DE2414005A1 - Antistatisches photographisches material - Google Patents
Antistatisches photographisches materialInfo
- Publication number
- DE2414005A1 DE2414005A1 DE2414005A DE2414005A DE2414005A1 DE 2414005 A1 DE2414005 A1 DE 2414005A1 DE 2414005 A DE2414005 A DE 2414005A DE 2414005 A DE2414005 A DE 2414005A DE 2414005 A1 DE2414005 A1 DE 2414005A1
- Authority
- DE
- Germany
- Prior art keywords
- antistatic
- film
- photographic material
- static
- photographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
- G03C1/895—Polyalkylene oxides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyamides (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3283773A JPS5718175B2 (US06168776-20010102-C00041.png) | 1973-03-22 | 1973-03-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE2414005A1 true DE2414005A1 (de) | 1974-10-03 |
Family
ID=12369919
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2414005A Pending DE2414005A1 (de) | 1973-03-22 | 1974-03-22 | Antistatisches photographisches material |
Country Status (4)
Country | Link |
---|---|
US (1) | US3876430A (US06168776-20010102-C00041.png) |
JP (1) | JPS5718175B2 (US06168776-20010102-C00041.png) |
DE (1) | DE2414005A1 (US06168776-20010102-C00041.png) |
GB (1) | GB1410581A (US06168776-20010102-C00041.png) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4118231A (en) * | 1972-03-08 | 1978-10-03 | Konishiroku Photo Industry Co., Ltd. | Light-sensitive silver halide photographic materials containing antistatic agents |
CH638362GA3 (US06168776-20010102-C00041.png) * | 1977-06-10 | 1983-09-30 | ||
LU78153A1 (fr) * | 1977-09-20 | 1979-05-25 | Oreal | Compositions cosmetiques a base de polymeres polyammonium quaternaires et procede de preparation |
JP2684438B2 (ja) * | 1990-07-20 | 1997-12-03 | 富士写真フイルム株式会社 | 帯電防止されたハロゲン化銀写真感光材料およびその製造法 |
US6066442A (en) | 1995-10-23 | 2000-05-23 | Konica Corporation | Plastic film having an improved anti-static property |
KR100526402B1 (ko) | 2002-11-22 | 2005-11-08 | 주식회사 엘지화학 | 고리형 올레핀계 부가 중합체를 포함하는 네가티브C-플레이트(negative C-plate)형 광학이방성 필름 및 이의 제조방법 |
KR100618153B1 (ko) | 2003-02-06 | 2006-08-29 | 주식회사 엘지화학 | 편광막의 보호필름, 편광판 및 이의 제조방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE634515A (US06168776-20010102-C00041.png) * | 1962-07-19 | |||
JPS4930520B1 (US06168776-20010102-C00041.png) * | 1969-09-04 | 1974-08-13 | ||
US3811887A (en) * | 1970-12-18 | 1974-05-21 | Konishiroku Photo Ind | Photographic material comprising bisacylhydrazinium compounds |
JPS4843809B1 (US06168776-20010102-C00041.png) * | 1970-12-18 | 1973-12-20 |
-
1973
- 1973-03-22 JP JP3283773A patent/JPS5718175B2/ja not_active Expired
-
1974
- 1974-03-21 GB GB1274574A patent/GB1410581A/en not_active Expired
- 1974-03-22 US US453893A patent/US3876430A/en not_active Expired - Lifetime
- 1974-03-22 DE DE2414005A patent/DE2414005A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
GB1410581A (en) | 1975-10-22 |
US3876430A (en) | 1975-04-08 |
JPS5718175B2 (US06168776-20010102-C00041.png) | 1982-04-15 |
JPS49121523A (US06168776-20010102-C00041.png) | 1974-11-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OHJ | Non-payment of the annual fee |