DE2242106A1 - Lichtempfindliches photographisches material - Google Patents
Lichtempfindliches photographisches materialInfo
- Publication number
- DE2242106A1 DE2242106A1 DE2242106A DE2242106A DE2242106A1 DE 2242106 A1 DE2242106 A1 DE 2242106A1 DE 2242106 A DE2242106 A DE 2242106A DE 2242106 A DE2242106 A DE 2242106A DE 2242106 A1 DE2242106 A1 DE 2242106A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- dihydropyridine
- exposed
- dye
- colored
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims description 24
- 239000000758 substrate Substances 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 14
- YNGDWRXWKFWCJY-UHFFFAOYSA-N 1,4-Dihydropyridine Chemical compound C1C=CNC=C1 YNGDWRXWKFWCJY-UHFFFAOYSA-N 0.000 claims description 8
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- ZKTPUEBHSQHTQH-UHFFFAOYSA-N 4-(2-nitrophenyl)-1,4-dihydropyridine Chemical compound [O-][N+](=O)C1=CC=CC=C1C1C=CNC=C1 ZKTPUEBHSQHTQH-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 125000000623 heterocyclic group Chemical group 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000000468 ketone group Chemical group 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000001054 5 membered carbocyclic group Chemical group 0.000 claims 1
- 125000004008 6 membered carbocyclic group Chemical group 0.000 claims 1
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- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
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- 238000009835 boiling Methods 0.000 description 2
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- HJSLFCCWAKVHIW-UHFFFAOYSA-N cyclohexane-1,3-dione Chemical compound O=C1CCCC(=O)C1 HJSLFCCWAKVHIW-UHFFFAOYSA-N 0.000 description 2
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- AYCFSNOSASPIJM-UHFFFAOYSA-N 2,6-dimethyl-4-(2-nitrophenyl)-1,4-dihydropyridine-3,5-dicarbonitrile Chemical compound N#CC1=C(C)NC(C)=C(C#N)C1C1=CC=CC=C1[N+]([O-])=O AYCFSNOSASPIJM-UHFFFAOYSA-N 0.000 description 1
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- 238000002360 preparation method Methods 0.000 description 1
- AXLMPTNTPOWPLT-UHFFFAOYSA-N prop-2-enyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC=C AXLMPTNTPOWPLT-UHFFFAOYSA-N 0.000 description 1
- ONTHIOPVTJEYLT-UHFFFAOYSA-N prop-2-ynyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC#C ONTHIOPVTJEYLT-UHFFFAOYSA-N 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- JBJWASZNUJCEKT-UHFFFAOYSA-M sodium;hydroxide;hydrate Chemical compound O.[OH-].[Na+] JBJWASZNUJCEKT-UHFFFAOYSA-M 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/80—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D211/82—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/80—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D211/84—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen directly attached to ring carbon atoms
- C07D211/90—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D215/48—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
- C07D215/54—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 3
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Hydrogenated Pyridines (AREA)
- Quinoline Compounds (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2242106A DE2242106A1 (de) | 1972-08-26 | 1972-08-26 | Lichtempfindliches photographisches material |
| BE1005301A BE803700A (nl) | 1972-08-26 | 1973-08-17 | Lichtgevoelig fotografisch materiaal |
| US390214A US3901710A (en) | 1972-08-26 | 1973-08-21 | Photographic material comprising a light-sensitive 1,4-dihydropyridine derivative |
| IT52155/73A IT990315B (it) | 1972-08-26 | 1973-08-24 | Materiale fotografico fotosensibi le e suo procedimento di fabbrica zione |
| CH1220773A CH573607A5 (cg-RX-API-DMAC10.html) | 1972-08-26 | 1973-08-24 | |
| GB4019773A GB1404297A (en) | 1972-08-26 | 1973-08-24 | Light-sensitive photographic material |
| CA179,565A CA1004524A (en) | 1972-08-26 | 1973-08-24 | Light-sensitive photographic material |
| FR7330824A FR2197189B1 (cg-RX-API-DMAC10.html) | 1972-08-26 | 1973-08-24 | |
| JP48094879A JPS4960733A (cg-RX-API-DMAC10.html) | 1972-08-26 | 1973-08-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2242106A DE2242106A1 (de) | 1972-08-26 | 1972-08-26 | Lichtempfindliches photographisches material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2242106A1 true DE2242106A1 (de) | 1974-03-21 |
Family
ID=5854669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2242106A Pending DE2242106A1 (de) | 1972-08-26 | 1972-08-26 | Lichtempfindliches photographisches material |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3901710A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS4960733A (cg-RX-API-DMAC10.html) |
| BE (1) | BE803700A (cg-RX-API-DMAC10.html) |
| CA (1) | CA1004524A (cg-RX-API-DMAC10.html) |
| CH (1) | CH573607A5 (cg-RX-API-DMAC10.html) |
| DE (1) | DE2242106A1 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2197189B1 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1404297A (cg-RX-API-DMAC10.html) |
| IT (1) | IT990315B (cg-RX-API-DMAC10.html) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2388304A1 (fr) * | 1977-04-23 | 1978-11-17 | Du Pont | Elements photosensibles exempts d'argent, contenant une nitrofuryldihydropyridine, a action positive |
| DE3429615C1 (de) * | 1984-08-11 | 1985-12-12 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Verfahren zur Erzeugung von aus Pulvern bestehenden Mustern |
| DE19910363B4 (de) * | 1998-03-10 | 2007-08-30 | Mitsubishi Paper Mills Ltd. | Positives, lichtempfindliches bebilderbares Element |
| CN111253304A (zh) * | 2020-03-24 | 2020-06-09 | 合肥立方制药股份有限公司 | 一种硝苯地平的制备方法 |
Families Citing this family (65)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4159202A (en) * | 1973-12-20 | 1979-06-26 | Hoechst Aktiengesellschaft | Photopolymer having 2-pyridone side group |
| US4198242A (en) * | 1976-03-17 | 1980-04-15 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor |
| GB1591753A (en) * | 1977-03-02 | 1981-06-24 | Agfa Gevaert | Photosensitive recording material |
| DE2758209C3 (de) * | 1977-12-27 | 1980-07-10 | Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf | Lichtempfindliches Aufzeichnungsmaterial |
| DE2758210A1 (de) * | 1977-12-27 | 1979-06-28 | Du Pont Deutschland | Lichtempfindliches aufzeichnungsmaterial |
| US4181531A (en) * | 1978-04-07 | 1980-01-01 | E. I. Du Pont De Nemours And Company | Positive non-silver systems containing nitrofuryldihydropyridine |
| US4269933A (en) * | 1978-06-08 | 1981-05-26 | E. I. Du Pont De Nemours And Company | Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor |
| DE2945564A1 (de) * | 1978-11-13 | 1980-05-22 | Du Pont | Verfahren zur herstellung von mehrfarbenbildern |
| EP0388482B1 (de) * | 1989-03-20 | 1994-07-06 | Siemens Aktiengesellschaft | Lichtempfindliches Gemisch |
| US5851736A (en) * | 1991-03-05 | 1998-12-22 | Nitto Denko Corporation | Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern |
| JP3093055B2 (ja) * | 1992-07-07 | 2000-10-03 | 日東電工株式会社 | 耐熱性ネガ型フォトレジスト組成物および感光性基材、ならびにネガ型パターン形成方法 |
| EP0539154B1 (en) * | 1991-10-21 | 1997-12-29 | Zeneca Limited | Acridine-1,8-dione-derivatives as therapeutic agents |
| GB9220570D0 (en) * | 1991-10-21 | 1992-11-11 | Ici Plc | Therapeutic agent |
| JPH0954437A (ja) | 1995-06-05 | 1997-02-25 | Fuji Photo Film Co Ltd | 化学増幅型ポジレジスト組成物 |
| JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物 |
| US7052824B2 (en) * | 2000-06-30 | 2006-05-30 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
| US7521168B2 (en) | 2002-02-13 | 2009-04-21 | Fujifilm Corporation | Resist composition for electron beam, EUV or X-ray |
| US6939662B2 (en) | 2002-05-31 | 2005-09-06 | Fuji Photo Film Co., Ltd. | Positive-working resist composition |
| US7771915B2 (en) | 2003-06-27 | 2010-08-10 | Fujifilm Corporation | Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method |
| US20050203119A1 (en) * | 2003-09-10 | 2005-09-15 | Mitsunori Ono | Dihydropyridine compounds for treating or preventing metabolic disorders |
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| EP2644664B1 (en) | 2012-03-29 | 2015-07-29 | Fujifilm Corporation | Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article |
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Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3519424A (en) * | 1966-02-25 | 1970-07-07 | Eastman Kodak Co | Photosensitive compounds and elements |
| US3776735A (en) * | 1971-12-28 | 1973-12-04 | Kalle Ag | Light-sensitive copying composition containing a light insensitive polymer and a light sensitive heterocyclic compound |
-
1972
- 1972-08-26 DE DE2242106A patent/DE2242106A1/de active Pending
-
1973
- 1973-08-17 BE BE1005301A patent/BE803700A/xx unknown
- 1973-08-21 US US390214A patent/US3901710A/en not_active Expired - Lifetime
- 1973-08-24 CA CA179,565A patent/CA1004524A/en not_active Expired
- 1973-08-24 IT IT52155/73A patent/IT990315B/it active
- 1973-08-24 GB GB4019773A patent/GB1404297A/en not_active Expired
- 1973-08-24 FR FR7330824A patent/FR2197189B1/fr not_active Expired
- 1973-08-24 CH CH1220773A patent/CH573607A5/xx not_active IP Right Cessation
- 1973-08-25 JP JP48094879A patent/JPS4960733A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2388304A1 (fr) * | 1977-04-23 | 1978-11-17 | Du Pont | Elements photosensibles exempts d'argent, contenant une nitrofuryldihydropyridine, a action positive |
| DE3429615C1 (de) * | 1984-08-11 | 1985-12-12 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Verfahren zur Erzeugung von aus Pulvern bestehenden Mustern |
| DE19910363B4 (de) * | 1998-03-10 | 2007-08-30 | Mitsubishi Paper Mills Ltd. | Positives, lichtempfindliches bebilderbares Element |
| CN111253304A (zh) * | 2020-03-24 | 2020-06-09 | 合肥立方制药股份有限公司 | 一种硝苯地平的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1404297A (en) | 1975-08-28 |
| US3901710A (en) | 1975-08-26 |
| IT990315B (it) | 1975-06-20 |
| CA1004524A (en) | 1977-02-01 |
| CH573607A5 (cg-RX-API-DMAC10.html) | 1976-03-15 |
| FR2197189B1 (cg-RX-API-DMAC10.html) | 1976-12-03 |
| BE803700A (nl) | 1974-02-18 |
| FR2197189A1 (cg-RX-API-DMAC10.html) | 1974-03-22 |
| JPS4960733A (cg-RX-API-DMAC10.html) | 1974-06-12 |
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