DE112007002470T5 - Glaspoliermittel und -verfahren - Google Patents
Glaspoliermittel und -verfahren Download PDFInfo
- Publication number
- DE112007002470T5 DE112007002470T5 DE112007002470T DE112007002470T DE112007002470T5 DE 112007002470 T5 DE112007002470 T5 DE 112007002470T5 DE 112007002470 T DE112007002470 T DE 112007002470T DE 112007002470 T DE112007002470 T DE 112007002470T DE 112007002470 T5 DE112007002470 T5 DE 112007002470T5
- Authority
- DE
- Germany
- Prior art keywords
- glass
- polishing
- mixture
- poly
- particle size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011521 glass Substances 0.000 title claims abstract description 100
- 238000000034 method Methods 0.000 title claims description 42
- 239000000203 mixture Substances 0.000 claims abstract description 147
- 238000005498 polishing Methods 0.000 claims abstract description 110
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims abstract description 63
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims abstract description 63
- 239000003381 stabilizer Substances 0.000 claims abstract description 50
- 239000002245 particle Substances 0.000 claims abstract description 47
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 239000008365 aqueous carrier Substances 0.000 claims abstract description 24
- 238000007517 polishing process Methods 0.000 claims abstract description 5
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 claims description 26
- 229920000642 polymer Polymers 0.000 claims description 19
- 229910017053 inorganic salt Inorganic materials 0.000 claims description 17
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 16
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 16
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 16
- 229940081066 picolinic acid Drugs 0.000 claims description 12
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims description 11
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 11
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 11
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 10
- 229920006187 aquazol Polymers 0.000 claims description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 229920001285 xanthan gum Polymers 0.000 claims description 8
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims description 7
- 239000004354 Hydroxyethyl cellulose Substances 0.000 claims description 7
- 229920002125 Sokalan® Polymers 0.000 claims description 7
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 claims description 7
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 claims description 7
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000004584 polyacrylic acid Substances 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 5
- 229920002845 Poly(methacrylic acid) Polymers 0.000 claims description 4
- 239000008135 aqueous vehicle Substances 0.000 claims description 2
- 229940071826 hydroxyethyl cellulose Drugs 0.000 claims 4
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical class [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims 2
- 239000000230 xanthan gum Substances 0.000 claims 2
- 235000010493 xanthan gum Nutrition 0.000 claims 2
- 229940082509 xanthan gum Drugs 0.000 claims 2
- 239000002002 slurry Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- -1 cesium halide Chemical class 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229920000193 polymethacrylate Polymers 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- AIYUHDOJVYHVIT-UHFFFAOYSA-M caesium chloride Chemical compound [Cl-].[Cs+] AIYUHDOJVYHVIT-UHFFFAOYSA-M 0.000 description 5
- 239000004615 ingredient Substances 0.000 description 5
- 229920000058 polyacrylate Polymers 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000000227 grinding Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910052792 caesium Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- NLVXSWCKKBEXTG-UHFFFAOYSA-M ethenesulfonate Chemical compound [O-]S(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-M 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000003115 biocidal effect Effects 0.000 description 2
- 239000003139 biocide Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- NYEZZYQZRQDLEH-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1,3-oxazole Chemical compound CCC1=NCCO1 NYEZZYQZRQDLEH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 241000405961 Scomberomorus regalis Species 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229920006318 anionic polymer Polymers 0.000 description 1
- 229920001586 anionic polysaccharide Polymers 0.000 description 1
- 150000004836 anionic polysaccharides Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 239000012928 buffer substance Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 159000000006 cesium salts Chemical class 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000003311 flocculating effect Effects 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229920013821 hydroxy alkyl cellulose Polymers 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 238000002356 laser light scattering Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 229920006316 polyvinylpyrrolidine Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US85245106P | 2006-10-16 | 2006-10-16 | |
| US60/852,451 | 2006-10-16 | ||
| US93039907P | 2007-05-16 | 2007-05-16 | |
| US60/930,399 | 2007-05-16 | ||
| PCT/US2007/022014 WO2008048562A1 (en) | 2006-10-16 | 2007-10-16 | Glass polishing compositions and methods |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE112007002470T5 true DE112007002470T5 (de) | 2009-09-10 |
Family
ID=39314335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE112007002470T Withdrawn DE112007002470T5 (de) | 2006-10-16 | 2007-10-16 | Glaspoliermittel und -verfahren |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20100022171A1 (https=) |
| JP (1) | JP5448824B2 (https=) |
| KR (1) | KR101477826B1 (https=) |
| CN (1) | CN101528882B (https=) |
| DE (1) | DE112007002470T5 (https=) |
| SG (1) | SG175636A1 (https=) |
| WO (1) | WO2008048562A1 (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5362319B2 (ja) * | 2008-10-21 | 2013-12-11 | 花王株式会社 | 研磨液組成物 |
| KR101376057B1 (ko) * | 2009-04-15 | 2014-03-19 | 솔베이 (차이나) 컴퍼니, 리미티드 | 세륨 기반 입자 조성물 및 그의 제조 |
| EP2439768B1 (en) * | 2009-06-04 | 2022-02-09 | SUMCO Corporation | Fixed-abrasive-grain machining apparatus, fixed-abrasive-grain machining method, and semiconductor-wafer manufacturing method |
| CN102101976A (zh) * | 2009-12-18 | 2011-06-22 | 安集微电子（上海）有限公司 | 一种化学机械抛光液 |
| US20130192304A1 (en) * | 2010-09-30 | 2013-08-01 | Hazuki Nakae | Manufacturing Method for Glass Substrate for Information Recording Medium |
| US9090799B2 (en) * | 2010-11-08 | 2015-07-28 | Fujimi Incorporated | Composition for polishing and method of polishing semiconductor substrate using same |
| JP2013159531A (ja) * | 2012-02-07 | 2013-08-19 | Panasonic Liquid Crystal Display Co Ltd | 液晶表示素子の製造方法 |
| CN102585708A (zh) * | 2012-03-13 | 2012-07-18 | 上海华明高纳稀土新材料有限公司 | 稀土抛光材料及其制备方法 |
| US9358659B2 (en) | 2013-03-04 | 2016-06-07 | Cabot Microelectronics Corporation | Composition and method for polishing glass |
| US9966269B2 (en) * | 2014-05-30 | 2018-05-08 | Hitachi Chemical Company, Ltd. | Polishing liquid for CMP, polishing liquid set for CMP, and polishing method |
| JP2017002166A (ja) * | 2015-06-09 | 2017-01-05 | テイカ株式会社 | ガラス及びセラミック研磨用組成物 |
| CN106189873A (zh) * | 2016-07-22 | 2016-12-07 | 清华大学 | 一种抛光组合物 |
| JP6262836B1 (ja) * | 2016-07-28 | 2018-01-17 | 株式会社バイコウスキージャパン | 研磨砥粒、その製造方法、それを含む研磨スラリー及びそれを用いる研磨方法 |
| WO2018100324A1 (fr) * | 2016-12-02 | 2018-06-07 | Rhodia Operations | Suspension d'oxyde de cerium |
| FR3059660B1 (fr) * | 2016-12-02 | 2019-03-15 | Rhodia Operations | Suspension d'oxyde de cerium |
| CN109439282A (zh) * | 2018-10-23 | 2019-03-08 | 蓝思科技（长沙）有限公司 | 复合纳米磨料、抛光液及其制备方法、玻璃晶片和电子设备 |
| CN109135580B (zh) * | 2018-10-25 | 2021-04-02 | 蓝思科技（长沙）有限公司 | 一种玻璃用抛光液及其制备方法 |
| US10787592B1 (en) * | 2019-05-16 | 2020-09-29 | Rohm And Haas Electronic Materials Cmp Holdings, I | Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment |
| KR20230090768A (ko) * | 2021-12-15 | 2023-06-22 | 인오켐 주식회사 | 디스플레이 유리기판 연마용 조성물의 제조방법 및 상기 조성물을 이용한 디스플레이 기판을 연마하는 방법 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04135162A (ja) * | 1990-09-21 | 1992-05-08 | Asahi Glass Co Ltd | ガラスの高効率研磨方法 |
| CN1245471C (zh) * | 1996-09-30 | 2006-03-15 | 日立化成工业株式会社 | 氧化铈研磨剂以及基板的研磨方法 |
| US6110396A (en) * | 1996-11-27 | 2000-08-29 | International Business Machines Corporation | Dual-valent rare earth additives to polishing slurries |
| US6248143B1 (en) * | 1998-01-27 | 2001-06-19 | Showa Denko Kabushiki Kaisha | Composition for polishing glass and polishing method |
| US6299659B1 (en) * | 1998-08-05 | 2001-10-09 | Showa Denko K.K. | Polishing material composition and polishing method for polishing LSI devices |
| JP4501694B2 (ja) * | 1998-12-25 | 2010-07-14 | 日立化成工業株式会社 | Ｃｍｐ研磨剤用添加液 |
| JP2000256654A (ja) * | 1999-03-04 | 2000-09-19 | Hitachi Chem Co Ltd | Ｃｍｐ研磨剤及び基板の研磨方法 |
| US6350393B2 (en) * | 1999-11-04 | 2002-02-26 | Cabot Microelectronics Corporation | Use of CsOH in a dielectric CMP slurry |
| US6454821B1 (en) * | 2000-06-21 | 2002-09-24 | Praxair S. T. Technology, Inc. | Polishing composition and method |
| JP2002114970A (ja) * | 2000-10-04 | 2002-04-16 | Asahi Denka Kogyo Kk | 水系ラップ液及び水系ラップ剤 |
| US6726534B1 (en) * | 2001-03-01 | 2004-04-27 | Cabot Microelectronics Corporation | Preequilibrium polishing method and system |
| US6736705B2 (en) * | 2001-04-27 | 2004-05-18 | Hitachi Global Storage Technologies | Polishing process for glass or ceramic disks used in disk drive data storage devices |
| US20030162398A1 (en) * | 2002-02-11 | 2003-08-28 | Small Robert J. | Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same |
| EP1554357A1 (en) * | 2002-10-25 | 2005-07-20 | Showa Denko K.K. | Polishing slurry and polished substrate |
| US20050066687A1 (en) * | 2003-09-30 | 2005-03-31 | Mr. Chi-Fu Hsueh | Methods for the production of marble-like crystallized glass panel wih embossed surface |
| JP2004291232A (ja) * | 2004-07-20 | 2004-10-21 | Hitachi Chem Co Ltd | 酸化セリウム研磨剤及び基板の研磨法 |
| JP2006041034A (ja) * | 2004-07-23 | 2006-02-09 | Hitachi Chem Co Ltd | Ｃｍｐ研磨剤及び基板の研磨方法 |
| US20070218811A1 (en) * | 2004-09-27 | 2007-09-20 | Hitachi Chemical Co., Ltd. | Cmp polishing slurry and method of polishing substrate |
| JP2006175552A (ja) * | 2004-12-22 | 2006-07-06 | Hitachi Chem Co Ltd | 有機材料用ｃｍｐ研磨剤及び有機材料の研磨方法 |
| JP4463134B2 (ja) * | 2005-03-29 | 2010-05-12 | 三井金属鉱業株式会社 | セリウム系研摩材及びその中間体並びにこれらの製造方法 |
| JP4776387B2 (ja) * | 2006-02-06 | 2011-09-21 | 日立化成工業株式会社 | 酸化セリウム研磨剤および基板の研磨法 |
-
2007
- 2007-10-16 US US12/311,717 patent/US20100022171A1/en not_active Abandoned
- 2007-10-16 KR KR20097009938A patent/KR101477826B1/ko not_active Expired - Fee Related
- 2007-10-16 WO PCT/US2007/022014 patent/WO2008048562A1/en not_active Ceased
- 2007-10-16 CN CN200780038453.1A patent/CN101528882B/zh not_active Expired - Fee Related
- 2007-10-16 SG SG2011075488A patent/SG175636A1/en unknown
- 2007-10-16 JP JP2009533335A patent/JP5448824B2/ja not_active Expired - Fee Related
- 2007-10-16 DE DE112007002470T patent/DE112007002470T5/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010506743A (ja) | 2010-03-04 |
| JP5448824B2 (ja) | 2014-03-19 |
| KR20090067213A (ko) | 2009-06-24 |
| CN101528882A (zh) | 2009-09-09 |
| KR101477826B1 (ko) | 2015-01-02 |
| CN101528882B (zh) | 2014-07-16 |
| US20100022171A1 (en) | 2010-01-28 |
| SG175636A1 (en) | 2011-11-28 |
| WO2008048562A1 (en) | 2008-04-24 |
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