DE2063638A1 - Verfahren zum Herstellen zweier zu sammenpassender Photomasken - Google Patents
Verfahren zum Herstellen zweier zu sammenpassender PhotomaskenInfo
- Publication number
- DE2063638A1 DE2063638A1 DE19702063638 DE2063638A DE2063638A1 DE 2063638 A1 DE2063638 A1 DE 2063638A1 DE 19702063638 DE19702063638 DE 19702063638 DE 2063638 A DE2063638 A DE 2063638A DE 2063638 A1 DE2063638 A1 DE 2063638A1
- Authority
- DE
- Germany
- Prior art keywords
- mask
- surface elements
- exposure
- arrangement
- photo mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 38
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000000839 emulsion Substances 0.000 claims description 10
- 238000002508 contact lithography Methods 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 4
- 230000013011 mating Effects 0.000 claims description 3
- 238000000149 argon plasma sintering Methods 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000003860 storage Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000005549 size reduction Methods 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920002972 Acrylic fiber Polymers 0.000 description 1
- 241000251730 Chondrichthyes Species 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/233—Manufacture of photoelectric screens or charge-storage screens
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US88824969A | 1969-12-29 | 1969-12-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2063638A1 true DE2063638A1 (de) | 1971-07-01 |
Family
ID=25392847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19702063638 Pending DE2063638A1 (de) | 1969-12-29 | 1970-12-23 | Verfahren zum Herstellen zweier zu sammenpassender Photomasken |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3647438A (enExample) |
| JP (1) | JPS4921471B1 (enExample) |
| CA (1) | CA936036A (enExample) |
| DE (1) | DE2063638A1 (enExample) |
| FR (1) | FR2075107A5 (enExample) |
| GB (1) | GB1307010A (enExample) |
| NL (1) | NL7018861A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4211834A (en) * | 1977-12-30 | 1980-07-08 | International Business Machines Corporation | Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3477848A (en) * | 1964-12-14 | 1969-11-11 | Texas Instruments Inc | Method for producing sets of photomask having accurate registration |
| US3403284A (en) * | 1966-12-29 | 1968-09-24 | Bell Telephone Labor Inc | Target structure storage device using diode array |
-
1969
- 1969-12-29 US US888249A patent/US3647438A/en not_active Expired - Lifetime
-
1970
- 1970-11-13 CA CA098161A patent/CA936036A/en not_active Expired
- 1970-12-09 JP JP11001470A patent/JPS4921471B1/ja active Pending
- 1970-12-23 DE DE19702063638 patent/DE2063638A1/de active Pending
- 1970-12-28 NL NL7018861A patent/NL7018861A/xx unknown
- 1970-12-29 FR FR7046959A patent/FR2075107A5/fr not_active Expired
- 1970-12-29 GB GB6166970A patent/GB1307010A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4921471B1 (enExample) | 1974-06-01 |
| NL7018861A (enExample) | 1971-07-01 |
| FR2075107A5 (enExample) | 1971-10-08 |
| GB1307010A (en) | 1973-02-14 |
| US3647438A (en) | 1972-03-07 |
| CA936036A (en) | 1973-10-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69325287T2 (de) | Verfahren zur herstellung von mikrolinsen | |
| DE19609652B4 (de) | Verfahren und Vorrichtung zur Korrektur von Maskenmustern | |
| DE60030820T2 (de) | Methode und System zur Korrektur von optischen Naheffekten (OPC) | |
| DE69530578T2 (de) | Masken zur herstellung lithographischer muster unter verwendung von schiefer beleuchtung | |
| DE69020484T2 (de) | Vorrichtung und Verfahren zur Beschreibung von fotolithografischen Systemen. | |
| DE69123610T2 (de) | Belichtungsverfahren | |
| DE112006002656B4 (de) | Größerer Prozesstoleranzbereich unter Verwendung diskreter Hilfsstrukturelemente | |
| DE2703160C3 (de) | Verfahren zum Herstellen eines Masters für ein Phasengitter in einem mit Beugung arbeitenden subtraktiven Farbfiltersystem | |
| DE68922759T2 (de) | Verfahren zur Herstellung einer Festkörper-Bildaufnahmeeinrichtung. | |
| DE112005000736B4 (de) | System und Verfahren zur Herstellung von Kontaktlöchern | |
| DE2657246B1 (de) | Original eines Informationstraegers,Verfahren zum Herstellen des Originals,Verfahren zum Herstellen einer Matrize zum Praegen des Orginals sowie Informationstraeger,der mit der Matrize hergestellt ist | |
| DE4420409B4 (de) | Photomaske mit Mustern zur Verringerung der erforderlichen Lichtleistung eines Steppers | |
| DE60118308T2 (de) | Methode zur Korrektur optischer Naheffekte | |
| DE10310137A1 (de) | Satz von wenigstens zwei Masken zur Projektion von jeweils auf den Masken gebildeten und aufeinander abgestimmten Strukturmustern und Verfahren zur Herstellung der Masken | |
| DE2063638A1 (de) | Verfahren zum Herstellen zweier zu sammenpassender Photomasken | |
| DE112005000963T5 (de) | Vorrichtung und Verfahren zum Bestimmen eines Beleuchtungsintensitätsprofils einer Beleuchtungseinrichtung für ein Lithographiesystem | |
| DE1166935B (de) | Verfahren zum Erzeugen von Masken auf Halbleiterkoerpern | |
| EP0000570B1 (de) | Original eines optischen Informationsträgers und Verfahren zum Herstellen des Originals | |
| DE2002605A1 (de) | Verfahren zur Herstellung einer abgestuften Schablone | |
| DE2734580B1 (de) | Verfahren zum Herstellen eines Originals eines Informationstraegers | |
| DE2122617C3 (enExample) | ||
| DE69703380T2 (de) | Verfahren zur überwachung eines photolithographischen prozesses | |
| DE1772721A1 (de) | Fotographisches Abbildungsverfahren unter Verwendung einer Blitzlichtquelle | |
| DE2125091C3 (de) | Verfahren zum Herstellen von zusammenpassenden Photokopierschablonen | |
| DE2419947A1 (de) | Verfahren zur herstellung einer defektfreien belichtungsmaske |