DE2253944C2 - Verfahren zur Herstellung eines Reliefbildes - Google Patents
Verfahren zur Herstellung eines ReliefbildesInfo
- Publication number
- DE2253944C2 DE2253944C2 DE19722253944 DE2253944A DE2253944C2 DE 2253944 C2 DE2253944 C2 DE 2253944C2 DE 19722253944 DE19722253944 DE 19722253944 DE 2253944 A DE2253944 A DE 2253944A DE 2253944 C2 DE2253944 C2 DE 2253944C2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- image
- relief
- liquid
- imagewise
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000007788 liquid Substances 0.000 claims description 22
- 238000005507 spraying Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 60
- 238000000034 method Methods 0.000 description 42
- 229920000642 polymer Polymers 0.000 description 19
- 239000000243 solution Substances 0.000 description 15
- 229920000159 gelatin Polymers 0.000 description 14
- 235000019322 gelatine Nutrition 0.000 description 14
- 108010010803 Gelatin Proteins 0.000 description 12
- 239000008273 gelatin Substances 0.000 description 12
- 235000011852 gelatine desserts Nutrition 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000007639 printing Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000004132 cross linking Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000008098 formaldehyde solution Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 108090000623 proteins and genes Proteins 0.000 description 4
- 102000004169 proteins and genes Human genes 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- -1 £ J Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 239000003518 caustics Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- 239000001828 Gelatine Substances 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N Glycolaldehyde Chemical compound OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- ADCZFIUBVFOGIT-SQQVDAMQSA-N (e)-but-2-enal;prop-2-enal Chemical compound C=CC=O.C\C=C\C=O ADCZFIUBVFOGIT-SQQVDAMQSA-N 0.000 description 1
- WAPNOHKVXSQRPX-UHFFFAOYSA-N 1-phenylethanol Chemical compound CC(O)C1=CC=CC=C1 WAPNOHKVXSQRPX-UHFFFAOYSA-N 0.000 description 1
- RNIPJYFZGXJSDD-UHFFFAOYSA-N 2,4,5-triphenyl-1h-imidazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 RNIPJYFZGXJSDD-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- MEYARNKYUHUVBB-UHFFFAOYSA-N 2-hydroxy-1-[2-(hydroxymethyl)phenyl]-2-phenylethanone Chemical compound OCC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 MEYARNKYUHUVBB-UHFFFAOYSA-N 0.000 description 1
- BSRGWDCFCZTOJK-UHFFFAOYSA-N 4-isocyanobutanoic acid Chemical compound OC(=O)CCC[N+]#[C-] BSRGWDCFCZTOJK-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004129 EU approved improving agent Substances 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical class C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 102000004142 Trypsin Human genes 0.000 description 1
- 108090000631 Trypsin Proteins 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 125000000641 acridinyl group Chemical class C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- GZCGUPFRVQAUEE-SLPGGIOYSA-N aldehydo-D-glucose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C=O GZCGUPFRVQAUEE-SLPGGIOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- XCQGGIFCJJOOAM-UHFFFAOYSA-N butyl 9,10-dioxoanthracene-2-carboxylate Chemical compound C1=CC=C2C(=O)C3=CC(C(=O)OCCCC)=CC=C3C(=O)C2=C1 XCQGGIFCJJOOAM-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- VQXINLNPICQTLR-UHFFFAOYSA-N carbonyl diazide Chemical class [N-]=[N+]=NC(=O)N=[N+]=[N-] VQXINLNPICQTLR-UHFFFAOYSA-N 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 230000000447 dimerizing effect Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- SCOAVUHOIJMIBW-UHFFFAOYSA-N phenanthrene-1,2-dione Chemical class C1=CC=C2C(C=CC(C3=O)=O)=C3C=CC2=C1 SCOAVUHOIJMIBW-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000001484 phenothiazinyl group Chemical class C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- HSVFKFNNMLUVEY-UHFFFAOYSA-N sulfuryl diazide Chemical class [N-]=[N+]=NS(=O)(=O)N=[N+]=[N-] HSVFKFNNMLUVEY-UHFFFAOYSA-N 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical class C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- 239000012588 trypsin Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/003—Forme preparation the relief or intaglio pattern being obtained by imagewise deposition of a liquid, e.g. by an ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0511—Diffusion patterning
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Duplication Or Marking (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722253944 DE2253944C2 (de) | 1972-11-03 | 1972-11-03 | Verfahren zur Herstellung eines Reliefbildes |
| BE1005451A BE806432A (nl) | 1972-11-03 | 1973-10-24 | Werkwijze voor de vervaardiging van reliefbeelden |
| IT5344773A IT996357B (it) | 1972-11-03 | 1973-10-31 | Procedimento per registrare immagi ni in rilievo mediante getti di liquido |
| CA184,819A CA1005329A (en) | 1972-11-03 | 1973-11-01 | Process for the production of relief images |
| CH1547473A CH582723A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-11-03 | 1973-11-02 | |
| FR7339128A FR2206704A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-11-03 | 1973-11-02 | |
| JP12296773A JPS4979240A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-11-03 | 1973-11-02 | |
| GB5094773A GB1431462A (en) | 1972-11-03 | 1973-11-02 | Process for the production of relief images |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722253944 DE2253944C2 (de) | 1972-11-03 | 1972-11-03 | Verfahren zur Herstellung eines Reliefbildes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2253944A1 DE2253944A1 (de) | 1974-05-09 |
| DE2253944C2 true DE2253944C2 (de) | 1983-02-24 |
Family
ID=5860789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722253944 Expired DE2253944C2 (de) | 1972-11-03 | 1972-11-03 | Verfahren zur Herstellung eines Reliefbildes |
Country Status (8)
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3047884A1 (de) * | 1980-12-18 | 1982-07-15 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur automatisierbaren bearbeitung in der halbleitertechnologie, z.b. von leiterplatten |
| DE3326508A1 (de) * | 1983-07-22 | 1985-02-07 | Bayer Ag, 5090 Leverkusen | Verfahren zum aktivieren von substratoberflaechen fuer die direkte partielle metallisierung von traegermaterialien |
| US4668533A (en) * | 1985-05-10 | 1987-05-26 | E. I. Du Pont De Nemours And Company | Ink jet printing of printed circuit boards |
| US5032216A (en) * | 1989-10-20 | 1991-07-16 | E. I. Du Pont De Nemours And Company | Non-photographic method for patterning organic polymer films |
| US5270078A (en) * | 1992-08-14 | 1993-12-14 | E. I. Du Pont De Nemours And Company | Method for preparing high resolution wash-off images |
| US5292556A (en) * | 1992-12-22 | 1994-03-08 | E. I. Du Pont De Nemours And Company | Method for preparing negative-working wash-off relief images |
| DE69413894T2 (de) * | 1993-07-20 | 1999-04-15 | Riso Kagaku Corp., Tokio/Tokyo | Schablonendruckplatte |
| JP3377562B2 (ja) * | 1993-08-04 | 2003-02-17 | 理想科学工業株式会社 | 孔版印刷用原紙の製版方法 |
| JPH07108780A (ja) * | 1993-10-14 | 1995-04-25 | Riso Kagaku Corp | 孔版印刷用原紙およびその穿孔方法 |
| US5466653A (en) * | 1994-06-29 | 1995-11-14 | E. I. Du Pont De Nemours And Company | Method for preparing negative-working wash-off relief images and non-photosensitive elements for use therein |
| JPH0885249A (ja) * | 1994-09-16 | 1996-04-02 | Riso Kagaku Corp | 記録装置 |
| US5609914A (en) * | 1995-05-02 | 1997-03-11 | E.I. Du Pont De Nemours And Company | Method for preparing high resolution polyimide images using non-photosensitive layers of poly(amic acid) or salts thereof |
| DE69524247T2 (de) * | 1995-08-04 | 2002-08-08 | International Business Machines Corp., Armonk | Stempel für lithographie-verfahren |
| WO1997006013A1 (en) * | 1995-08-04 | 1997-02-20 | International Business Machines Corporation | Lithographic surface or thin layer modification |
| JP3507600B2 (ja) * | 1995-10-05 | 2004-03-15 | 理想科学工業株式会社 | 感熱孔版原紙の製版方法並びにそれに用いる感熱孔版原紙及び組成物 |
| JPH09277487A (ja) * | 1996-02-16 | 1997-10-28 | Riso Kagaku Corp | 感熱孔版原紙の製版方法並びにそれに用いる感熱孔版原紙及び組成物 |
| US5738013A (en) * | 1996-05-14 | 1998-04-14 | New England Science & Specialty Products, Inc. | Method of making a lithographic printing plate with an ink jet fluid material |
| JPH09327899A (ja) * | 1996-06-10 | 1997-12-22 | Riso Kagaku Corp | 感熱孔版原紙の製版方法 |
| DE19634122A1 (de) | 1996-08-23 | 1998-02-26 | Inst Physikalische Hochtech Ev | Neuartige Bäder zur Erzeugung von Mikrostrukturen |
| JPH1086545A (ja) * | 1996-09-13 | 1998-04-07 | Riso Kagaku Corp | 感熱孔版原紙製版用組成物及び製版方法 |
| JPH10264493A (ja) * | 1997-03-24 | 1998-10-06 | Riso Kagaku Corp | 複式印刷装置 |
| JPH10264351A (ja) * | 1997-03-28 | 1998-10-06 | Riso Kagaku Corp | 複式印刷装置及び複式印刷装置における記録方法 |
| GB9711427D0 (en) * | 1997-06-04 | 1997-07-30 | Eastman Kodak Co | Method of forming an image |
| GB9711425D0 (en) * | 1997-06-04 | 1997-07-30 | Eastman Kodak Co | Method of forming an image |
| GB2329611B (en) * | 1997-09-25 | 2002-05-08 | Autotype Internat Ltd | Screen printing stencil production |
| GB2331271B (en) | 1997-10-18 | 2001-10-10 | Eastman Kodak Co | Method of forming an image |
| GB2333997B (en) | 1998-02-06 | 2002-07-17 | Autotype Internat Ltd | Screen printing stencil production |
| GB2335392B (en) * | 1998-02-17 | 2001-11-07 | Autotype Internat Ltd | Screen printing stencil production |
| AU8819198A (en) * | 1998-09-07 | 2000-03-27 | Giuseppe Paccagnella | Method of production of a negative photomechanical film, substrate and ink composition for carrying out such a method |
| US6681691B2 (en) | 2000-03-02 | 2004-01-27 | Autotype International Limited | Screen printing stencil production |
| US6691618B2 (en) | 2000-05-08 | 2004-02-17 | Pisces-Print Imaging Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| US6315916B1 (en) | 2000-05-08 | 2001-11-13 | Pisces-Print Image Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| US6739260B2 (en) * | 2001-05-17 | 2004-05-25 | Agfa-Gevaert | Method for the preparation of a negative working printing plate |
| US7036430B2 (en) | 2002-12-26 | 2006-05-02 | Creo Il Ltd. | Method for producing a flexographic printing plate formed by inkjetted fluid |
| US6981446B2 (en) * | 2003-07-08 | 2006-01-03 | Eastman Kodak Company | Ink-jet imaging method |
| US7044053B2 (en) | 2004-03-10 | 2006-05-16 | Creo Il. Ltd. | Method and materials for improving resolution for ctp-inkjet |
| JP4638259B2 (ja) * | 2005-03-10 | 2011-02-23 | 三菱製紙株式会社 | 平版印刷版の製版方法 |
| WO2008051432A2 (en) * | 2006-10-19 | 2008-05-02 | President And Fellows Of Harvard College | Patterning of ionic polymers |
| US9421751B2 (en) | 2009-11-23 | 2016-08-23 | Vim-Technologies Ltd | Direct inkjet imaging lithographic plates, methods for imaging and pre-press treatment |
| KR102628632B1 (ko) | 2015-06-04 | 2024-01-23 | 카티바, 인크. | 금속 표면 상에서 에치 레지스트 패턴의 제조 방법 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3560641A (en) * | 1968-10-18 | 1971-02-02 | Mead Corp | Image construction system using multiple arrays of drop generators |
-
1972
- 1972-11-03 DE DE19722253944 patent/DE2253944C2/de not_active Expired
-
1973
- 1973-10-24 BE BE1005451A patent/BE806432A/xx unknown
- 1973-10-31 IT IT5344773A patent/IT996357B/it active
- 1973-11-01 CA CA184,819A patent/CA1005329A/en not_active Expired
- 1973-11-02 CH CH1547473A patent/CH582723A5/xx not_active IP Right Cessation
- 1973-11-02 FR FR7339128A patent/FR2206704A5/fr not_active Expired
- 1973-11-02 GB GB5094773A patent/GB1431462A/en not_active Expired
- 1973-11-02 JP JP12296773A patent/JPS4979240A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| IT996357B (it) | 1975-12-10 |
| JPS4979240A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-07-31 |
| CH582723A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-12-15 |
| DE2253944A1 (de) | 1974-05-09 |
| CA1005329A (en) | 1977-02-15 |
| BE806432A (nl) | 1974-04-24 |
| FR2206704A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-06-07 |
| GB1431462A (en) | 1976-04-07 |
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