CA936036A - Method of making high area-density array photomasks having matching registry - Google Patents

Method of making high area-density array photomasks having matching registry

Info

Publication number
CA936036A
CA936036A CA098161A CA98161A CA936036A CA 936036 A CA936036 A CA 936036A CA 098161 A CA098161 A CA 098161A CA 98161 A CA98161 A CA 98161A CA 936036 A CA936036 A CA 936036A
Authority
CA
Canada
Prior art keywords
photomasks
making high
density array
high area
matching registry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA098161A
Other languages
English (en)
Other versions
CA98161S (en
Inventor
P. Heiman Frederic
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Application granted granted Critical
Publication of CA936036A publication Critical patent/CA936036A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/233—Manufacture of photoelectric screens or charge-storage screens

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CA098161A 1969-12-29 1970-11-13 Method of making high area-density array photomasks having matching registry Expired CA936036A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88824969A 1969-12-29 1969-12-29

Publications (1)

Publication Number Publication Date
CA936036A true CA936036A (en) 1973-10-30

Family

ID=25392847

Family Applications (1)

Application Number Title Priority Date Filing Date
CA098161A Expired CA936036A (en) 1969-12-29 1970-11-13 Method of making high area-density array photomasks having matching registry

Country Status (7)

Country Link
US (1) US3647438A (enExample)
JP (1) JPS4921471B1 (enExample)
CA (1) CA936036A (enExample)
DE (1) DE2063638A1 (enExample)
FR (1) FR2075107A5 (enExample)
GB (1) GB1307010A (enExample)
NL (1) NL7018861A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3477848A (en) * 1964-12-14 1969-11-11 Texas Instruments Inc Method for producing sets of photomask having accurate registration
US3403284A (en) * 1966-12-29 1968-09-24 Bell Telephone Labor Inc Target structure storage device using diode array

Also Published As

Publication number Publication date
JPS4921471B1 (enExample) 1974-06-01
DE2063638A1 (de) 1971-07-01
NL7018861A (enExample) 1971-07-01
FR2075107A5 (enExample) 1971-10-08
GB1307010A (en) 1973-02-14
US3647438A (en) 1972-03-07

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