DE2001790A1 - Einrichtung und Verfahren zum gesteuerten AEtzen ohne AEtzmittelabdecker - Google Patents
Einrichtung und Verfahren zum gesteuerten AEtzen ohne AEtzmittelabdeckerInfo
- Publication number
- DE2001790A1 DE2001790A1 DE19702001790 DE2001790A DE2001790A1 DE 2001790 A1 DE2001790 A1 DE 2001790A1 DE 19702001790 DE19702001790 DE 19702001790 DE 2001790 A DE2001790 A DE 2001790A DE 2001790 A1 DE2001790 A1 DE 2001790A1
- Authority
- DE
- Germany
- Prior art keywords
- mask
- etching
- nozzles
- station
- predetermined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005530 etching Methods 0.000 title claims description 81
- 238000000034 method Methods 0.000 title claims description 18
- 239000007788 liquid Substances 0.000 claims description 35
- 238000004140 cleaning Methods 0.000 claims description 15
- 239000007921 spray Substances 0.000 claims description 14
- 239000003518 caustics Substances 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 7
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 3
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000005554 pickling Methods 0.000 description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- 239000010960 cold rolled steel Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000003223 protective agent Substances 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 101100335424 Drosophila melanogaster frtz gene Proteins 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910000398 iron phosphate Inorganic materials 0.000 description 1
- WBJZTOZJJYAKHQ-UHFFFAOYSA-K iron(3+) phosphate Chemical compound [Fe+3].[O-]P([O-])([O-])=O WBJZTOZJJYAKHQ-UHFFFAOYSA-K 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/012—Coating
- H01J2209/015—Machines therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US84131769A | 1969-07-14 | 1969-07-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE2001790A1 true DE2001790A1 (de) | 1971-02-18 |
Family
ID=25284565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19702001790 Ceased DE2001790A1 (de) | 1969-07-14 | 1970-01-16 | Einrichtung und Verfahren zum gesteuerten AEtzen ohne AEtzmittelabdecker |
Country Status (7)
Country | Link |
---|---|
US (1) | US3756898A (enrdf_load_stackoverflow) |
JP (1) | JPS4928816B1 (enrdf_load_stackoverflow) |
BE (1) | BE743693A (enrdf_load_stackoverflow) |
DE (1) | DE2001790A1 (enrdf_load_stackoverflow) |
FR (1) | FR2056146A5 (enrdf_load_stackoverflow) |
GB (1) | GB1246252A (enrdf_load_stackoverflow) |
NL (1) | NL7010350A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1985002629A1 (en) * | 1983-12-14 | 1985-06-20 | Hoellmueller Hans | Plant for the treating of objects by means of a liquid |
WO1985002630A1 (en) * | 1983-12-14 | 1985-06-20 | Hoellmueller Hans | Plant for the treatment of objects by means of a liquid |
EP0599039A1 (en) * | 1992-11-09 | 1994-06-01 | Bmc Industries, Inc. | Etch control system |
US5378308A (en) * | 1992-11-09 | 1995-01-03 | Bmc Industries, Inc. | Etchant distribution apparatus |
EP0611483A4 (en) * | 1991-11-07 | 1995-05-03 | Chemcut Corp | METHOD AND ARRANGEMENT FOR CONTROLLED SPRAYING. |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50136911U (enrdf_load_stackoverflow) * | 1974-04-24 | 1975-11-11 | ||
GB2102786B (en) * | 1981-07-10 | 1985-01-09 | Glaverbel | Method of modifying the light-reflecting properties of glass |
JPS6014244A (ja) * | 1983-07-06 | 1985-01-24 | Fujitsu Ltd | マスク洗浄装置 |
DE3422745A1 (de) | 1984-06-19 | 1985-12-19 | Achthal-Maschinenbau-GmbH, 8221 Markt-Teisendorf | Verfahren und vorrichtung zum saeurepolieren von gegenstaenden aus glas |
GB8527578D0 (en) * | 1985-11-08 | 1985-12-11 | Finishing Services Ltd | Etching machines |
US4650542A (en) * | 1985-12-10 | 1987-03-17 | Chemcut Corporation | Process and apparatus for chemically treating articles in a contained chamber, with sealed-door access to the chamber |
US4880489A (en) * | 1986-08-26 | 1989-11-14 | Voest-Alpine Aktiengesellschaft | Apparatus for plasma etching circuit boards or the like |
JP2598305B2 (ja) * | 1988-06-06 | 1997-04-09 | 日東電工株式会社 | 半導体ウエハの処理システム |
US6197209B1 (en) | 1995-10-27 | 2001-03-06 | Lg. Philips Lcd Co., Ltd. | Method of fabricating a substrate |
KR0180850B1 (ko) | 1996-06-26 | 1999-03-20 | 구자홍 | 유리기판 에칭장치 |
US6630052B1 (en) | 1996-06-26 | 2003-10-07 | Lg. Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
KR100265556B1 (ko) | 1997-03-21 | 2000-11-01 | 구본준 | 식각장치 |
JP3692380B2 (ja) | 1998-07-03 | 2005-09-07 | Azエレクトロニックマテリアルズ株式会社 | 容器の洗浄方法および装置 |
US6327011B2 (en) | 1997-10-20 | 2001-12-04 | Lg Electronics, Inc. | Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same |
KR100272513B1 (ko) | 1998-09-08 | 2001-01-15 | 구본준 | 유리기판의 식각장치 |
KR100308157B1 (ko) | 1998-10-22 | 2001-11-15 | 구본준, 론 위라하디락사 | 액정표시소자용 유리기판 |
DE19860179A1 (de) * | 1998-12-24 | 2000-06-29 | Audi Ag | Verfahren zur Erzeugung einer strukturierten Maskierung |
DE10154885A1 (de) * | 2001-11-05 | 2003-05-15 | Schmid Gmbh & Co Geb | Verfahren zur Behandlung von Gegenständen mittels einer Flüssigkeit |
-
1969
- 1969-07-14 US US00841317A patent/US3756898A/en not_active Expired - Lifetime
- 1969-12-24 BE BE743693D patent/BE743693A/xx unknown
-
1970
- 1970-01-14 GB GB0734/70A patent/GB1246252A/en not_active Expired
- 1970-01-16 DE DE19702001790 patent/DE2001790A1/de not_active Ceased
- 1970-02-27 JP JP45016314A patent/JPS4928816B1/ja active Pending
- 1970-03-17 FR FR7009563A patent/FR2056146A5/fr not_active Expired
- 1970-07-13 NL NL7010350A patent/NL7010350A/xx not_active Application Discontinuation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1985002629A1 (en) * | 1983-12-14 | 1985-06-20 | Hoellmueller Hans | Plant for the treating of objects by means of a liquid |
WO1985002630A1 (en) * | 1983-12-14 | 1985-06-20 | Hoellmueller Hans | Plant for the treatment of objects by means of a liquid |
EP0611483A4 (en) * | 1991-11-07 | 1995-05-03 | Chemcut Corp | METHOD AND ARRANGEMENT FOR CONTROLLED SPRAYING. |
EP0599039A1 (en) * | 1992-11-09 | 1994-06-01 | Bmc Industries, Inc. | Etch control system |
US5378308A (en) * | 1992-11-09 | 1995-01-03 | Bmc Industries, Inc. | Etchant distribution apparatus |
Also Published As
Publication number | Publication date |
---|---|
BE743693A (enrdf_load_stackoverflow) | 1970-05-28 |
NL7010350A (enrdf_load_stackoverflow) | 1971-01-18 |
FR2056146A5 (enrdf_load_stackoverflow) | 1971-05-14 |
US3756898A (en) | 1973-09-04 |
JPS4928816B1 (enrdf_load_stackoverflow) | 1974-07-30 |
GB1246252A (en) | 1971-09-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8131 | Rejection |