FR2156032A1 - Substrate cathode sputtering - with insulated intermediate screens between cathode and anode potential screen - Google Patents

Substrate cathode sputtering - with insulated intermediate screens between cathode and anode potential screen

Info

Publication number
FR2156032A1
FR2156032A1 FR7235186A FR7235186A FR2156032A1 FR 2156032 A1 FR2156032 A1 FR 2156032A1 FR 7235186 A FR7235186 A FR 7235186A FR 7235186 A FR7235186 A FR 7235186A FR 2156032 A1 FR2156032 A1 FR 2156032A1
Authority
FR
France
Prior art keywords
cathode
anode potential
screen
intermediate screens
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7235186A
Other languages
English (en)
French (fr)
Other versions
FR2156032B1 (cg-RX-API-DMAC10.html
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leybold Heraeus Verwaltung GmbH
Original Assignee
Leybold Heraeus Verwaltung GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Verwaltung GmbH filed Critical Leybold Heraeus Verwaltung GmbH
Publication of FR2156032A1 publication Critical patent/FR2156032A1/fr
Application granted granted Critical
Publication of FR2156032B1 publication Critical patent/FR2156032B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
FR7235186A 1971-10-05 1972-10-04 Substrate cathode sputtering - with insulated intermediate screens between cathode and anode potential screen Granted FR2156032A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712149606 DE2149606C3 (de) 1971-10-05 1971-10-05 Vorrichtung zur Beschichtung von Substraten durch Hochfrequenz-Kathodenzerstäubung

Publications (2)

Publication Number Publication Date
FR2156032A1 true FR2156032A1 (en) 1973-05-25
FR2156032B1 FR2156032B1 (cg-RX-API-DMAC10.html) 1978-03-03

Family

ID=5821500

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7235186A Granted FR2156032A1 (en) 1971-10-05 1972-10-04 Substrate cathode sputtering - with insulated intermediate screens between cathode and anode potential screen

Country Status (3)

Country Link
CH (1) CH567104A5 (cg-RX-API-DMAC10.html)
DE (1) DE2149606C3 (cg-RX-API-DMAC10.html)
FR (1) FR2156032A1 (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0070982A3 (en) * 1981-07-27 1983-11-30 International Business Machines Corporation Sputtering system

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169031A (en) * 1978-01-13 1979-09-25 Polyohm, Inc. Magnetron sputter cathode assembly
US5292394A (en) * 1991-11-13 1994-03-08 Leybold Aktiengesellschaft Apparatus for large-area ionic etching
DE102004029466A1 (de) * 2004-06-18 2006-01-05 Leybold Optics Gmbh Medieninjektor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0070982A3 (en) * 1981-07-27 1983-11-30 International Business Machines Corporation Sputtering system

Also Published As

Publication number Publication date
FR2156032B1 (cg-RX-API-DMAC10.html) 1978-03-03
DE2149606C3 (de) 1979-12-06
DE2149606A1 (de) 1973-04-12
DE2149606B2 (de) 1979-04-05
CH567104A5 (cg-RX-API-DMAC10.html) 1975-09-30

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Legal Events

Date Code Title Description
ST Notification of lapse