DE2013670B2 - Verfahren zum elektrolytischen abscheiden duenner metallschichten - Google Patents

Verfahren zum elektrolytischen abscheiden duenner metallschichten

Info

Publication number
DE2013670B2
DE2013670B2 DE19702013670 DE2013670A DE2013670B2 DE 2013670 B2 DE2013670 B2 DE 2013670B2 DE 19702013670 DE19702013670 DE 19702013670 DE 2013670 A DE2013670 A DE 2013670A DE 2013670 B2 DE2013670 B2 DE 2013670B2
Authority
DE
Germany
Prior art keywords
capacitor
resistor
deposition
transistor
switch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19702013670
Other languages
German (de)
English (en)
Other versions
DE2013670A1 (de
Inventor
Herman Edwin Trotwood Ohio Austen (VStA)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Cash Register Co
Original Assignee
National Cash Register Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Cash Register Co filed Critical National Cash Register Co
Publication of DE2013670A1 publication Critical patent/DE2013670A1/de
Publication of DE2013670B2 publication Critical patent/DE2013670B2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18Electroplating using modulated, pulsed or reversing current
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/24Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
    • H01F41/26Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00Chemistry: electrical and wave energy
    • Y10S204/09Wave forms

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
DE19702013670 1969-03-24 1970-03-21 Verfahren zum elektrolytischen abscheiden duenner metallschichten Withdrawn DE2013670B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80982469A 1969-03-24 1969-03-24

Publications (2)

Publication Number Publication Date
DE2013670A1 DE2013670A1 (de) 1970-10-08
DE2013670B2 true DE2013670B2 (de) 1971-07-08

Family

ID=25202303

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702013670 Withdrawn DE2013670B2 (de) 1969-03-24 1970-03-21 Verfahren zum elektrolytischen abscheiden duenner metallschichten

Country Status (6)

Country Link
US (1) US3525677A (enExample)
BE (1) BE747852A (enExample)
CH (1) CH519584A (enExample)
DE (1) DE2013670B2 (enExample)
FR (1) FR2035833B1 (enExample)
GB (1) GB1238629A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AR206638A1 (es) * 1975-03-03 1976-08-06 Oxi Metal Ind Corp Articulo compuesto electrochapado con niquel-hierro y procedimiento electrochapado para formar dicho articulo
US4490230A (en) * 1983-03-10 1984-12-25 At&T Technologies, Inc. Electroplating apparatus
EP1724823A3 (fr) * 2005-05-11 2009-09-09 Stmicroelectronics Sa Procédé de connexion d'une microplaquette de semi-conducteur sur un support d'interconnexion

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1188409B (de) * 1961-09-29 1965-03-04 Siemens Ag Verfahren zum elektrolytischen Abscheiden von Legierungsschichten homogener Zusammensetzung
US3141837A (en) * 1961-11-28 1964-07-21 Rca Corp Method for electrodepositing nickel-iron alloys
US3198716A (en) * 1961-12-21 1965-08-03 Gen Electric Magnetic material and method of preparing the same
FR1397417A (fr) * 1964-03-09 1965-04-30 Ibm France Nouveaux perfectionnements aux procédés de dépôt d'une couche magnétique par voie électrolytique

Also Published As

Publication number Publication date
GB1238629A (enExample) 1971-07-07
FR2035833A1 (enExample) 1970-12-24
US3525677A (en) 1970-08-25
BE747852A (fr) 1970-08-31
CH519584A (de) 1972-02-29
DE2013670A1 (de) 1970-10-08
FR2035833B1 (enExample) 1974-05-24

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Legal Events

Date Code Title Description
E77 Valid patent as to the heymanns-index 1977
EHJ Ceased/non-payment of the annual fee