DE2149606C3 - Vorrichtung zur Beschichtung von Substraten durch Hochfrequenz-Kathodenzerstäubung - Google Patents
Vorrichtung zur Beschichtung von Substraten durch Hochfrequenz-KathodenzerstäubungInfo
- Publication number
- DE2149606C3 DE2149606C3 DE19712149606 DE2149606A DE2149606C3 DE 2149606 C3 DE2149606 C3 DE 2149606C3 DE 19712149606 DE19712149606 DE 19712149606 DE 2149606 A DE2149606 A DE 2149606A DE 2149606 C3 DE2149606 C3 DE 2149606C3
- Authority
- DE
- Germany
- Prior art keywords
- cathode
- screen
- screens
- potential
- coating substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 title claims description 6
- 238000004544 sputter deposition Methods 0.000 title claims description 4
- 239000011248 coating agent Substances 0.000 title claims description 3
- 238000000576 coating method Methods 0.000 title claims description 3
- 239000012212 insulator Substances 0.000 claims description 4
- 239000003990 capacitor Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712149606 DE2149606C3 (de) | 1971-10-05 | 1971-10-05 | Vorrichtung zur Beschichtung von Substraten durch Hochfrequenz-Kathodenzerstäubung |
| CH892472A CH567104A5 (cg-RX-API-DMAC10.html) | 1971-10-05 | 1972-06-15 | |
| FR7235186A FR2156032A1 (en) | 1971-10-05 | 1972-10-04 | Substrate cathode sputtering - with insulated intermediate screens between cathode and anode potential screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712149606 DE2149606C3 (de) | 1971-10-05 | 1971-10-05 | Vorrichtung zur Beschichtung von Substraten durch Hochfrequenz-Kathodenzerstäubung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2149606A1 DE2149606A1 (de) | 1973-04-12 |
| DE2149606B2 DE2149606B2 (de) | 1979-04-05 |
| DE2149606C3 true DE2149606C3 (de) | 1979-12-06 |
Family
ID=5821500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712149606 Expired DE2149606C3 (de) | 1971-10-05 | 1971-10-05 | Vorrichtung zur Beschichtung von Substraten durch Hochfrequenz-Kathodenzerstäubung |
Country Status (3)
| Country | Link |
|---|---|
| CH (1) | CH567104A5 (cg-RX-API-DMAC10.html) |
| DE (1) | DE2149606C3 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2156032A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4169031A (en) * | 1978-01-13 | 1979-09-25 | Polyohm, Inc. | Magnetron sputter cathode assembly |
| US4362611A (en) * | 1981-07-27 | 1982-12-07 | International Business Machines Corporation | Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield |
| US5292394A (en) * | 1991-11-13 | 1994-03-08 | Leybold Aktiengesellschaft | Apparatus for large-area ionic etching |
| DE102004029466A1 (de) * | 2004-06-18 | 2006-01-05 | Leybold Optics Gmbh | Medieninjektor |
-
1971
- 1971-10-05 DE DE19712149606 patent/DE2149606C3/de not_active Expired
-
1972
- 1972-06-15 CH CH892472A patent/CH567104A5/xx not_active IP Right Cessation
- 1972-10-04 FR FR7235186A patent/FR2156032A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2156032B1 (cg-RX-API-DMAC10.html) | 1978-03-03 |
| DE2149606A1 (de) | 1973-04-12 |
| FR2156032A1 (en) | 1973-05-25 |
| DE2149606B2 (de) | 1979-04-05 |
| CH567104A5 (cg-RX-API-DMAC10.html) | 1975-09-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| EGA | New person/name/address of the applicant | ||
| 8339 | Ceased/non-payment of the annual fee |