DE2502235A1 - Ladungskopplungs-halbleiteranordnung - Google Patents
Ladungskopplungs-halbleiteranordnungInfo
- Publication number
- DE2502235A1 DE2502235A1 DE19752502235 DE2502235A DE2502235A1 DE 2502235 A1 DE2502235 A1 DE 2502235A1 DE 19752502235 DE19752502235 DE 19752502235 DE 2502235 A DE2502235 A DE 2502235A DE 2502235 A1 DE2502235 A1 DE 2502235A1
- Authority
- DE
- Germany
- Prior art keywords
- gate electrodes
- layer
- implanted
- semiconductor substrate
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 48
- 238000010168 coupling process Methods 0.000 title description 16
- 238000005859 coupling reaction Methods 0.000 title description 16
- 230000008878 coupling Effects 0.000 title description 15
- 238000000034 method Methods 0.000 claims description 51
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 26
- 230000004888 barrier function Effects 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 150000002500 ions Chemical class 0.000 claims description 13
- 235000012239 silicon dioxide Nutrition 0.000 claims description 13
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 9
- 230000003647 oxidation Effects 0.000 claims description 9
- 238000007254 oxidation reaction Methods 0.000 claims description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 9
- 230000000903 blocking effect Effects 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 6
- 238000002513 implantation Methods 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 239000011810 insulating material Substances 0.000 claims 6
- 239000010410 layer Substances 0.000 description 134
- 229920002120 photoresistant polymer Polymers 0.000 description 25
- 238000005530 etching Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 230000002452 interceptive effect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- -1 boron ions Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
- H01L29/76866—Surface Channel CCD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823406—Combination of charge coupled devices, i.e. CCD, or BBD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1025—Channel region of field-effect devices
- H01L29/1062—Channel region of field-effect devices of charge coupled devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42396—Gate electrodes for field effect devices for charge coupled devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/440,930 US3931674A (en) | 1974-02-08 | 1974-02-08 | Self aligned CCD element including two levels of electrodes and method of manufacture therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2502235A1 true DE2502235A1 (de) | 1975-08-14 |
DE2502235C2 DE2502235C2 (US06580902-20030617-M00005.png) | 1989-09-14 |
Family
ID=23750782
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19752502235 Granted DE2502235A1 (de) | 1974-02-08 | 1975-01-21 | Ladungskopplungs-halbleiteranordnung |
Country Status (8)
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2746335A1 (de) * | 1976-10-14 | 1978-04-27 | Sony Corp | Verfahren zur herstellung einer ladungsuebertragungsvorrichtung |
DE2926334A1 (de) * | 1978-06-29 | 1980-01-03 | Raytheon Co | Verfahren zur herstellung von halbleiterbauelementen, insbesondere von ladungsgekoppelten bauelementen |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4027381A (en) * | 1975-07-23 | 1977-06-07 | Texas Instruments Incorporated | Silicon gate ccd structure |
US4035906A (en) * | 1975-07-23 | 1977-07-19 | Texas Instruments Incorporated | Silicon gate CCD structure |
US4024563A (en) * | 1975-09-02 | 1977-05-17 | Texas Instruments Incorporated | Doped oxide buried channel charge-coupled device |
US4040168A (en) * | 1975-11-24 | 1977-08-09 | Rca Corporation | Fabrication method for a dual gate field-effect transistor |
US4167017A (en) * | 1976-06-01 | 1979-09-04 | Texas Instruments Incorporated | CCD structures with surface potential asymmetry beneath the phase electrodes |
US4076557A (en) * | 1976-08-19 | 1978-02-28 | Honeywell Inc. | Method for providing semiconductor devices |
US4097885A (en) * | 1976-10-15 | 1978-06-27 | Fairchild Camera And Instrument Corp. | Compact, two-phase charge-coupled-device structure utilizing multiple layers of conductive material |
JPS54149476A (en) * | 1978-05-16 | 1979-11-22 | Fujitsu Ltd | Production of semiconductor device |
US4231149A (en) * | 1978-10-10 | 1980-11-04 | Texas Instruments Incorporated | Narrow band-gap semiconductor CCD imaging device and method of fabrication |
US4377904A (en) * | 1978-10-10 | 1983-03-29 | Texas Instruments Incorporated | Method of fabricating a narrow band-gap semiconductor CCD imaging device |
US4692993A (en) * | 1978-12-05 | 1987-09-15 | Clark Marion D | Schottky barrier charge coupled device (CCD) manufacture |
JPS5966169A (ja) * | 1982-10-07 | 1984-04-14 | Matsushita Electric Ind Co Ltd | Ccdおよびその製造方法 |
DD231896A1 (de) * | 1984-08-21 | 1986-01-08 | Werk Fernsehelektronik Veb | Ladungsgekoppeltes bauelement (ccd) |
NL8501339A (nl) * | 1985-05-10 | 1986-12-01 | Philips Nv | Halfgeleiderinrichting en werkwijze ter vervaardiging daarvan. |
FR2583576B1 (fr) * | 1985-06-18 | 1988-09-16 | Thomson Csf | Dispositif a transfert de charge a grilles couplees |
US5229313A (en) * | 1989-09-29 | 1993-07-20 | Mitsubishi Denki Kabushiki Kaisha | Method of making a semiconductor device having multilayer structure |
JPH04155842A (ja) * | 1990-10-18 | 1992-05-28 | Matsushita Electron Corp | 電荷転送装置の製造方法 |
JP2642523B2 (ja) * | 1991-03-19 | 1997-08-20 | 株式会社東芝 | 電荷結合素子を持つ半導体集積回路装置の製造方法 |
KR940000953Y1 (ko) * | 1991-04-13 | 1994-02-25 | 금성일렉트론 주식회사 | Ccd의 리셋트 게이트 구조 |
KR940009601B1 (ko) * | 1991-09-14 | 1994-10-15 | 금성일렉트론 주식회사 | 전하전송장치의 제조방법 |
US5298448A (en) * | 1992-12-18 | 1994-03-29 | Eastman Kodak Company | Method of making two-phase buried channel planar gate CCD |
DE4438318C2 (de) * | 1994-10-26 | 2001-06-13 | Gold Star Electronics | Zweiphasen-CCD und Verfahren zu dessen Herstellung |
US5637891A (en) * | 1994-12-08 | 1997-06-10 | Goldstar Electron Co., Ltd. | Charge coupled device having different insulators |
US5460997A (en) * | 1995-01-23 | 1995-10-24 | Eastman Kodak Company | Method of making a confined planar charge coupled device with edge aligned implants and interconnected electrodes |
US5556801A (en) * | 1995-01-23 | 1996-09-17 | Eastman Kodak Company | Method of making a planar charge coupled device with edge aligned implants and interconnected electrodes |
US5719075A (en) * | 1995-07-31 | 1998-02-17 | Eastman Kodak Company | Method of making a planar charge coupled device with edge aligned implants and electrodes connected with overlying metal |
US6227723B1 (en) * | 1999-06-30 | 2001-05-08 | Kyocera Corporation | Substrate for mounting an optical component and optical module provided with the same |
US7233350B2 (en) * | 2002-01-05 | 2007-06-19 | Candela Microsystems, Inc. | Image sensor with interleaved image output |
US6795117B2 (en) | 2001-11-06 | 2004-09-21 | Candela Microsystems, Inc. | CMOS image sensor with noise cancellation |
US8054357B2 (en) | 2001-11-06 | 2011-11-08 | Candela Microsystems, Inc. | Image sensor with time overlapping image output |
US20030193594A1 (en) * | 2002-04-16 | 2003-10-16 | Tay Hiok Nam | Image sensor with processor controlled integration time |
US7015960B2 (en) * | 2003-03-18 | 2006-03-21 | Candela Microsystems, Inc. | Image sensor that uses a temperature sensor to compensate for dark current |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2253702A1 (de) * | 1971-11-20 | 1973-05-24 | Philips Nv | Verfahren zur herstellung einer halbleiteranordnung und durch dieses verfahren hergestellte halbleiteranordnung |
US3745647A (en) * | 1970-10-07 | 1973-07-17 | Rca Corp | Fabrication of semiconductor devices |
DE2316612A1 (de) * | 1972-04-03 | 1973-10-18 | Hitachi Ltd | Ladungsuebertragungs-halbleitervorrichtungen |
US3770988A (en) * | 1970-09-04 | 1973-11-06 | Gen Electric | Self-registered surface charge launch-receive device and method for making |
DE2314260A1 (de) * | 1972-05-30 | 1973-12-13 | Ibm | Ladungsgekoppelte halbleiteranordnung und verfahren zu ihrer herstellung |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3735156A (en) * | 1971-06-28 | 1973-05-22 | Bell Telephone Labor Inc | Reversible two-phase charge coupled devices |
JPS4838982A (US06580902-20030617-M00005.png) * | 1971-09-20 | 1973-06-08 | ||
US3796928A (en) * | 1971-11-03 | 1974-03-12 | Ibm | Semiconductor shift register |
US3852799A (en) * | 1973-04-27 | 1974-12-03 | Bell Telephone Labor Inc | Buried channel charge coupled apparatus |
-
1974
- 1974-02-08 US US05/440,930 patent/US3931674A/en not_active Expired - Lifetime
- 1974-12-10 GB GB53399/74A patent/GB1481364A/en not_active Expired
- 1974-12-12 CA CA215,866A patent/CA1101549A/en not_active Expired
-
1975
- 1975-01-21 DE DE19752502235 patent/DE2502235A1/de active Granted
- 1975-01-31 FR FR7503119A patent/FR2260870B1/fr not_active Expired
- 1975-02-03 NL NL7501244A patent/NL7501244A/xx not_active Application Discontinuation
- 1975-02-07 JP JP50015537A patent/JPS50115982A/ja active Pending
-
1980
- 1980-08-28 HK HK475/80A patent/HK47580A/xx unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3770988A (en) * | 1970-09-04 | 1973-11-06 | Gen Electric | Self-registered surface charge launch-receive device and method for making |
US3745647A (en) * | 1970-10-07 | 1973-07-17 | Rca Corp | Fabrication of semiconductor devices |
DE2253702A1 (de) * | 1971-11-20 | 1973-05-24 | Philips Nv | Verfahren zur herstellung einer halbleiteranordnung und durch dieses verfahren hergestellte halbleiteranordnung |
DE2316612A1 (de) * | 1972-04-03 | 1973-10-18 | Hitachi Ltd | Ladungsuebertragungs-halbleitervorrichtungen |
DE2314260A1 (de) * | 1972-05-30 | 1973-12-13 | Ibm | Ladungsgekoppelte halbleiteranordnung und verfahren zu ihrer herstellung |
Non-Patent Citations (2)
Title |
---|
IEEE International Electron Device Meeting Technical Digest, Washington DC, Dezember 1973, S. 24-26 * |
US-Z.: IBM Techn. Discl. Bull., Bd. 14, 1971, Nr. 4, S. 1234 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2746335A1 (de) * | 1976-10-14 | 1978-04-27 | Sony Corp | Verfahren zur herstellung einer ladungsuebertragungsvorrichtung |
DE2926334A1 (de) * | 1978-06-29 | 1980-01-03 | Raytheon Co | Verfahren zur herstellung von halbleiterbauelementen, insbesondere von ladungsgekoppelten bauelementen |
Also Published As
Publication number | Publication date |
---|---|
JPS50115982A (US06580902-20030617-M00005.png) | 1975-09-10 |
DE2502235C2 (US06580902-20030617-M00005.png) | 1989-09-14 |
FR2260870B1 (US06580902-20030617-M00005.png) | 1980-11-07 |
GB1481364A (en) | 1977-07-27 |
FR2260870A1 (US06580902-20030617-M00005.png) | 1975-09-05 |
NL7501244A (nl) | 1975-08-12 |
CA1101549A (en) | 1981-05-19 |
US3931674A (en) | 1976-01-13 |
HK47580A (en) | 1980-09-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OD | Request for examination | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition |