NL7018861A - - Google Patents

Info

Publication number
NL7018861A
NL7018861A NL7018861A NL7018861A NL7018861A NL 7018861 A NL7018861 A NL 7018861A NL 7018861 A NL7018861 A NL 7018861A NL 7018861 A NL7018861 A NL 7018861A NL 7018861 A NL7018861 A NL 7018861A
Authority
NL
Netherlands
Application number
NL7018861A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7018861A publication Critical patent/NL7018861A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/233Manufacture of photoelectric screens or charge-storage screens

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL7018861A 1969-12-29 1970-12-28 NL7018861A (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88824969A 1969-12-29 1969-12-29

Publications (1)

Publication Number Publication Date
NL7018861A true NL7018861A (enExample) 1971-07-01

Family

ID=25392847

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7018861A NL7018861A (enExample) 1969-12-29 1970-12-28

Country Status (7)

Country Link
US (1) US3647438A (enExample)
JP (1) JPS4921471B1 (enExample)
CA (1) CA936036A (enExample)
DE (1) DE2063638A1 (enExample)
FR (1) FR2075107A5 (enExample)
GB (1) GB1307010A (enExample)
NL (1) NL7018861A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3477848A (en) * 1964-12-14 1969-11-11 Texas Instruments Inc Method for producing sets of photomask having accurate registration
US3403284A (en) * 1966-12-29 1968-09-24 Bell Telephone Labor Inc Target structure storage device using diode array

Also Published As

Publication number Publication date
JPS4921471B1 (enExample) 1974-06-01
DE2063638A1 (de) 1971-07-01
FR2075107A5 (enExample) 1971-10-08
GB1307010A (en) 1973-02-14
US3647438A (en) 1972-03-07
CA936036A (en) 1973-10-30

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