DE2241634B2 - Verfahren zum fortlaufenden Aufbringen metallischer Überzüge auf ebene Werkstücke mittels Kathodenzerstäubung - Google Patents
Verfahren zum fortlaufenden Aufbringen metallischer Überzüge auf ebene Werkstücke mittels KathodenzerstäubungInfo
- Publication number
- DE2241634B2 DE2241634B2 DE2241634A DE2241634A DE2241634B2 DE 2241634 B2 DE2241634 B2 DE 2241634B2 DE 2241634 A DE2241634 A DE 2241634A DE 2241634 A DE2241634 A DE 2241634A DE 2241634 B2 DE2241634 B2 DE 2241634B2
- Authority
- DE
- Germany
- Prior art keywords
- workpieces
- source
- chamber
- magazine
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 25
- 238000000576 coating method Methods 0.000 title claims description 16
- 238000004544 sputter deposition Methods 0.000 title claims description 10
- 239000007921 spray Substances 0.000 claims description 55
- 239000007789 gas Substances 0.000 claims description 19
- 238000000889 atomisation Methods 0.000 claims description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 229910052715 tantalum Inorganic materials 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000000110 cooling liquid Substances 0.000 claims description 3
- 239000002923 metal particle Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 23
- 239000000969 carrier Substances 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 238000007789 sealing Methods 0.000 description 7
- 238000007872 degassing Methods 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 238000005507 spraying Methods 0.000 description 6
- 230000032258 transport Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 206010011878 Deafness Diseases 0.000 description 1
- 229910000746 Structural steel Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 231100000895 deafness Toxicity 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 208000016354 hearing loss disease Diseases 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 210000000689 upper leg Anatomy 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US00175247A US3856654A (en) | 1971-08-26 | 1971-08-26 | Apparatus for feeding and coating masses of workpieces in a controlled atmosphere |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2241634A1 DE2241634A1 (de) | 1973-03-01 |
| DE2241634B2 true DE2241634B2 (de) | 1974-11-21 |
Family
ID=22639550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2241634A Pending DE2241634B2 (de) | 1971-08-26 | 1972-08-24 | Verfahren zum fortlaufenden Aufbringen metallischer Überzüge auf ebene Werkstücke mittels Kathodenzerstäubung |
Country Status (11)
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2725885A1 (de) * | 1976-06-10 | 1977-12-22 | Univ Sydney | Verfahren und vorrichtung zum reaktiven zerstaeuben |
| DE3306870A1 (de) * | 1983-02-26 | 1984-08-30 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung |
| DE19537267C1 (de) * | 1994-10-19 | 1996-07-04 | Grc Glass Refining Center Ges | Verfahren zum Aufbringen von dünnen farbigen Schichten auf Substrate mit gekrümmten Oberflächen, insbesondere auf rotationssymmetrische Substrate, sowie Vorrichtung zur Durchführung des Verfahrens |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH573985A5 (enrdf_load_stackoverflow) * | 1973-11-22 | 1976-03-31 | Balzers Patent Beteilig Ag | |
| JPS5519289Y2 (enrdf_load_stackoverflow) * | 1975-01-06 | 1980-05-08 | ||
| US3981791A (en) * | 1975-03-10 | 1976-09-21 | Signetics Corporation | Vacuum sputtering apparatus |
| US3976555A (en) * | 1975-03-20 | 1976-08-24 | Coulter Information Systems, Inc. | Method and apparatus for supplying background gas in a sputtering chamber |
| JPS5218585A (en) * | 1975-08-05 | 1977-02-12 | Tadano Tekkosho:Kk | Double-acting hydraulic cylinder |
| US4051010A (en) * | 1975-12-18 | 1977-09-27 | Western Electric Company, Inc. | Sputtering apparatus |
| US4175030A (en) * | 1977-12-08 | 1979-11-20 | Battelle Development Corporation | Two-sided planar magnetron sputtering apparatus |
| US4116806A (en) * | 1977-12-08 | 1978-09-26 | Battelle Development Corporation | Two-sided planar magnetron sputtering apparatus |
| US4172021A (en) * | 1978-10-13 | 1979-10-23 | Western Electric Company, Inc. | Method and glow-suppression devices for transporting a gas across a voltage drop |
| US4268374A (en) * | 1979-08-09 | 1981-05-19 | Bell Telephone Laboratories, Incorporated | High capacity sputter-etching apparatus |
| US5024747A (en) * | 1979-12-21 | 1991-06-18 | Varian Associates, Inc. | Wafer coating system |
| US4647266A (en) * | 1979-12-21 | 1987-03-03 | Varian Associates, Inc. | Wafer coating system |
| US4756815A (en) * | 1979-12-21 | 1988-07-12 | Varian Associates, Inc. | Wafer coating system |
| US4311427A (en) * | 1979-12-21 | 1982-01-19 | Varian Associates, Inc. | Wafer transfer system |
| JPS5797903A (en) * | 1980-12-06 | 1982-06-17 | Yunitsuku:Kk | Double-acting cylinder |
| US4436602A (en) | 1981-11-27 | 1984-03-13 | Varian Associates, Inc. | Blocking shield and method for contouring the thickness of sputter coated layers |
| JPS58197262A (ja) * | 1982-05-13 | 1983-11-16 | Canon Inc | 量産型真空成膜装置及び真空成膜法 |
| JPS5970764A (ja) * | 1982-10-15 | 1984-04-21 | Ulvac Corp | プラズマｃｖｄ装置 |
| US4500407A (en) * | 1983-07-19 | 1985-02-19 | Varian Associates, Inc. | Disk or wafer handling and coating system |
| US4523985A (en) * | 1983-12-22 | 1985-06-18 | Sputtered Films, Inc. | Wafer processing machine |
| US4522697A (en) * | 1983-12-22 | 1985-06-11 | Sputtered Films, Inc. | Wafer processing machine |
| US4508612A (en) * | 1984-03-07 | 1985-04-02 | International Business Machines Corporation | Shield for improved magnetron sputter deposition into surface recesses |
| US4491509A (en) * | 1984-03-09 | 1985-01-01 | At&T Technologies, Inc. | Methods of and apparatus for sputtering material onto a substrate |
| US4534314A (en) * | 1984-05-10 | 1985-08-13 | Varian Associates, Inc. | Load lock pumping mechanism |
| FR2594102B1 (fr) * | 1986-02-12 | 1991-04-19 | Stein Heurtey | Installation flexible automatisee de traitement thermochimique rapide |
| US4812217A (en) * | 1987-04-27 | 1989-03-14 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method and apparatus for feeding and coating articles in a controlled atmosphere |
| US4952294A (en) * | 1988-03-15 | 1990-08-28 | Collins George J | Apparatus and method for in-situ generation of dangerous polyatomic gases, including polyatomic radicals |
| US4911810A (en) * | 1988-06-21 | 1990-03-27 | Brown University | Modular sputtering apparatus |
| US5059292A (en) * | 1989-02-28 | 1991-10-22 | Collins George J | Single-chamber apparatus for in-situ generation of dangerous polyatomic gases and radicals from a source material contained within a porous foamed structure |
| EP0550003B1 (de) * | 1991-12-27 | 1996-01-17 | Balzers Aktiengesellschaft | Vakuumbehandlungsanlage und deren Verwendungen |
| EP0572151A3 (en) * | 1992-05-28 | 1995-01-18 | Avx Corp | Varistors with cathodically vaporized connections and method for depositing cathodically vaporized connections on varistors. |
| US5565838A (en) * | 1992-05-28 | 1996-10-15 | Avx Corporation | Varistors with sputtered terminations |
| DE4235674C2 (de) * | 1992-10-22 | 2000-12-28 | Balzers Ag Liechtenstein | Kammer für den Transport von Werkstücken in Vakuumatmosphäre, Kammerkombination und Verfahren zum Transportieren eines Werkstückes |
| DE4235676C2 (de) * | 1992-10-22 | 1997-08-28 | Balzers Hochvakuum | Vakuumkammer zum Transport scheibenförmiger Werkstücke in einer Vakuumanlage |
| DE4235677C2 (de) * | 1992-10-22 | 1996-10-31 | Balzers Hochvakuum | Vakuumkammer, Vakuumbehandlungsanlage mit einer solchen Kammer sowie Transportverfahren |
| US5421979A (en) * | 1993-08-03 | 1995-06-06 | Photran Corporation | Load-lock drum-type coating apparatus |
| DE4341635C2 (de) * | 1993-12-07 | 2002-07-18 | Unaxis Deutschland Holding | Vakuumbeschichtungsanlage |
| US5791895A (en) * | 1994-02-17 | 1998-08-11 | Novellus Systems, Inc. | Apparatus for thermal treatment of thin film wafer |
| DE19624609B4 (de) * | 1996-06-20 | 2009-04-16 | Leybold Optics Gmbh | Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren |
| DE19626861B4 (de) * | 1996-07-04 | 2009-04-16 | Leybold Optics Gmbh | Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren |
| DE19642852A1 (de) | 1996-10-17 | 1998-04-23 | Leybold Systems Gmbh | Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf dreidimensionale, schalenförmige oder prismatische Substrate |
| US6210540B1 (en) * | 2000-03-03 | 2001-04-03 | Optical Coating Laboratory, Inc. | Method and apparatus for depositing thin films on vertical surfaces |
| US20020110700A1 (en) * | 2001-02-12 | 2002-08-15 | Hein Gerald F. | Process for forming decorative films and resulting products |
| US20100218721A1 (en) * | 2007-09-05 | 2010-09-02 | Atomic Energy Council - Institute Of Nuclear Energy Research | Hollow-cathode discharge apparatus for plasma-based processing |
| KR101458909B1 (ko) * | 2008-04-03 | 2014-11-07 | 삼성디스플레이 주식회사 | 인 라인 설비 |
| CN102080214B (zh) * | 2009-11-30 | 2013-06-05 | 鸿富锦精密工业（深圳）有限公司 | 镀膜装置 |
| TW201122148A (en) * | 2009-12-24 | 2011-07-01 | Hon Hai Prec Ind Co Ltd | Chemical vapor deposition device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3340176A (en) * | 1965-07-28 | 1967-09-05 | Western Electric Co | Vacuum processing machine |
| NL130959C (enrdf_load_stackoverflow) * | 1965-12-17 | |||
| US3451912A (en) * | 1966-07-15 | 1969-06-24 | Ibm | Schottky-barrier diode formed by sputter-deposition processes |
| US3501393A (en) * | 1967-05-05 | 1970-03-17 | Litton Systems Inc | Apparatus for sputtering wherein the plasma is confined by the target structure |
| US3528906A (en) * | 1967-06-05 | 1970-09-15 | Texas Instruments Inc | Rf sputtering method and system |
-
1971
- 1971-08-26 US US00175247A patent/US3856654A/en not_active Expired - Lifetime
-
1972
- 1972-03-27 CA CA138,188A patent/CA992910A/en not_active Expired
- 1972-08-17 SE SE7210698A patent/SE391739B/xx unknown
- 1972-08-18 IT IT5225172A patent/IT962154B/it active
- 1972-08-21 NL NL727211410A patent/NL155314B/xx not_active IP Right Cessation
- 1972-08-23 BE BE787884A patent/BE787884A/xx unknown
- 1972-08-24 GB GB3937972A patent/GB1406509A/en not_active Expired
- 1972-08-24 DE DE2241634A patent/DE2241634B2/de active Pending
- 1972-08-25 FR FR7230358A patent/FR2165849B1/fr not_active Expired
- 1972-08-26 JP JP47085020A patent/JPS527439B2/ja not_active Expired
-
1976
- 1976-06-10 HK HK362/76*UA patent/HK36276A/xx unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2725885A1 (de) * | 1976-06-10 | 1977-12-22 | Univ Sydney | Verfahren und vorrichtung zum reaktiven zerstaeuben |
| DE3306870A1 (de) * | 1983-02-26 | 1984-08-30 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung |
| DE19537267C1 (de) * | 1994-10-19 | 1996-07-04 | Grc Glass Refining Center Ges | Verfahren zum Aufbringen von dünnen farbigen Schichten auf Substrate mit gekrümmten Oberflächen, insbesondere auf rotationssymmetrische Substrate, sowie Vorrichtung zur Durchführung des Verfahrens |
Also Published As
| Publication number | Publication date |
|---|---|
| HK36276A (en) | 1976-06-18 |
| IT962154B (it) | 1973-12-20 |
| JPS527439B2 (enrdf_load_stackoverflow) | 1977-03-02 |
| DE2241634A1 (de) | 1973-03-01 |
| NL155314B (nl) | 1977-12-15 |
| SE391739B (sv) | 1977-02-28 |
| BE787884A (fr) | 1972-12-18 |
| NL7211410A (enrdf_load_stackoverflow) | 1973-02-28 |
| CA992910A (en) | 1976-07-13 |
| FR2165849A1 (enrdf_load_stackoverflow) | 1973-08-10 |
| JPS4831185A (enrdf_load_stackoverflow) | 1973-04-24 |
| FR2165849B1 (enrdf_load_stackoverflow) | 1975-03-07 |
| US3856654A (en) | 1974-12-24 |
| GB1406509A (en) | 1975-09-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2241634B2 (de) | Verfahren zum fortlaufenden Aufbringen metallischer Überzüge auf ebene Werkstücke mittels Kathodenzerstäubung | |
| DE2102352C3 (de) | Hochfrequenzbetriebene Sprühvorrichtung | |
| DE69023633T2 (de) | Kathodenzerstäubungsgerät und kathodenzerstäubungsanlage. | |
| DE69406689T2 (de) | Vorrichtung und Verfahren zur Beschichtung von Tabletten mit Gelatine | |
| DE3051188C2 (enrdf_load_stackoverflow) | ||
| EP0312694B1 (de) | Vorrichtung nach dem Karussell-Prinzip zum Beschichten von Substraten | |
| DE69731199T2 (de) | Verfahren und einrichtung zur berührungslose behandlung eines scheiben förmiges halbleitersubstrats | |
| DE69432165T2 (de) | Vorrichtung und system zum lichtbogenionenplattieren | |
| EP2026927B1 (de) | Verfahren und vorrichtung zur temperaturbehandlung, insbesondere lotverbindung | |
| DE3613018A1 (de) | Magnetron-zerstaeubungskathode | |
| DE2834353A1 (de) | Geraet zum aufdampfen von beschichtungen | |
| DE3108336C2 (de) | Gießvorrichtung und- verfahren | |
| DE102015104039B4 (de) | Bandsubstratbeschichtungsanlage mit einer Magnetronanordnung | |
| EP0499770A2 (de) | Indirekt gekühltes Target mit Schnellwechselsystem | |
| DE1615287A1 (de) | Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum | |
| DE2527184C3 (de) | Vorrichtung zur Herstellung von Targets für Kathodenzerstäubung | |
| DE2102334A1 (de) | Hochfrequenzspruhvornchtung | |
| DE3413001A1 (de) | Katodenzerstaeubungsanlage mit nebeneinander angeordneten stationen | |
| DE19617155B4 (de) | Sputterbeschichtungsstation, Verfahren zur Herstellung sputterbeschichteter Werkstücke und Verwendung der Station oder des Verfahrens zur Beschichtung scheibenförmiger Substrate | |
| DE1583752C3 (de) | Verfahren und Vorrichtung zum Beschichten der Oberfläche eines Werkstückes mit pulverförmigem Material | |
| EP0647961A1 (de) | Vorrichtung zum Beschichten von langgestreckten biegsamen Erzeugnissen | |
| DE3829260A1 (de) | Plasmabeschichtungskammer mit entfernbarem schutzschirm | |
| EP1006211B2 (de) | Verfahren und Einrichtung zur Plasma-Oberflächenbehandlung von Substraten | |
| DE2134377B2 (de) | Verfahren zum Abscheiden dünner Schichten auf metallische Werkstücke mittels Kathodenzerstäubung | |
| DE102004006849B4 (de) | Vorrichtung zum Beschichten von Substraten |