JP7275035B2 - 反射屈折レンズと、そのようなレンズを含む光学システム - Google Patents

反射屈折レンズと、そのようなレンズを含む光学システム Download PDF

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JP7275035B2
JP7275035B2 JP2019545266A JP2019545266A JP7275035B2 JP 7275035 B2 JP7275035 B2 JP 7275035B2 JP 2019545266 A JP2019545266 A JP 2019545266A JP 2019545266 A JP2019545266 A JP 2019545266A JP 7275035 B2 JP7275035 B2 JP 7275035B2
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optical
lens
catadioptric lens
coating
light
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JP2020508492A5 (https=
JP2020508492A (ja
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コンスタンティン フォルヒト
ディルク デーリング
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0858—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G02B5/3091—Birefringent or phase retarding elements for use in the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2019545266A 2017-02-21 2018-02-13 反射屈折レンズと、そのようなレンズを含む光学システム Active JP7275035B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017202802.5 2017-02-21
DE102017202802.5A DE102017202802A1 (de) 2017-02-21 2017-02-21 Objektiv und optisches System mit einem solchen Objektiv
PCT/EP2018/053552 WO2018153729A1 (de) 2017-02-21 2018-02-13 Katadioptrisches objektiv und optisches system mit einem solchen objektiv

Publications (3)

Publication Number Publication Date
JP2020508492A JP2020508492A (ja) 2020-03-19
JP2020508492A5 JP2020508492A5 (https=) 2023-02-07
JP7275035B2 true JP7275035B2 (ja) 2023-05-17

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JP2019545266A Active JP7275035B2 (ja) 2017-02-21 2018-02-13 反射屈折レンズと、そのようなレンズを含む光学システム

Country Status (5)

Country Link
US (1) US11561381B2 (https=)
JP (1) JP7275035B2 (https=)
KR (1) KR102542986B1 (https=)
DE (1) DE102017202802A1 (https=)
WO (1) WO2018153729A1 (https=)

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DE102019219177A1 (de) 2019-12-09 2021-06-10 Carl Zeiss Smt Gmbh Optisches Element mit einer Schutzbeschichtung, Verfahren zu dessen Herstellung und optische Anordnung
CN110927940B (zh) * 2019-12-19 2022-02-08 浙江舜宇光学有限公司 摄像装置
KR102788875B1 (ko) 2020-05-25 2025-03-31 삼성전자주식회사 입사광의 입사각, 입사각 스프레드, 및 방위각을 조절할 수 있는 계측 시스템
KR102919195B1 (ko) 2020-07-06 2026-01-27 삼성전자 주식회사 경사 조명을 이용한 회절 기반 계측 장치 및 방법, 그 방법을 이용한 반도체 소자 제조방법
CN113946041B (zh) * 2021-10-22 2022-09-20 中国科学院长春光学精密机械与物理研究所 一种折反式卡塞格林望远镜系统及其偏振像差校正方法
TWI847291B (zh) * 2022-09-30 2024-07-01 大立光電股份有限公司 折反射光學膜、成像光學鏡頭、取像裝置及電子裝置
US12455453B2 (en) 2023-04-25 2025-10-28 Apple Inc. Lens assembly with a supplemental mirror

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JP2002162566A (ja) 2000-11-27 2002-06-07 Nikon Corp 光学系の設計方法，光学系および投影露光装置
JP2009223330A (ja) 1998-12-25 2009-10-01 Nikon Corp 光学装置および該光学装置を備えた投影露光装置
JP2009272618A (ja) 2008-04-07 2009-11-19 Canon Inc 多層膜反射鏡
JP2010541021A (ja) 2007-10-02 2010-12-24 ケーエルエー−テンカー・コーポレーション 反射対物鏡、ミラーを有する広帯域対物光学系、及び屈折レンズを有する光学撮像システム、及び２つ以上の結像経路を有する広帯域光学撮像システム

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US5283692A (en) * 1989-07-21 1994-02-01 Spectra Physics Lasers, Inc. Multi-layer graded reflectivity mirror
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
US5717518A (en) * 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5911858A (en) * 1997-02-18 1999-06-15 Sandia Corporation Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
US6421417B1 (en) * 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
EP1282011B1 (de) * 2001-08-01 2006-11-22 Carl Zeiss SMT AG Reflektives Projektionsobjektiv für EUV-Photolithographie
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
JP2003233009A (ja) * 2002-12-25 2003-08-22 Nikon Corp 反射屈折投影光学系、反射屈折光学系、投影露光装置、及び投影露光方法
US7554649B2 (en) * 2003-09-02 2009-06-30 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and device fabricating method
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JP2009223330A (ja) 1998-12-25 2009-10-01 Nikon Corp 光学装置および該光学装置を備えた投影露光装置
JP2002162566A (ja) 2000-11-27 2002-06-07 Nikon Corp 光学系の設計方法，光学系および投影露光装置
JP2010541021A (ja) 2007-10-02 2010-12-24 ケーエルエー−テンカー・コーポレーション 反射対物鏡、ミラーを有する広帯域対物光学系、及び屈折レンズを有する光学撮像システム、及び２つ以上の結像経路を有する広帯域光学撮像システム
JP2009272618A (ja) 2008-04-07 2009-11-19 Canon Inc 多層膜反射鏡

Also Published As

Publication number Publication date
US11561381B2 (en) 2023-01-24
JP2020508492A (ja) 2020-03-19
WO2018153729A1 (de) 2018-08-30
KR20190115089A (ko) 2019-10-10
KR102542986B1 (ko) 2023-06-13
DE102017202802A1 (de) 2018-08-23
US20190369374A1 (en) 2019-12-05

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