DE2133230A1 - Verfahren zur Herstellung von Druckelementen unter Verwendung eines chemischen Photowiderstandsaetzsystems - Google Patents
Verfahren zur Herstellung von Druckelementen unter Verwendung eines chemischen PhotowiderstandsaetzsystemsInfo
- Publication number
- DE2133230A1 DE2133230A1 DE19712133230 DE2133230A DE2133230A1 DE 2133230 A1 DE2133230 A1 DE 2133230A1 DE 19712133230 DE19712133230 DE 19712133230 DE 2133230 A DE2133230 A DE 2133230A DE 2133230 A1 DE2133230 A1 DE 2133230A1
- Authority
- DE
- Germany
- Prior art keywords
- etching
- pattern
- layer
- exposed
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title description 3
- 229920002120 photoresistant polymer Polymers 0.000 title description 2
- 238000003486 chemical etching Methods 0.000 title 1
- 229910000831 Steel Inorganic materials 0.000 claims description 56
- 239000010959 steel Substances 0.000 claims description 56
- 238000005530 etching Methods 0.000 claims description 42
- 239000000463 material Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 5
- 239000008096 xylene Substances 0.000 claims description 5
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 3
- 239000012670 alkaline solution Substances 0.000 claims description 3
- 239000003518 caustics Substances 0.000 claims description 3
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 239000003929 acidic solution Substances 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 229920001195 polyisoprene Polymers 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000003153 chemical reaction reagent Substances 0.000 claims 1
- -1 ferrous chlorides Chemical class 0.000 claims 1
- 239000000243 solution Substances 0.000 description 24
- 239000010410 layer Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000005201 scrubbing Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 238000007605 air drying Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000003306 harvesting Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000000575 pesticide Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 101150093961 ANP32A gene Proteins 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- GHXZTYHSJHQHIJ-UHFFFAOYSA-N Chlorhexidine Chemical compound C=1C=C(Cl)C=CC=1NC(N)=NC(N)=NCCCCCCN=C(N)N=C(N)NC1=CC=C(Cl)C=C1 GHXZTYHSJHQHIJ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 240000007817 Olea europaea Species 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012445 acidic reagent Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229910001447 ferric ion Inorganic materials 0.000 description 1
- 229910001448 ferrous ion Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5315170A | 1970-07-08 | 1970-07-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2133230A1 true DE2133230A1 (de) | 1972-01-13 |
Family
ID=21982268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712133230 Pending DE2133230A1 (de) | 1970-07-08 | 1971-07-03 | Verfahren zur Herstellung von Druckelementen unter Verwendung eines chemischen Photowiderstandsaetzsystems |
Country Status (8)
| Country | Link |
|---|---|
| BE (1) | BE769537A (enrdf_load_stackoverflow) |
| CA (1) | CA947562A (enrdf_load_stackoverflow) |
| CH (1) | CH550672A (enrdf_load_stackoverflow) |
| DE (1) | DE2133230A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2100332A5 (enrdf_load_stackoverflow) |
| GB (1) | GB1283898A (enrdf_load_stackoverflow) |
| IT (1) | IT943517B (enrdf_load_stackoverflow) |
| ZA (1) | ZA714171B (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2875872A1 (de) * | 2013-11-25 | 2015-05-27 | AKK GmbH | Schablone für ätztechnische Oberflächenstrukturierungen |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4123272A (en) * | 1977-05-17 | 1978-10-31 | E. I. Du Pont De Nemours And Company | Double-negative positive-working photohardenable elements |
| GB2192254B (en) * | 1986-07-02 | 1990-03-21 | Nippon Tenshashi Kk | Metal roller |
| CN112430814B (zh) * | 2020-12-14 | 2023-02-17 | 浙江一益医疗器械有限公司 | 一种针管蚀刻方法 |
-
1971
- 1971-03-30 CA CA109,145A patent/CA947562A/en not_active Expired
- 1971-06-22 GB GB29168/71A patent/GB1283898A/en not_active Expired
- 1971-06-25 ZA ZA714171A patent/ZA714171B/xx unknown
- 1971-07-03 DE DE19712133230 patent/DE2133230A1/de active Pending
- 1971-07-05 BE BE769537A patent/BE769537A/xx unknown
- 1971-07-06 IT IT7277/71A patent/IT943517B/it active
- 1971-07-07 FR FR7124769A patent/FR2100332A5/fr not_active Expired
- 1971-07-08 CH CH1007471A patent/CH550672A/xx not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2875872A1 (de) * | 2013-11-25 | 2015-05-27 | AKK GmbH | Schablone für ätztechnische Oberflächenstrukturierungen |
| WO2015075231A1 (de) * | 2013-11-25 | 2015-05-28 | Akk Gmbh | Schablone für ätztechnische oberflächenstrukturierungen |
| US9962925B2 (en) | 2013-11-25 | 2018-05-08 | Akk Gmbh | Stencil for forming surface structures by etching |
Also Published As
| Publication number | Publication date |
|---|---|
| CA947562A (en) | 1974-05-21 |
| GB1283898A (en) | 1972-08-02 |
| CH550672A (de) | 1974-06-28 |
| BE769537A (fr) | 1971-11-16 |
| ZA714171B (en) | 1972-03-29 |
| FR2100332A5 (enrdf_load_stackoverflow) | 1972-03-17 |
| IT943517B (it) | 1973-04-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |