DE102017202802A1 - Objektiv und optisches System mit einem solchen Objektiv - Google Patents
Objektiv und optisches System mit einem solchen Objektiv Download PDFInfo
- Publication number
- DE102017202802A1 DE102017202802A1 DE102017202802.5A DE102017202802A DE102017202802A1 DE 102017202802 A1 DE102017202802 A1 DE 102017202802A1 DE 102017202802 A DE102017202802 A DE 102017202802A DE 102017202802 A1 DE102017202802 A1 DE 102017202802A1
- Authority
- DE
- Germany
- Prior art keywords
- lens
- coating
- light
- layer thickness
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 138
- 238000000576 coating method Methods 0.000 claims abstract description 119
- 239000011248 coating agent Substances 0.000 claims abstract description 83
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 238000003384 imaging method Methods 0.000 claims description 15
- 239000003989 dielectric material Substances 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000006117 anti-reflective coating Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 73
- 230000004075 alteration Effects 0.000 description 30
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 19
- 229910052748 manganese Inorganic materials 0.000 description 19
- 239000011572 manganese Substances 0.000 description 19
- 235000012431 wafers Nutrition 0.000 description 16
- 230000003595 spectral effect Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 7
- 230000010363 phase shift Effects 0.000 description 7
- 230000010287 polarization Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- PPPLOTGLKDTASM-UHFFFAOYSA-A pentasodium;pentafluoroaluminum(2-);tetrafluoroalumanuide Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[Na+].[Na+].[Na+].[Na+].[Na+].[Al+3].[Al+3].[Al+3] PPPLOTGLKDTASM-UHFFFAOYSA-A 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- TYIZUJNEZNBXRS-UHFFFAOYSA-K trifluorogadolinium Chemical compound F[Gd](F)F TYIZUJNEZNBXRS-UHFFFAOYSA-K 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
- 229940105963 yttrium fluoride Drugs 0.000 description 1
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0836—Catadioptric systems using more than three curved mirrors
- G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
- G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
- G02B5/0858—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
- G02B5/3091—Birefringent or phase retarding elements for use in the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102017202802.5A DE102017202802A1 (de) | 2017-02-21 | 2017-02-21 | Objektiv und optisches System mit einem solchen Objektiv |
| JP2019545266A JP7275035B2 (ja) | 2017-02-21 | 2018-02-13 | 反射屈折レンズと、そのようなレンズを含む光学システム |
| KR1020197027443A KR102542986B1 (ko) | 2017-02-21 | 2018-02-13 | 반사 굴절 렌즈 및 이러한 렌즈를 포함하는 광학 시스템 |
| PCT/EP2018/053552 WO2018153729A1 (de) | 2017-02-21 | 2018-02-13 | Katadioptrisches objektiv und optisches system mit einem solchen objektiv |
| US16/544,135 US11561381B2 (en) | 2017-02-21 | 2019-08-19 | Catadioptric lens and optical system comprising such a lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102017202802.5A DE102017202802A1 (de) | 2017-02-21 | 2017-02-21 | Objektiv und optisches System mit einem solchen Objektiv |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102017202802A1 true DE102017202802A1 (de) | 2018-08-23 |
Family
ID=61622498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102017202802.5A Ceased DE102017202802A1 (de) | 2017-02-21 | 2017-02-21 | Objektiv und optisches System mit einem solchen Objektiv |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11561381B2 (https=) |
| JP (1) | JP7275035B2 (https=) |
| KR (1) | KR102542986B1 (https=) |
| DE (1) | DE102017202802A1 (https=) |
| WO (1) | WO2018153729A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021115733A1 (de) | 2019-12-09 | 2021-06-17 | Carl Zeiss Smt Gmbh | Optisches element mit einer schutzbeschichtung, verfahren zu dessen herstellung und optische anordnung |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110927940B (zh) * | 2019-12-19 | 2022-02-08 | 浙江舜宇光学有限公司 | 摄像装置 |
| KR102788875B1 (ko) | 2020-05-25 | 2025-03-31 | 삼성전자주식회사 | 입사광의 입사각, 입사각 스프레드, 및 방위각을 조절할 수 있는 계측 시스템 |
| KR102919195B1 (ko) | 2020-07-06 | 2026-01-27 | 삼성전자 주식회사 | 경사 조명을 이용한 회절 기반 계측 장치 및 방법, 그 방법을 이용한 반도체 소자 제조방법 |
| CN113946041B (zh) * | 2021-10-22 | 2022-09-20 | 中国科学院长春光学精密机械与物理研究所 | 一种折反式卡塞格林望远镜系统及其偏振像差校正方法 |
| TWI847291B (zh) * | 2022-09-30 | 2024-07-01 | 大立光電股份有限公司 | 折反射光學膜、成像光學鏡頭、取像裝置及電子裝置 |
| US12455453B2 (en) | 2023-04-25 | 2025-10-28 | Apple Inc. | Lens assembly with a supplemental mirror |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009048553A1 (de) | 2009-09-29 | 2011-03-31 | Carl Zeiss Smt Gmbh | Katadioptrisches Projektionsobjektiv mit Umlenkspiegeln und Projektionsbelichtungsverfahren |
| DE102009047179A1 (de) | 2009-11-26 | 2011-06-09 | Carl Zeiss Smt Gmbh | Projektionsobjetiv |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5283692A (en) * | 1989-07-21 | 1994-02-01 | Spectra Physics Lasers, Inc. | Multi-layer graded reflectivity mirror |
| US5646976A (en) * | 1994-08-01 | 1997-07-08 | Osmic, Inc. | Optical element of multilayered thin film for X-rays and neutrons |
| US5717518A (en) * | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
| US5911858A (en) * | 1997-02-18 | 1999-06-15 | Sandia Corporation | Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors |
| DE19833524B4 (de) * | 1998-07-25 | 2004-09-23 | Bruker Axs Gmbh | Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel |
| JP4345232B2 (ja) | 1998-12-25 | 2009-10-14 | 株式会社ニコン | 反射屈折結像光学系および該光学系を備えた投影露光装置 |
| US6421417B1 (en) * | 1999-08-02 | 2002-07-16 | Osmic, Inc. | Multilayer optics with adjustable working wavelength |
| US6317483B1 (en) * | 1999-11-29 | 2001-11-13 | X-Ray Optical Systems, Inc. | Doubly curved optical device with graded atomic planes |
| US7136234B2 (en) * | 2000-09-12 | 2006-11-14 | Kla-Tencor Technologies Corporation | Broad band DUV, VUV long-working distance catadioptric imaging system |
| JP2002162566A (ja) | 2000-11-27 | 2002-06-07 | Nikon Corp | 光学系の設計方法，光学系および投影露光装置 |
| EP1282011B1 (de) * | 2001-08-01 | 2006-11-22 | Carl Zeiss SMT AG | Reflektives Projektionsobjektiv für EUV-Photolithographie |
| US6958864B2 (en) * | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| JP2003233009A (ja) * | 2002-12-25 | 2003-08-22 | Nikon Corp | 反射屈折投影光学系、反射屈折光学系、投影露光装置、及び投影露光方法 |
| US7554649B2 (en) * | 2003-09-02 | 2009-06-30 | Canon Kabushiki Kaisha | Projection optical system, exposure apparatus and device fabricating method |
| KR101248328B1 (ko) * | 2004-06-04 | 2013-04-01 | 칼 짜이스 에스엠티 게엠베하 | 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 |
| US7333271B2 (en) | 2005-07-05 | 2008-02-19 | Northrop Grumman Corporation | Dichroic mangin mirror |
| EP1930771A1 (en) * | 2006-12-04 | 2008-06-11 | Carl Zeiss SMT AG | Projection objectives having mirror elements with reflective coatings |
| CN101836163B (zh) * | 2007-08-20 | 2012-06-27 | 卡尔蔡司Smt有限责任公司 | 包括具有反射涂层的镜元件的投射物镜 |
| WO2009046137A1 (en) | 2007-10-02 | 2009-04-09 | Kla-Tencor Corporation | Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths |
| US20090252977A1 (en) * | 2008-04-07 | 2009-10-08 | Canon Kabushiki Kaisha | Multilayer film reflector |
| EP2177934B1 (en) * | 2008-10-17 | 2011-09-07 | Carl Zeiss SMT GmbH | High transmission, high aperture catadioptric projection objective and projection exposure apparatus |
| DE102010004827A1 (de) | 2009-01-21 | 2010-09-30 | Carl Zeiss Smt Ag | Katadioptrische Pupillen-Relaysysteme |
| US9436103B2 (en) * | 2014-05-19 | 2016-09-06 | Ultratech, Inc. | Wynne-Dyson projection lens with reduced susceptibility to UV damage |
-
2017
- 2017-02-21 DE DE102017202802.5A patent/DE102017202802A1/de not_active Ceased
-
2018
- 2018-02-13 WO PCT/EP2018/053552 patent/WO2018153729A1/de not_active Ceased
- 2018-02-13 KR KR1020197027443A patent/KR102542986B1/ko active Active
- 2018-02-13 JP JP2019545266A patent/JP7275035B2/ja active Active
-
2019
- 2019-08-19 US US16/544,135 patent/US11561381B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009048553A1 (de) | 2009-09-29 | 2011-03-31 | Carl Zeiss Smt Gmbh | Katadioptrisches Projektionsobjektiv mit Umlenkspiegeln und Projektionsbelichtungsverfahren |
| DE102009047179A1 (de) | 2009-11-26 | 2011-06-09 | Carl Zeiss Smt Gmbh | Projektionsobjetiv |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021115733A1 (de) | 2019-12-09 | 2021-06-17 | Carl Zeiss Smt Gmbh | Optisches element mit einer schutzbeschichtung, verfahren zu dessen herstellung und optische anordnung |
Also Published As
| Publication number | Publication date |
|---|---|
| US11561381B2 (en) | 2023-01-24 |
| JP2020508492A (ja) | 2020-03-19 |
| WO2018153729A1 (de) | 2018-08-30 |
| KR20190115089A (ko) | 2019-10-10 |
| KR102542986B1 (ko) | 2023-06-13 |
| JP7275035B2 (ja) | 2023-05-17 |
| US20190369374A1 (en) | 2019-12-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |