GB1427482A - Stripping organic matter - Google Patents

Stripping organic matter

Info

Publication number
GB1427482A
GB1427482A GB1469774A GB1469774A GB1427482A GB 1427482 A GB1427482 A GB 1427482A GB 1469774 A GB1469774 A GB 1469774A GB 1469774 A GB1469774 A GB 1469774A GB 1427482 A GB1427482 A GB 1427482A
Authority
GB
United Kingdom
Prior art keywords
acid
sulphuric acid
hydrogen peroxide
ratio
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1469774A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1427482A publication Critical patent/GB1427482A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)

Abstract

1427482 Persuiphuric acid INTERNATIONAL BUSINESS MACHINES CORP 3 April 1974 [24 May 1973] 14697/74 Heading C1A [Also in Divisions B6 and G2] A liquid for removing organic material from substrates is prepared by mixing sulphuric acid containing at least 95% H 2 SO 4 by weight with an aqueous solution of hydrogen peroxide containing at least 30% H 2 O 2 by weight in such proportions that the ratio of H 2 SO 4 to H 2 O 2 is at least 15 : 1, preferably between 17 : 1 and 35 : 1. The ratio of the H 2 O 2 content to the water content of the sulphuric acid is preferably at least 11:1. The sulphuric acid and hydrogen peroxide react to form Caro acid (H 2 SO 5 ) and water, and the concentration of Caro acid resulting is preferably 3-10%. The liquid is suitable for stripping positive or negative photoresist from a semi-conductor substrate.
GB1469774A 1973-05-24 1974-04-03 Stripping organic matter Expired GB1427482A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732326447 DE2326447C2 (en) 1973-05-24 1973-05-24 Process for removing layers of organic material and its use

Publications (1)

Publication Number Publication Date
GB1427482A true GB1427482A (en) 1976-03-10

Family

ID=5881998

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1469774A Expired GB1427482A (en) 1973-05-24 1974-04-03 Stripping organic matter

Country Status (6)

Country Link
JP (1) JPS5231712B2 (en)
CA (1) CA1026220A (en)
DE (1) DE2326447C2 (en)
FR (1) FR2231110B1 (en)
GB (1) GB1427482A (en)
IT (1) IT1006475B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57186330A (en) * 1981-05-12 1982-11-16 Matsushita Electronics Corp Removing method for photoresist
JPS6053954A (en) * 1983-09-05 1985-03-28 Oki Electric Ind Co Ltd Method for washing photomask
DE3768876D1 (en) * 1986-08-09 1991-05-02 Micro Image Technology Ltd COMPOSITION FOR THE PRODUCTION OF INTEGRATED CIRCUITS, APPLICATION AND PRODUCTION METHOD.
US4872919A (en) * 1988-01-28 1989-10-10 The Procter & Gamble Company Method for removing precipitated calcium citrate from juice pasteurization or sterilization equipment
JPH0294911A (en) * 1988-09-30 1990-04-05 Toshiba Corp Manufacture of surface acoustic wave element
JP3152430B2 (en) * 1990-10-09 2001-04-03 クロリンエンジニアズ株式会社 Organic film removal method

Also Published As

Publication number Publication date
FR2231110A1 (en) 1974-12-20
FR2231110B1 (en) 1979-02-16
DE2326447A1 (en) 1974-12-12
JPS5021681A (en) 1975-03-07
DE2326447C2 (en) 1986-02-06
CA1026220A (en) 1978-02-14
IT1006475B (en) 1976-09-30
JPS5231712B2 (en) 1977-08-16

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee