DE1289192B - Verfahren zum Verloeten eines Silizium-Halbleiterkoerpers - Google Patents

Verfahren zum Verloeten eines Silizium-Halbleiterkoerpers

Info

Publication number
DE1289192B
DE1289192B DEM59522A DEM0059522A DE1289192B DE 1289192 B DE1289192 B DE 1289192B DE M59522 A DEM59522 A DE M59522A DE M0059522 A DEM0059522 A DE M0059522A DE 1289192 B DE1289192 B DE 1289192B
Authority
DE
Germany
Prior art keywords
nickel
silicon
plates
semiconductor
semiconductor body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEM59522A
Other languages
German (de)
English (en)
Inventor
Hays Robert Guy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of DE1289192B publication Critical patent/DE1289192B/de
Pending legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H10W99/00—

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Die Bonding (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)
DEM59522A 1963-01-14 1964-01-14 Verfahren zum Verloeten eines Silizium-Halbleiterkoerpers Pending DE1289192B (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25142163A 1963-01-14 1963-01-14
US461936A US3271851A (en) 1963-01-14 1965-06-07 Method of making semiconductor devices

Publications (1)

Publication Number Publication Date
DE1289192B true DE1289192B (de) 1969-02-13

Family

ID=26941599

Family Applications (1)

Application Number Title Priority Date Filing Date
DEM59522A Pending DE1289192B (de) 1963-01-14 1964-01-14 Verfahren zum Verloeten eines Silizium-Halbleiterkoerpers

Country Status (6)

Country Link
US (1) US3271851A (enExample)
BE (1) BE642048A (enExample)
DE (1) DE1289192B (enExample)
FR (1) FR1378631A (enExample)
GB (1) GB1064290A (enExample)
NL (1) NL6400206A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1107620A (en) * 1966-03-29 1968-03-27 Matsushita Electronics Corp Method of manufacturing semiconductor devices
US3735208A (en) * 1971-08-26 1973-05-22 Rca Corp Thermal fatigue lead-soldered semiconductor device
DE3344958C1 (de) * 1983-12-13 1984-07-19 VEGLA Vereinigte Glaswerke GmbH, 5100 Aachen Verfahren zum Verloeten eines Stromanschlusselementes mit dem Stromzufuehrungsleiter einer heizbaren Glasscheibe
US5476211A (en) * 1993-11-16 1995-12-19 Form Factor, Inc. Method of manufacturing electrical contacts, using a sacrificial member
US20070228110A1 (en) * 1993-11-16 2007-10-04 Formfactor, Inc. Method Of Wirebonding That Utilizes A Gas Flow Within A Capillary From Which A Wire Is Played Out
US6835898B2 (en) 1993-11-16 2004-12-28 Formfactor, Inc. Electrical contact structures formed by configuring a flexible wire to have a springable shape and overcoating the wire with at least one layer of a resilient conductive material, methods of mounting the contact structures to electronic components, and applications for employing the contact structures
US7073254B2 (en) 1993-11-16 2006-07-11 Formfactor, Inc. Method for mounting a plurality of spring contact elements
US6336269B1 (en) * 1993-11-16 2002-01-08 Benjamin N. Eldridge Method of fabricating an interconnection element
US6727579B1 (en) 1994-11-16 2004-04-27 Formfactor, Inc. Electrical contact structures formed by configuring a flexible wire to have a springable shape and overcoating the wire with at least one layer of a resilient conductive material, methods of mounting the contact structures to electronic components, and applications for employing the contact structures
US20100065963A1 (en) 1995-05-26 2010-03-18 Formfactor, Inc. Method of wirebonding that utilizes a gas flow within a capillary from which a wire is played out
US8033838B2 (en) 1996-02-21 2011-10-11 Formfactor, Inc. Microelectronic contact structure
US6821888B2 (en) * 2000-07-07 2004-11-23 Chartered Semiconductor Manufacturing Ltd. Method of copper/copper surface bonding using a conducting polymer for application in IC chip bonding
FR2848339B1 (fr) * 2002-12-05 2005-08-26 St Microelectronics Sa Procede d'adhesion de deux elements, en particulier d'un circuit integre, par exemple une encapsulation d'un resonateur, et circuit integre correspondant

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE865160C (de) * 1951-03-07 1953-01-29 Western Electric Co Verfahren zur Erzeugung einer Germaniumschicht auf einem Germaniumkoerper
US2781481A (en) * 1952-06-02 1957-02-12 Rca Corp Semiconductors and methods of making same
US2793420A (en) * 1955-04-22 1957-05-28 Bell Telephone Labor Inc Electrical contacts to silicon
DE1109002B (de) * 1955-06-22 1961-06-15 Union Carbide Corp Verfahren zum Vernickeln oder Verchromen von Aluminiumgegenstaenden durch Gasplattieren

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2877138A (en) * 1956-05-18 1959-03-10 Ind Rayon Corp Method of heating a filament to produce a metal coating in a decomposable gas plating process
US2913357A (en) * 1956-09-20 1959-11-17 Union Carbide Corp Transistor and method of making a transistor
NL122283C (enExample) * 1958-07-25
GB917517A (en) * 1960-03-11 1963-02-06 Clevite Corp Method for providing contacts on semiconductor devices
NL260635A (enExample) * 1960-04-25

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE865160C (de) * 1951-03-07 1953-01-29 Western Electric Co Verfahren zur Erzeugung einer Germaniumschicht auf einem Germaniumkoerper
US2781481A (en) * 1952-06-02 1957-02-12 Rca Corp Semiconductors and methods of making same
US2793420A (en) * 1955-04-22 1957-05-28 Bell Telephone Labor Inc Electrical contacts to silicon
DE1109002B (de) * 1955-06-22 1961-06-15 Union Carbide Corp Verfahren zum Vernickeln oder Verchromen von Aluminiumgegenstaenden durch Gasplattieren

Also Published As

Publication number Publication date
GB1064290A (en) 1967-04-05
BE642048A (enExample) 1964-05-04
US3271851A (en) 1966-09-13
FR1378631A (fr) 1964-11-13
NL6400206A (enExample) 1964-07-15

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