DE2027156C3 - Verfahren zum anodischen Polieren von Niobteilen - Google Patents
Verfahren zum anodischen Polieren von NiobteilenInfo
- Publication number
- DE2027156C3 DE2027156C3 DE2027156A DE2027156A DE2027156C3 DE 2027156 C3 DE2027156 C3 DE 2027156C3 DE 2027156 A DE2027156 A DE 2027156A DE 2027156 A DE2027156 A DE 2027156A DE 2027156 C3 DE2027156 C3 DE 2027156C3
- Authority
- DE
- Germany
- Prior art keywords
- voltage
- switched
- current
- niobium
- percent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical group [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 27
- 238000005498 polishing Methods 0.000 title claims description 21
- 230000008569 process Effects 0.000 title claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 31
- 230000010355 oscillation Effects 0.000 claims description 30
- 229910052758 niobium Inorganic materials 0.000 claims description 24
- 239000010955 niobium Substances 0.000 claims description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 10
- 230000003746 surface roughness Effects 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 2
- 108090000623 proteins and genes Proteins 0.000 claims description 2
- 239000002344 surface layer Substances 0.000 claims 4
- 238000010521 absorption reaction Methods 0.000 claims 2
- 239000010410 layer Substances 0.000 claims 2
- 238000003754 machining Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 235000019592 roughness Nutrition 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2027156A DE2027156C3 (de) | 1970-06-03 | 1970-06-03 | Verfahren zum anodischen Polieren von Niobteilen |
| CH552971A CH523330A (de) | 1970-06-03 | 1971-04-16 | Verfahren zum elektrolytischen Polieren von Niobteilen |
| NL7106908.A NL166988C (nl) | 1970-06-03 | 1971-05-19 | Werkwijze voor het elektrolytisch polijsten van niobiumonderdelen. |
| AT453771A AT300492B (de) | 1970-06-03 | 1971-05-26 | Verfahren zum elektrolytischen Polieren von Niobteilen |
| GB08117/71A GB1298419A (en) | 1970-06-03 | 1971-05-28 | Improvements in or relating to electrolytic polishing |
| SE07101/71A SE360114B (enExample) | 1970-06-03 | 1971-06-02 | |
| FR7120020A FR2094011B1 (enExample) | 1970-06-03 | 1971-06-02 | |
| US149248A US3689388A (en) | 1970-06-03 | 1971-06-02 | Electrolytic polishing of niobium parts |
| JP3901771A JPS5438052B1 (enExample) | 1970-06-03 | 1971-06-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2027156A DE2027156C3 (de) | 1970-06-03 | 1970-06-03 | Verfahren zum anodischen Polieren von Niobteilen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2027156A1 DE2027156A1 (de) | 1971-12-09 |
| DE2027156B2 DE2027156B2 (de) | 1974-09-19 |
| DE2027156C3 true DE2027156C3 (de) | 1975-05-22 |
Family
ID=5772868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2027156A Expired DE2027156C3 (de) | 1970-06-03 | 1970-06-03 | Verfahren zum anodischen Polieren von Niobteilen |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3689388A (enExample) |
| JP (1) | JPS5438052B1 (enExample) |
| AT (1) | AT300492B (enExample) |
| CH (1) | CH523330A (enExample) |
| DE (1) | DE2027156C3 (enExample) |
| FR (1) | FR2094011B1 (enExample) |
| GB (1) | GB1298419A (enExample) |
| NL (1) | NL166988C (enExample) |
| SE (1) | SE360114B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH567581A5 (enExample) * | 1971-09-18 | 1975-10-15 | Siemens Ag | |
| US3755738A (en) * | 1972-05-01 | 1973-08-28 | Bell Telephone Labor Inc | Passband equalizer for phase-modulated data signals |
| NL7401984A (enExample) * | 1973-03-15 | 1974-09-17 | ||
| US3898141A (en) * | 1974-02-08 | 1975-08-05 | Bell Telephone Labor Inc | Electrolytic oxidation and etching of III-V compound semiconductors |
| DE2609549C3 (de) * | 1976-03-08 | 1979-04-12 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum anodischen Polieren von Oberflächen aus intermetallischen Niobverbindungen und Nioblegierungen |
| GB1539309A (en) * | 1976-12-14 | 1979-01-31 | Inoue Japax Res | Electrochemical polishing |
| DE2742123C3 (de) * | 1977-09-19 | 1981-10-01 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum anodischen Polieren von metallischen Oberflächenteilen |
| DE2743715A1 (de) * | 1977-09-29 | 1979-04-12 | Hoechst Ag | Verfahren zum elektropolieren |
| DE10259934B3 (de) * | 2002-12-20 | 2004-10-14 | H.C. Starck Gmbh | Verfahren zur Herstellung von Formteilen aus Niob oder Tantal durch elektrochemisches Ätzen und so erhältliche Formteile |
| US20100213078A1 (en) * | 2009-02-25 | 2010-08-26 | Ryszard Rokicki | Electrolyte composition for electropolishing niobium and tantalum and method for using same |
| US20110017608A1 (en) * | 2009-07-27 | 2011-01-27 | Faraday Technology, Inc. | Electrochemical etching and polishing of conductive substrates |
| US9006147B2 (en) * | 2012-07-11 | 2015-04-14 | Faraday Technology, Inc. | Electrochemical system and method for electropolishing superconductive radio frequency cavities |
| CN115386880B (zh) * | 2022-09-02 | 2024-03-15 | 中国第一汽车股份有限公司 | 一种用于钢制品表面剥层的处理液及其制备方法和应用 |
-
1970
- 1970-06-03 DE DE2027156A patent/DE2027156C3/de not_active Expired
-
1971
- 1971-04-16 CH CH552971A patent/CH523330A/de not_active IP Right Cessation
- 1971-05-19 NL NL7106908.A patent/NL166988C/xx not_active IP Right Cessation
- 1971-05-26 AT AT453771A patent/AT300492B/de not_active IP Right Cessation
- 1971-05-28 GB GB08117/71A patent/GB1298419A/en not_active Expired
- 1971-06-02 US US149248A patent/US3689388A/en not_active Expired - Lifetime
- 1971-06-02 SE SE07101/71A patent/SE360114B/xx unknown
- 1971-06-02 FR FR7120020A patent/FR2094011B1/fr not_active Expired
- 1971-06-03 JP JP3901771A patent/JPS5438052B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5438052B1 (enExample) | 1979-11-19 |
| NL166988C (nl) | 1981-10-15 |
| US3689388A (en) | 1972-09-05 |
| AT300492B (de) | 1972-07-25 |
| NL166988B (nl) | 1981-05-15 |
| SE360114B (enExample) | 1973-09-17 |
| NL7106908A (enExample) | 1971-12-07 |
| FR2094011B1 (enExample) | 1976-10-29 |
| FR2094011A1 (enExample) | 1972-02-04 |
| DE2027156B2 (de) | 1974-09-19 |
| CH523330A (de) | 1972-05-31 |
| GB1298419A (en) | 1972-12-06 |
| DE2027156A1 (de) | 1971-12-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 | ||
| 8320 | Willingness to grant licences declared (paragraph 23) | ||
| 8339 | Ceased/non-payment of the annual fee |