株式会社 回路基板用組成物
US4788046A (en) * 1987-08-13 1988-11-29 Ceramics Process Systems Corporation Method for producing materials for co-sintering
US5270270A (en) * 1989-02-25 1993-12-14 Schott Glaswerke Process for producing dense-sintered cordierite bodies
US5258334A (en) * 1993-01-15 1993-11-02 The U.S. Government As Represented By The Director, National Security Agency Process of preventing visual access to a semiconductor device by applying an opaque ceramic coating to integrated circuit devices
US5958100A (en) * 1993-06-03 1999-09-28 Micron Technology, Inc. Process of making a glass semiconductor package
DE69426208T2 (de) 1993-08-05 2001-05-17 Matsushita Electronics Corp., Takatsuki Halbleiterbauelement mit Kondensator und dessen Herstellungsverfahren
US5448111A (en) * 1993-09-20 1995-09-05 Fujitsu Limited Semiconductor device and method for fabricating the same
US5639325A (en) * 1995-02-01 1997-06-17 The Whitaker Corporation Process for producing a glass-coated article
EP0882690A1 (en) * 1997-06-02 1998-12-09 Ngk Insulators, Ltd. Ceramic articles with conductive glaze
DE19728693C2 (de) * 1997-07-04 1999-04-29 Siemens Ag Halbleitermodul
US6190947B1 (en) * 1997-09-15 2001-02-20 Zowie Technology Corporation Silicon semiconductor rectifier chips and manufacturing method thereof
US6432752B1 (en) * 2000-08-17 2002-08-13 Micron Technology, Inc. Stereolithographic methods for fabricating hermetic semiconductor device packages and semiconductor devices including stereolithographically fabricated hermetic packages
US7589420B2 (en) * 2006-06-06 2009-09-15 Hewlett-Packard Development Company, L.P. Print head with reduced bonding stress and method
JP4772006B2 (ja) * 2007-07-31 2011-09-14 パンパシフィック・カッパー株式会社 ドラム型ろ過装置のろ布固定用ワイヤの巻き付け装置
US9385075B2 (en) 2012-10-26 2016-07-05 Infineon Technologies Ag Glass carrier with embedded semiconductor device and metal layers on the top surface
CN109564904B (zh) 2016-08-03 2023-01-20 福禄公司 用于半导体器件的钝化玻璃
FR3079662B1 (fr) * 2018-03-30 2020-02-28 Soitec Substrat pour applications radiofrequences et procede de fabrication associe
DE102020106946A1 (de) 2020-03-13 2021-09-16 Schott Ag Glas zur Passivierung von Halbleiterbauelementen

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3290565A (en) * 1963-10-24 1966-12-06 Philco Corp Glass enclosed, passivated semiconductor with contact means of alternate layers of chromium, silver and chromium
US3533832A (en) * 1965-09-30 1970-10-13 Gen Electric Glass covered semiconductor device
US3561984A (en) * 1967-03-22 1971-02-09 Scm Corp Composition for glazing ceramic ware
DE1596995A1 (de) * 1967-12-28 1971-04-01 Siemens Ag Glaslot
US3922471A (en) * 1972-06-19 1975-11-25 Owens Illinois Inc Surface having sealing glass composition thereon
JPS4941083A (enExample) * 1972-08-28 1974-04-17
US3961114A (en) * 1973-04-20 1976-06-01 International Business Machines Corporation Glass composition
DE2323897A1 (de) 1973-05-11 1974-11-28 Dasy Int Sa Material fuer dokumente

Also Published As

Publication number Publication date
JPS557943B2 (enExample) 1980-02-29
US4133690A (en) 1979-01-09
DE2517743A1 (de) 1976-11-04
JPS51130172A (en) 1976-11-12
DE2517743B2 (de) 1979-06-28

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8327 Change in the person/name/address of the patent owner

Owner name: SCHOTT GLASWERKE, 6500 MAINZ, DE

8339 Ceased/non-payment of the annual fee