JPS4928816B1 - - Google Patents

Info

Publication number
JPS4928816B1
JPS4928816B1 JP45016314A JP1631470A JPS4928816B1 JP S4928816 B1 JPS4928816 B1 JP S4928816B1 JP 45016314 A JP45016314 A JP 45016314A JP 1631470 A JP1631470 A JP 1631470A JP S4928816 B1 JPS4928816 B1 JP S4928816B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45016314A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4928816B1 publication Critical patent/JPS4928816B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/01—Generalised techniques
    • H01J2209/012—Coating
    • H01J2209/015—Machines therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • ing And Chemical Polishing (AREA)
JP45016314A 1969-07-14 1970-02-27 Pending JPS4928816B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84131769A 1969-07-14 1969-07-14

Publications (1)

Publication Number Publication Date
JPS4928816B1 true JPS4928816B1 (enrdf_load_stackoverflow) 1974-07-30

Family

ID=25284565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45016314A Pending JPS4928816B1 (enrdf_load_stackoverflow) 1969-07-14 1970-02-27

Country Status (7)

Country Link
US (1) US3756898A (enrdf_load_stackoverflow)
JP (1) JPS4928816B1 (enrdf_load_stackoverflow)
BE (1) BE743693A (enrdf_load_stackoverflow)
DE (1) DE2001790A1 (enrdf_load_stackoverflow)
FR (1) FR2056146A5 (enrdf_load_stackoverflow)
GB (1) GB1246252A (enrdf_load_stackoverflow)
NL (1) NL7010350A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136911U (enrdf_load_stackoverflow) * 1974-04-24 1975-11-11

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2102786B (en) * 1981-07-10 1985-01-09 Glaverbel Method of modifying the light-reflecting properties of glass
JPS6014244A (ja) * 1983-07-06 1985-01-24 Fujitsu Ltd マスク洗浄装置
DE3345206A1 (de) * 1983-12-14 1985-06-27 Hans 7033 Herrenberg Höllmüller Vorrichtung zur behandlung von gegenstaenden mittels einer fluessigkeit
DE3345125A1 (de) * 1983-12-14 1985-06-27 Hans 7033 Herrenberg Höllmüller Vorrichtung zur behandlung von gegenstaenden mittels einer fluessigkeit
DE3422745A1 (de) 1984-06-19 1985-12-19 Achthal-Maschinenbau-GmbH, 8221 Markt-Teisendorf Verfahren und vorrichtung zum saeurepolieren von gegenstaenden aus glas
GB8527578D0 (en) * 1985-11-08 1985-12-11 Finishing Services Ltd Etching machines
US4650542A (en) * 1985-12-10 1987-03-17 Chemcut Corporation Process and apparatus for chemically treating articles in a contained chamber, with sealed-door access to the chamber
US4880489A (en) * 1986-08-26 1989-11-14 Voest-Alpine Aktiengesellschaft Apparatus for plasma etching circuit boards or the like
JP2598305B2 (ja) * 1988-06-06 1997-04-09 日東電工株式会社 半導体ウエハの処理システム
US5228949A (en) * 1991-11-07 1993-07-20 Chemcut Corporation Method and apparatus for controlled spray etching
US5378308A (en) * 1992-11-09 1995-01-03 Bmc Industries, Inc. Etchant distribution apparatus
US5387313A (en) * 1992-11-09 1995-02-07 Bmc Industries, Inc. Etchant control system
US6197209B1 (en) 1995-10-27 2001-03-06 Lg. Philips Lcd Co., Ltd. Method of fabricating a substrate
KR0180850B1 (ko) 1996-06-26 1999-03-20 구자홍 유리기판 에칭장치
US6630052B1 (en) 1996-06-26 2003-10-07 Lg. Philips Lcd Co., Ltd. Apparatus for etching glass substrate
KR100265556B1 (ko) 1997-03-21 2000-11-01 구본준 식각장치
JP3692380B2 (ja) 1998-07-03 2005-09-07 Ａｚエレクトロニックマテリアルズ株式会社 容器の洗浄方法および装置
US6327011B2 (en) 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
KR100272513B1 (ko) 1998-09-08 2001-01-15 구본준 유리기판의 식각장치
KR100308157B1 (ko) 1998-10-22 2001-11-15 구본준, 론 위라하디락사 액정표시소자용 유리기판
DE19860179A1 (de) * 1998-12-24 2000-06-29 Audi Ag Verfahren zur Erzeugung einer strukturierten Maskierung
DE10154885A1 (de) * 2001-11-05 2003-05-15 Schmid Gmbh & Co Geb Verfahren zur Behandlung von Gegenständen mittels einer Flüssigkeit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50136911U (enrdf_load_stackoverflow) * 1974-04-24 1975-11-11

Also Published As

Publication number Publication date
BE743693A (enrdf_load_stackoverflow) 1970-05-28
NL7010350A (enrdf_load_stackoverflow) 1971-01-18
FR2056146A5 (enrdf_load_stackoverflow) 1971-05-14
DE2001790A1 (de) 1971-02-18
US3756898A (en) 1973-09-04
GB1246252A (en) 1971-09-15

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