DE2326447C2 - Verfahren zum Entfernen von Schichten aus organischem Material und seine Verwendung - Google Patents
Verfahren zum Entfernen von Schichten aus organischem Material und seine VerwendungInfo
- Publication number
- DE2326447C2 DE2326447C2 DE19732326447 DE2326447A DE2326447C2 DE 2326447 C2 DE2326447 C2 DE 2326447C2 DE 19732326447 DE19732326447 DE 19732326447 DE 2326447 A DE2326447 A DE 2326447A DE 2326447 C2 DE2326447 C2 DE 2326447C2
- Authority
- DE
- Germany
- Prior art keywords
- mixture
- organic material
- content
- substrates
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 20
- 239000011368 organic material Substances 0.000 title claims description 16
- 239000000203 mixture Substances 0.000 claims description 49
- 229920002120 photoresistant polymer Polymers 0.000 claims description 16
- 230000001590 oxidative effect Effects 0.000 claims description 15
- 239000004065 semiconductor Substances 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 150000007513 acids Chemical class 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 12
- 238000004140 cleaning Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- FHHJDRFHHWUPDG-UHFFFAOYSA-N peroxysulfuric acid Chemical compound OOS(O)(=O)=O FHHJDRFHHWUPDG-UHFFFAOYSA-N 0.000 description 7
- 239000002966 varnish Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 1
- 235000009161 Espostoa lanata Nutrition 0.000 description 1
- 240000001624 Espostoa lanata Species 0.000 description 1
- 241000306729 Ligur Species 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 241001233037 catfish Species 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000012285 osmium tetroxide Substances 0.000 description 1
- 229910000489 osmium tetroxide Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19732326447 DE2326447C2 (de) | 1973-05-24 | 1973-05-24 | Verfahren zum Entfernen von Schichten aus organischem Material und seine Verwendung |
| FR7411895A FR2231110B1 (enExample) | 1973-05-24 | 1974-03-29 | |
| GB1469774A GB1427482A (en) | 1973-05-24 | 1974-04-03 | Stripping organic matter |
| IT2150574A IT1006475B (it) | 1973-05-24 | 1974-04-17 | Metodo perfezionato per la rimo zione di strati di materiale orga nico dalla superficie di compo nenti semiconduttori |
| CA199,318A CA1026220A (en) | 1973-05-24 | 1974-05-08 | Method for stripping layers of organic material |
| JP5349474A JPS5231712B2 (enExample) | 1973-05-24 | 1974-05-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19732326447 DE2326447C2 (de) | 1973-05-24 | 1973-05-24 | Verfahren zum Entfernen von Schichten aus organischem Material und seine Verwendung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2326447A1 DE2326447A1 (de) | 1974-12-12 |
| DE2326447C2 true DE2326447C2 (de) | 1986-02-06 |
Family
ID=5881998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19732326447 Expired DE2326447C2 (de) | 1973-05-24 | 1973-05-24 | Verfahren zum Entfernen von Schichten aus organischem Material und seine Verwendung |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5231712B2 (enExample) |
| CA (1) | CA1026220A (enExample) |
| DE (1) | DE2326447C2 (enExample) |
| FR (1) | FR2231110B1 (enExample) |
| GB (1) | GB1427482A (enExample) |
| IT (1) | IT1006475B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57186330A (en) * | 1981-05-12 | 1982-11-16 | Matsushita Electronics Corp | Removing method for photoresist |
| JPS6053954A (ja) * | 1983-09-05 | 1985-03-28 | Oki Electric Ind Co Ltd | フォトマスク洗浄方法 |
| EP0256284B1 (en) * | 1986-08-09 | 1991-03-27 | Micro-Image Technology Limited | Composition for use in the production of integrated circuits and method for its preparation and use |
| US4872919A (en) * | 1988-01-28 | 1989-10-10 | The Procter & Gamble Company | Method for removing precipitated calcium citrate from juice pasteurization or sterilization equipment |
| JPH0294911A (ja) * | 1988-09-30 | 1990-04-05 | Toshiba Corp | 弾性表面波素子の製造方法 |
| JP3152430B2 (ja) * | 1990-10-09 | 2001-04-03 | クロリンエンジニアズ株式会社 | 有機物被膜の除去方法 |
-
1973
- 1973-05-24 DE DE19732326447 patent/DE2326447C2/de not_active Expired
-
1974
- 1974-03-29 FR FR7411895A patent/FR2231110B1/fr not_active Expired
- 1974-04-03 GB GB1469774A patent/GB1427482A/en not_active Expired
- 1974-04-17 IT IT2150574A patent/IT1006475B/it active
- 1974-05-08 CA CA199,318A patent/CA1026220A/en not_active Expired
- 1974-05-15 JP JP5349474A patent/JPS5231712B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5021681A (enExample) | 1975-03-07 |
| GB1427482A (en) | 1976-03-10 |
| FR2231110B1 (enExample) | 1979-02-16 |
| CA1026220A (en) | 1978-02-14 |
| FR2231110A1 (enExample) | 1974-12-20 |
| IT1006475B (it) | 1976-09-30 |
| JPS5231712B2 (enExample) | 1977-08-16 |
| DE2326447A1 (de) | 1974-12-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |