CH567104A5 - - Google Patents
Info
- Publication number
- CH567104A5 CH567104A5 CH892472A CH892472A CH567104A5 CH 567104 A5 CH567104 A5 CH 567104A5 CH 892472 A CH892472 A CH 892472A CH 892472 A CH892472 A CH 892472A CH 567104 A5 CH567104 A5 CH 567104A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712149606 DE2149606C3 (de) | 1971-10-05 | 1971-10-05 | Vorrichtung zur Beschichtung von Substraten durch Hochfrequenz-Kathodenzerstäubung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH567104A5 true CH567104A5 (cg-RX-API-DMAC10.html) | 1975-09-30 |
Family
ID=5821500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH892472A CH567104A5 (cg-RX-API-DMAC10.html) | 1971-10-05 | 1972-06-15 |
Country Status (3)
| Country | Link |
|---|---|
| CH (1) | CH567104A5 (cg-RX-API-DMAC10.html) |
| DE (1) | DE2149606C3 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2156032A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4169031A (en) * | 1978-01-13 | 1979-09-25 | Polyohm, Inc. | Magnetron sputter cathode assembly |
| US4362611A (en) * | 1981-07-27 | 1982-12-07 | International Business Machines Corporation | Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield |
| US5292394A (en) * | 1991-11-13 | 1994-03-08 | Leybold Aktiengesellschaft | Apparatus for large-area ionic etching |
| DE102004029466A1 (de) * | 2004-06-18 | 2006-01-05 | Leybold Optics Gmbh | Medieninjektor |
-
1971
- 1971-10-05 DE DE19712149606 patent/DE2149606C3/de not_active Expired
-
1972
- 1972-06-15 CH CH892472A patent/CH567104A5/xx not_active IP Right Cessation
- 1972-10-04 FR FR7235186A patent/FR2156032A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2156032B1 (cg-RX-API-DMAC10.html) | 1978-03-03 |
| DE2149606C3 (de) | 1979-12-06 |
| DE2149606A1 (de) | 1973-04-12 |
| FR2156032A1 (en) | 1973-05-25 |
| DE2149606B2 (de) | 1979-04-05 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |