DE2001790A1 - Einrichtung und Verfahren zum gesteuerten AEtzen ohne AEtzmittelabdecker - Google Patents

Einrichtung und Verfahren zum gesteuerten AEtzen ohne AEtzmittelabdecker

Info

Publication number
DE2001790A1
DE2001790A1 DE19702001790 DE2001790A DE2001790A1 DE 2001790 A1 DE2001790 A1 DE 2001790A1 DE 19702001790 DE19702001790 DE 19702001790 DE 2001790 A DE2001790 A DE 2001790A DE 2001790 A1 DE2001790 A1 DE 2001790A1
Authority
DE
Germany
Prior art keywords
mask
etching
nozzles
station
predetermined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19702001790
Other languages
German (de)
English (en)
Inventor
Frantzen John J
Lund Charles M
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buckbee Mears Co
Original Assignee
Buckbee Mears Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Buckbee Mears Co filed Critical Buckbee Mears Co
Publication of DE2001790A1 publication Critical patent/DE2001790A1/de
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/08Apparatus, e.g. for photomechanical printing surfaces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00Apparatus and processes for manufacture of discharge tubes
    • H01J2209/01Generalised techniques
    • H01J2209/012Coating
    • H01J2209/015Machines therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • ing And Chemical Polishing (AREA)
DE19702001790 1969-07-14 1970-01-16 Einrichtung und Verfahren zum gesteuerten AEtzen ohne AEtzmittelabdecker Ceased DE2001790A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84131769A 1969-07-14 1969-07-14

Publications (1)

Publication Number Publication Date
DE2001790A1 true DE2001790A1 (de) 1971-02-18

Family

ID=25284565

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702001790 Ceased DE2001790A1 (de) 1969-07-14 1970-01-16 Einrichtung und Verfahren zum gesteuerten AEtzen ohne AEtzmittelabdecker

Country Status (7)

Country Link
US (1) US3756898A (enrdf_load_stackoverflow)
JP (1) JPS4928816B1 (enrdf_load_stackoverflow)
BE (1) BE743693A (enrdf_load_stackoverflow)
DE (1) DE2001790A1 (enrdf_load_stackoverflow)
FR (1) FR2056146A5 (enrdf_load_stackoverflow)
GB (1) GB1246252A (enrdf_load_stackoverflow)
NL (1) NL7010350A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985002629A1 (en) * 1983-12-14 1985-06-20 Hoellmueller Hans Plant for the treating of objects by means of a liquid
WO1985002630A1 (en) * 1983-12-14 1985-06-20 Hoellmueller Hans Plant for the treatment of objects by means of a liquid
EP0599039A1 (en) * 1992-11-09 1994-06-01 Bmc Industries, Inc. Etch control system
US5378308A (en) * 1992-11-09 1995-01-03 Bmc Industries, Inc. Etchant distribution apparatus
EP0611483A4 (en) * 1991-11-07 1995-05-03 Chemcut Corp METHOD AND ARRANGEMENT FOR CONTROLLED SPRAYING.

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136911U (enrdf_load_stackoverflow) * 1974-04-24 1975-11-11
GB2102786B (en) * 1981-07-10 1985-01-09 Glaverbel Method of modifying the light-reflecting properties of glass
JPS6014244A (ja) * 1983-07-06 1985-01-24 Fujitsu Ltd マスク洗浄装置
DE3422745A1 (de) 1984-06-19 1985-12-19 Achthal-Maschinenbau-GmbH, 8221 Markt-Teisendorf Verfahren und vorrichtung zum saeurepolieren von gegenstaenden aus glas
GB8527578D0 (en) * 1985-11-08 1985-12-11 Finishing Services Ltd Etching machines
US4650542A (en) * 1985-12-10 1987-03-17 Chemcut Corporation Process and apparatus for chemically treating articles in a contained chamber, with sealed-door access to the chamber
US4880489A (en) * 1986-08-26 1989-11-14 Voest-Alpine Aktiengesellschaft Apparatus for plasma etching circuit boards or the like
JP2598305B2 (ja) * 1988-06-06 1997-04-09 日東電工株式会社 半導体ウエハの処理システム
US6197209B1 (en) 1995-10-27 2001-03-06 Lg. Philips Lcd Co., Ltd. Method of fabricating a substrate
KR0180850B1 (ko) 1996-06-26 1999-03-20 구자홍 유리기판 에칭장치
US6630052B1 (en) 1996-06-26 2003-10-07 Lg. Philips Lcd Co., Ltd. Apparatus for etching glass substrate
KR100265556B1 (ko) 1997-03-21 2000-11-01 구본준 식각장치
JP3692380B2 (ja) 1998-07-03 2005-09-07 Azエレクトロニックマテリアルズ株式会社 容器の洗浄方法および装置
US6327011B2 (en) 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
KR100272513B1 (ko) 1998-09-08 2001-01-15 구본준 유리기판의 식각장치
KR100308157B1 (ko) 1998-10-22 2001-11-15 구본준, 론 위라하디락사 액정표시소자용 유리기판
DE19860179A1 (de) * 1998-12-24 2000-06-29 Audi Ag Verfahren zur Erzeugung einer strukturierten Maskierung
DE10154885A1 (de) * 2001-11-05 2003-05-15 Schmid Gmbh & Co Geb Verfahren zur Behandlung von Gegenständen mittels einer Flüssigkeit

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985002629A1 (en) * 1983-12-14 1985-06-20 Hoellmueller Hans Plant for the treating of objects by means of a liquid
WO1985002630A1 (en) * 1983-12-14 1985-06-20 Hoellmueller Hans Plant for the treatment of objects by means of a liquid
EP0611483A4 (en) * 1991-11-07 1995-05-03 Chemcut Corp METHOD AND ARRANGEMENT FOR CONTROLLED SPRAYING.
EP0599039A1 (en) * 1992-11-09 1994-06-01 Bmc Industries, Inc. Etch control system
US5378308A (en) * 1992-11-09 1995-01-03 Bmc Industries, Inc. Etchant distribution apparatus

Also Published As

Publication number Publication date
BE743693A (enrdf_load_stackoverflow) 1970-05-28
NL7010350A (enrdf_load_stackoverflow) 1971-01-18
FR2056146A5 (enrdf_load_stackoverflow) 1971-05-14
US3756898A (en) 1973-09-04
JPS4928816B1 (enrdf_load_stackoverflow) 1974-07-30
GB1246252A (en) 1971-09-15

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Legal Events

Date Code Title Description
8131 Rejection