GB1246252A - Controlled etching without use of an etchant resist - Google Patents
Controlled etching without use of an etchant resistInfo
- Publication number
- GB1246252A GB1246252A GB0734/70A GB173470A GB1246252A GB 1246252 A GB1246252 A GB 1246252A GB 0734/70 A GB0734/70 A GB 0734/70A GB 173470 A GB173470 A GB 173470A GB 1246252 A GB1246252 A GB 1246252A
- Authority
- GB
- United Kingdom
- Prior art keywords
- station
- masks
- etching
- etchant
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/012—Coating
- H01J2209/015—Machines therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
Abstract
1,246,252. Etching. BUCKBEE MEARS CO. 14 Jan., 1970 [14 July, 1969], No. 1734/70. Heading B6J. Aperture masks 9 (e.g. for use in colour television sets) are etched to enlarge the apertures to a predetermined extent without use of an etchant resist by spraying etchant on to the masks from at least one set of nozzles arranged to produce a predetermined spray pattern. The masks, e.g. of stainless steel are sprayed with dilute hydrochloric acid in station 17 to remove oxide coatings rinsed with water in station 18 and etched in four stages in station 19 with ferric chloride. The masks are advanced intermittently beneath four sets of differently arranged nozzles 60, 70, 75 and 76 all provided with flow control valves and devices to ensure that etching occurs only to a predetermined extent at each stage and that no etchant drips on to the mask after the supply of etchant has been shut off. The etched masks are rinsed with water in station 20, treated to remove carbon (with phosphonic acid) in station 23, blackened with a coating of iron phosphate at station 24, further rinsed at 25, 26 and then dried in station 27. A station 21 may be provided after or between the etching stages to cheek photoelectrically the size of the apertures. The result of this detection may be used to determine the extent of further etching required or to stop etching if the desired apertures have been produced. Sliding doors 40, Fig. la, may be provided between the various stations. The masks may be moved through the stations on conveyer chains 11 or may be supported on individual racks which are coupled together and pushed through the apparatus (Fig. 2, not shown).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US84131769A | 1969-07-14 | 1969-07-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1246252A true GB1246252A (en) | 1971-09-15 |
Family
ID=25284565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB0734/70A Expired GB1246252A (en) | 1969-07-14 | 1970-01-14 | Controlled etching without use of an etchant resist |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3756898A (en) |
| JP (1) | JPS4928816B1 (en) |
| BE (1) | BE743693A (en) |
| DE (1) | DE2001790A1 (en) |
| FR (1) | FR2056146A5 (en) |
| GB (1) | GB1246252A (en) |
| NL (1) | NL7010350A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19860179A1 (en) * | 1998-12-24 | 2000-06-29 | Audi Ag | Structured mask, especially for producing moulds for slush-moulding contoured automobile interior parts, is made by substrate application using a path controlled device or selective substrate removal using a surface structuring device |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50136911U (en) * | 1974-04-24 | 1975-11-11 | ||
| GB2102786B (en) * | 1981-07-10 | 1985-01-09 | Glaverbel | Method of modifying the light-reflecting properties of glass |
| JPS6014244A (en) * | 1983-07-06 | 1985-01-24 | Fujitsu Ltd | Washing device for mask |
| DE3345125A1 (en) * | 1983-12-14 | 1985-06-27 | Hans 7033 Herrenberg Höllmüller | DEVICE FOR TREATING OBJECTS BY LIQUID |
| DE3345206A1 (en) * | 1983-12-14 | 1985-06-27 | Hans 7033 Herrenberg Höllmüller | DEVICE FOR TREATING OBJECTS BY LIQUID |
| DE3422745A1 (en) | 1984-06-19 | 1985-12-19 | Achthal-Maschinenbau-GmbH, 8221 Markt-Teisendorf | Method and device for acid polishing glass objects |
| GB8527578D0 (en) * | 1985-11-08 | 1985-12-11 | Finishing Services Ltd | Etching machines |
| US4650542A (en) * | 1985-12-10 | 1987-03-17 | Chemcut Corporation | Process and apparatus for chemically treating articles in a contained chamber, with sealed-door access to the chamber |
| US4880489A (en) * | 1986-08-26 | 1989-11-14 | Voest-Alpine Aktiengesellschaft | Apparatus for plasma etching circuit boards or the like |
| JP2598305B2 (en) * | 1988-06-06 | 1997-04-09 | 日東電工株式会社 | Semiconductor wafer processing system |
| US5228949A (en) * | 1991-11-07 | 1993-07-20 | Chemcut Corporation | Method and apparatus for controlled spray etching |
| US5387313A (en) * | 1992-11-09 | 1995-02-07 | Bmc Industries, Inc. | Etchant control system |
| US5378308A (en) * | 1992-11-09 | 1995-01-03 | Bmc Industries, Inc. | Etchant distribution apparatus |
| US6197209B1 (en) | 1995-10-27 | 2001-03-06 | Lg. Philips Lcd Co., Ltd. | Method of fabricating a substrate |
| KR0180850B1 (en) | 1996-06-26 | 1999-03-20 | 구자홍 | Etching apparatus for glass plate |
| US6630052B1 (en) | 1996-06-26 | 2003-10-07 | Lg. Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
| KR100265556B1 (en) | 1997-03-21 | 2000-11-01 | 구본준 | Etching Device |
| JP3692380B2 (en) | 1998-07-03 | 2005-09-07 | Ａｚエレクトロニックマテリアルズ株式会社 | Container cleaning method and apparatus |
| US6327011B2 (en) | 1997-10-20 | 2001-12-04 | Lg Electronics, Inc. | Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same |
| KR100272513B1 (en) | 1998-09-08 | 2001-01-15 | 구본준 | Etching Device of Glass Substrate |
| KR100308157B1 (en) | 1998-10-22 | 2001-11-15 | 구본준, 론 위라하디락사 | Glass substrate for liquid crystal display device |
| DE10154885A1 (en) * | 2001-11-05 | 2003-05-15 | Schmid Gmbh & Co Geb | Process for treating objects with a liquid |
-
1969
- 1969-07-14 US US00841317A patent/US3756898A/en not_active Expired - Lifetime
- 1969-12-24 BE BE743693D patent/BE743693A/xx unknown
-
1970
- 1970-01-14 GB GB0734/70A patent/GB1246252A/en not_active Expired
- 1970-01-16 DE DE19702001790 patent/DE2001790A1/en not_active Ceased
- 1970-02-27 JP JP45016314A patent/JPS4928816B1/ja active Pending
- 1970-03-17 FR FR7009563A patent/FR2056146A5/fr not_active Expired
- 1970-07-13 NL NL7010350A patent/NL7010350A/xx not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19860179A1 (en) * | 1998-12-24 | 2000-06-29 | Audi Ag | Structured mask, especially for producing moulds for slush-moulding contoured automobile interior parts, is made by substrate application using a path controlled device or selective substrate removal using a surface structuring device |
Also Published As
| Publication number | Publication date |
|---|---|
| NL7010350A (en) | 1971-01-18 |
| JPS4928816B1 (en) | 1974-07-30 |
| US3756898A (en) | 1973-09-04 |
| BE743693A (en) | 1970-05-28 |
| DE2001790A1 (en) | 1971-02-18 |
| FR2056146A5 (en) | 1971-05-14 |
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