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Hitachi Ltd
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Hitachi Ltd
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Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP9605476ApriorityCriticalpatent/JPS5322367A/en
Publication of JPS5322367ApublicationCriticalpatent/JPS5322367A/en
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
Abstract
PURPOSE: To prevent the dispersion of alignment deviations among each process by forming target patterns to substrates together with each process operation in desired plural processes and performing position alignment with a mask having window patterns in the subsequent process.