DE2206493C3 - Mehrschichtiger Quarzglaskörper für die Verwendung in der Festkörpertechnologie - Google Patents
Mehrschichtiger Quarzglaskörper für die Verwendung in der FestkörpertechnologieInfo
- Publication number
- DE2206493C3 DE2206493C3 DE2206493A DE2206493A DE2206493C3 DE 2206493 C3 DE2206493 C3 DE 2206493C3 DE 2206493 A DE2206493 A DE 2206493A DE 2206493 A DE2206493 A DE 2206493A DE 2206493 C3 DE2206493 C3 DE 2206493C3
- Authority
- DE
- Germany
- Prior art keywords
- quartz glass
- inner layer
- ions
- layer
- body according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 80
- 238000005516 engineering process Methods 0.000 title claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 26
- 150000002500 ions Chemical class 0.000 claims description 18
- 239000011034 rock crystal Substances 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 239000003112 inhibitor Substances 0.000 claims description 8
- 239000005350 fused silica glass Substances 0.000 claims description 6
- 150000001768 cations Chemical class 0.000 claims description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- -1 aluminum ions Chemical class 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 238000004873 anchoring Methods 0.000 claims description 2
- 229920002994 synthetic fiber Polymers 0.000 claims 1
- 239000010410 layer Substances 0.000 description 40
- 238000004519 manufacturing process Methods 0.000 description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 3
- 230000001427 coherent effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 230000005764 inhibitory process Effects 0.000 description 3
- 239000002574 poison Substances 0.000 description 3
- 231100000614 poison Toxicity 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000011011 black crystal Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
- Y10T428/1317—Multilayer [continuous layer]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2206493A DE2206493C3 (de) | 1972-02-11 | 1972-02-11 | Mehrschichtiger Quarzglaskörper für die Verwendung in der Festkörpertechnologie |
| JP1035773A JPS545404B2 (enExample) | 1972-02-11 | 1973-01-26 | |
| CH143473A CH584661A5 (enExample) | 1972-02-11 | 1973-02-01 | |
| US330136A US3925583A (en) | 1972-02-11 | 1973-02-06 | Composite quartz glass body |
| FR7304758A FR2171404B1 (enExample) | 1972-02-11 | 1973-02-09 | |
| GB684573A GB1382396A (en) | 1972-02-11 | 1973-02-12 | Multi-layer article made of transparent fused silica |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2206493A DE2206493C3 (de) | 1972-02-11 | 1972-02-11 | Mehrschichtiger Quarzglaskörper für die Verwendung in der Festkörpertechnologie |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2206493A1 DE2206493A1 (de) | 1973-08-23 |
| DE2206493B2 DE2206493B2 (enExample) | 1974-06-12 |
| DE2206493C3 true DE2206493C3 (de) | 1975-01-30 |
Family
ID=5835730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2206493A Expired DE2206493C3 (de) | 1972-02-11 | 1972-02-11 | Mehrschichtiger Quarzglaskörper für die Verwendung in der Festkörpertechnologie |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3925583A (enExample) |
| JP (1) | JPS545404B2 (enExample) |
| CH (1) | CH584661A5 (enExample) |
| DE (1) | DE2206493C3 (enExample) |
| FR (1) | FR2171404B1 (enExample) |
| GB (1) | GB1382396A (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2043040B (en) * | 1978-12-07 | 1982-12-15 | Tokyo Ohka Kogyo Co Ltd | Method for preventing leaching of contaminants from solid surfaces |
| DE3128698C2 (de) | 1981-07-21 | 1984-01-19 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Quarzglashüllrohr |
| JPS59184736A (ja) * | 1983-04-06 | 1984-10-20 | Furukawa Electric Co Ltd:The | 光学系多孔質ガラスの透明ガラス化法 |
| JPH0657612B2 (ja) * | 1987-05-14 | 1994-08-03 | 信越石英株式会社 | 合成石英ガラス管およびその製造方法 |
| US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
| US5011566A (en) * | 1989-03-15 | 1991-04-30 | The United States Of America As Represented By The Secretary Of The Air Force | Method of manufacturing microscopic tube material |
| JPH0611705A (ja) * | 1992-01-31 | 1994-01-21 | Sony Corp | 能動素子基板 |
| DE19719133C2 (de) * | 1997-05-07 | 1999-09-02 | Heraeus Quarzglas | Glocke aus Quarzglas und Verfahren für ihre Herstellung |
| US6110284A (en) * | 1998-01-09 | 2000-08-29 | Applied Materials, Inc. | Apparatus and a method for shielding light emanating from a light source heating a semicondutor processing chamber |
| US8824140B2 (en) * | 2010-09-17 | 2014-09-02 | Apple Inc. | Glass enclosure |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2188121A (en) * | 1936-12-11 | 1940-01-23 | Corning Glass Works | Making articles of fused silica |
| US2829981A (en) * | 1954-01-29 | 1958-04-08 | Shapiro Isadore | Surface modified silica gels |
| US3414465A (en) * | 1965-06-21 | 1968-12-03 | Owens Illinois Inc | Sealed glass article of manufacture |
| DE1621011A1 (de) * | 1967-04-13 | 1971-04-29 | Telefunken Patent | Verfahren zum Oberflaechenvergueten von Bauteilen |
| US3776809A (en) * | 1968-02-22 | 1973-12-04 | Heraeus Schott Quarzschmelze | Quartz glass elements |
| US3576932A (en) * | 1969-02-17 | 1971-04-27 | Texas Instruments Inc | Sintering vapor deposited silica on a mandrel designed to reduce shrinkage |
| BE757500A (fr) * | 1969-10-14 | 1971-03-16 | Ncr Co | Four tubulaire destine au traitement de dispositifs semi-conducteurs |
| DE2038564C3 (de) * | 1970-08-04 | 1973-09-13 | Heraeus Schott Quarzschmelze Gmbh, 6450 Hanau | Quarzglasgeräteteil, insbesondere Quarzglasrohr, mit in seiner Außenoberflächenschicht enthaltenen, Kristallbildung fördernden Keimen zur Verwendung bei hohen Temperaturen, insbesondere für die Durchführung halbleitertechnologischer Verfahren |
| US3779856A (en) * | 1971-07-23 | 1973-12-18 | Owens Illinois Inc | Glass-ceramic and method for making same |
-
1972
- 1972-02-11 DE DE2206493A patent/DE2206493C3/de not_active Expired
-
1973
- 1973-01-26 JP JP1035773A patent/JPS545404B2/ja not_active Expired
- 1973-02-01 CH CH143473A patent/CH584661A5/xx not_active IP Right Cessation
- 1973-02-06 US US330136A patent/US3925583A/en not_active Expired - Lifetime
- 1973-02-09 FR FR7304758A patent/FR2171404B1/fr not_active Expired
- 1973-02-12 GB GB684573A patent/GB1382396A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1382396A (en) | 1975-01-29 |
| US3925583A (en) | 1975-12-09 |
| JPS545404B2 (enExample) | 1979-03-16 |
| JPS4892410A (enExample) | 1973-11-30 |
| DE2206493B2 (enExample) | 1974-06-12 |
| FR2171404B1 (enExample) | 1977-01-07 |
| FR2171404A1 (enExample) | 1973-09-21 |
| DE2206493A1 (de) | 1973-08-23 |
| CH584661A5 (enExample) | 1977-02-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 | ||
| 8339 | Ceased/non-payment of the annual fee |